公开(公告)号：WO2009095220A3

公开(公告)日：2009-11-26

申请号：PCT/EP2009000539

申请日：2009-01-28

Applicant: MEDIA LARIO SRL ,  WALLHEAD IAN ,  ZOCCHI FABIO

Inventor： WALLHEAD IAN ,  ZOCCHI FABIO

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: A collector optical system for extreme ultraviolet (EUV) or X-ray applications, including lithography and imaging, for example at 13 5 nm, comprising a grazing incidence collector in combination with a laser produced plasma (LPP) source In one embodiment, one or more further optical elements act upon one or more laser beams used to generate the EUV or X-ray plasma source, whereby said laser beam(s) ?mpact(s) on the fuel target from a side thereof on which an intermediate focus is disposed Also disclosed is a collector for EUV and X-ray applications, in which radiation from a laser produced plasma source is reflected by the collector to an intermediate focus, the line joining the source and intermediate focus defining an optical axis, a first direction on the optical axis being defined from the source to the intermediate focus, characterised by the collector comprising one or more grazing incidence mirrors, and by the collector comprising one or more further optical elements for redirecting a received laser beam so as to be incident upon the source (a) in a second direction, opposite to said first direction, or (b) at an acute angle to said second direction The further optical elements may comprise plane or spherical mirrors and/or lenses, for example disposed on the optical axis Also disclosed is a collector for application at about 13 5 nm with Laser Produced Plasma sources, the collector comprising between 5 and 16 concentrically aligned mirrors, and preferably between 6 and 12 mirrors, that operate at grazing incidence such that the maximum grazing angle between the incident radiation and the reflective surface of the mirrors is about 30°, and more preferably about 25°, in order to allow a maximum collection angle from the source of about 40° to about 85°, and preferably about 45° to about 75° Also disclosed is an EUV lithography system comprising a radiation source, for example a LPP source, the collector, an optical condenser, and a reflective mask

Abstract translation: 用于极紫外（EUV）或X射线应用（包括光刻和成像，例如13 5nm）的集光器光学系统，包括与激光产生等离子体（LPP）源组合的掠入射收集器。在一个实施例中， 更多的光学元件作用于用于生成EUV或X射线等离子体源的一个或多个激光束，由此所述激光束从其上布置有中间焦点的一侧在燃料目标上形成一个或多个（一个或多个） 还公开了用于EUV和X射线应用的收集器，其中来自激光产生的等离子体源的辐射被收集器反射到中间焦点，连接源和中间焦点的线限定光轴，第一方向在 所述光轴由所述源限定到所述中间焦点，其特征在于，所述收集器包括一个或多个掠入射镜，并且所述收集器包括一个或多个用于重定向的其他光学元件 （a）在与所述第一方向相反的第二方向上入射在所述源（a）上，或者（b）与所述第二方向成锐角。所述另外的光学元件可以包括平面或球面镜，以及 /或透镜，例如设置在光轴上。还公开了一种用激光产生的等离子体源在约13.5nm处施加的集光器，该集光器包括5至16个同心对准的反射镜，并且优选地在6至12个反射镜之间， 在掠入射条件下，使得入射辐射与反射镜的反射表面之间的最大掠射角为约30°，并且更优选为约25°，以便允许从约40°至约85°的源的最大收集角 °，优选约45°至约75°。还公开了一种EUV光刻系统，其包括辐射源，例如LPP源，收集器，光学聚光器和反射掩模

公开(公告)号：WO2009115362A1

公开(公告)日：2009-09-24

申请号：PCT/EP2009/050941

申请日：2009-01-28

Applicant: CARL ZEISS SMT AG ,  DINGER, Udo

Inventor： DINGER, Udo

IPC: G03F7/20 ,  G02B17/00

CPC classification number: G03F7/70175 ,  G02B3/0056 ,  G03F7/70108 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: Ein Beleuchtungssystem (11103) für eine Mikrolithographie-Projektionsbelichtungsanlage (11101) umfasst in der Regel ein optisches Element (857, 1057) bestehend aus einer Mehrzahl von Facettenelementen (3, 203, 303, 503, 603, 703, 1003). Die Facettenelemente (3, 203, 303, 503, 603, 703, 1003) sind dabei so angeordnet, dass für jedes Facettenelement (3, 203, 303, 503, 603, 703, 1003) ein Anteil der Seitenflächen des Facettenelements von den Seitenflächen aller anderen Facettenelemente einen gewissen Abstand aufweist. Damit entstehen Zwischenräumen zwischen den Facettenelementen, die nicht optisch genutzt werden. Diese Zwischenräume können zur einfacheren Montage der Facettenelemente (3, 203, 303, 503, 603, 703, 1003) oder auch zur Anbringung von mechanischen Komponenten (215, 317, 533) wie Aktuatoren (317) verwendet werden. Um ein solches optisches Element effizient auszuleuchten wird ein Kollektor (844; 965; 967; 963, 1063) aus einer Mehrzahl von Segmenten verwendet, die teilweise nicht zusammenhängend sind. Alternativ sind aber auch zusammenhängende Segmente mit Knick möglich.

Abstract translation: 一种用于微光刻投影曝光装置（11101）的照明系统（11103）通常包括由多个小面元件（3，203，303，503，603，703，1003）中的光学元件（857，1057）。 小面元件（3，203，303，503，603，703，1003）被布置成使得为每个小面元件（3，203，303，503，603，703，1003）从侧表面的小面元件的侧表面的一部分 所有其它小面元件具有一定的距离。 这样的间隙未使用光学小面元件之间产生的。 这些空间可用于简化小面元件的组件（3，203，303，503，603，703，1003）或用于致动器（317）的机械部件（215，317，533）的附接。 照亮这样的光学元件是一个有效的收集器（844; 963，1063 965; 967）的多个片段中使用它们是不连续的部分中的。 可替换地，然而，与弯曲连续片段是可能的。

公开(公告)号：WO2009106291A1

公开(公告)日：2009-09-03

申请号：PCT/EP2009/001299

申请日：2009-02-24

Applicant: ASML NETHERLANDS B V ,  SOER, Wouter, Anthon ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  YAKURIN, Andrey, Mikhailovich

Inventor： SOER, Wouter, Anthon ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  YAKURIN, Andrey, Mikhailovich

IPC: G02B5/20 ,  G02B5/22 ,  G02B5/26 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical element includes a first layer (4) that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer (2) that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer (3) that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

Abstract translation: 光学元件包括包括第一材料的第一层（4），并且被配置为基本反射第一波长的辐射并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层（2），其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层（3），其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射从顶部 第二层的表面面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：WO2007051638A1

公开(公告)日：2007-05-10

申请号：PCT/EP2006/010570

申请日：2006-11-03

Applicant: CARL ZEISS LASER OPTICS GMBH ,  ANDERL, Willi ,  BINGEL, Ulrich ,  WEIGL, Bernhard ,  DINGER, Udo ,  KUHN, Jochen ,  MARCZUK, Piotr ,  HAFNER, Wolfgang ,  MATTHES, Axel

Inventor： ANDERL, Willi ,  BINGEL, Ulrich ,  WEIGL, Bernhard ,  DINGER, Udo ,  KUHN, Jochen ,  MARCZUK, Piotr ,  HAFNER, Wolfgang ,  MATTHES, Axel

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70891 ,  C25D1/02 ,  C25D5/10 ,  C25D7/00 ,  C25D7/08 ,  G02B7/008 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/065

Abstract: The present invention relates to an optical collector for use in EUV lithography, comprising at least one optically effective element in form of a mirror shell having a substantially cup-shaped structure which heats up when irradiated with light, further comprising at least one mounting element for fastening the at least one optically effective element on a holding structure, the at least one optically effective element having a body, and further comprising an active cooling system, which has at least one cooling conduit to which a cooling medium can be admitted, wherein the at least one cooling conduit is provided on a cooling body which is directly connected with the body of the optically effective element or is integrated in same.

Abstract translation: 本发明涉及一种用于EUV光刻的光学收集器，包括至少一个镜面形式的光学有效元件，该镜壳具有基本杯形结构，其在用光照射时加热，还包括至少一个用于 将所述至少一个光学有效元件紧固在保持结构上，所述至少一个光学有效元件具有主体，并且还包括主动冷却系统，所述主动冷却系统具有至少一个冷却导管，冷却介质可以容纳在所述至少一个冷却导管中，其中， 至少一个冷却导管设置在冷却体上，该冷却体与光学有效元件的主体直接连接或者与冷却体一体化。

公开(公告)号：US20180074410A1

公开(公告)日：2018-03-15

申请号：US15815238

申请日：2017-11-16

Applicant: Carl Zeiss SMT GmbH

Inventor： Matthias Mueller ,  Thomas Fischer ,  Stefan Seitz

IPC: G03F7/20 ,  G02B19/00 ,  G02B26/08 ,  G02B5/08 ,  G02B5/09

CPC classification number: G03F7/70116 ,  G02B5/0891 ,  G02B5/09 ,  G02B19/0023 ,  G02B19/0095 ,  G02B26/0816 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70941 ,  G21K2201/065

Abstract: An illumination optical unit for EUV projection lithography illuminates an object field with illumination light. The illumination optical unit has a first facet mirror including a plurality of first facets on a first mirror carrier. Disposed downstream of the first facet mirror is a second facet mirror including a plurality of second facets arranged on a second mirror carrier around a facet arrangement center. Partial beams of the illumination light are guided superposed on one another into the object field, respectively via illumination channels which have one of the first facets and one of the second facets. Second maximum angle facets are arranged at the edge of the second mirror carrier. The second maximum angle facets predetermine maximum illumination angles of the illumination light which deviate maximally from a chief ray incidence on the object field.

公开(公告)号：US09541685B2

公开(公告)日：2017-01-10

申请号：US13971031

申请日：2013-08-20

Applicant: Carl Zeiss Laser Optics GmbH ,  Carl Zeiss SMT GmbH

Inventor： Holger Kierey ,  Heiko Siekmann ,  Andre Bresan

IPC: G02B5/08 ,  G02B5/20 ,  G02B13/14 ,  F21V9/04 ,  F21V9/06 ,  B24B13/00 ,  G02B1/10 ,  G02B5/10 ,  G02B5/18 ,  G03F7/20

CPC classification number: G02B5/208 ,  B24B13/00 ,  G02B1/10 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/1838 ,  G02B5/1852 ,  G02B5/1857 ,  G03F7/70316 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

Abstract translation: 一种用于制造用于EUV投影曝光装置的反射型光学部件的方法，具有基体的部件和设置在基板上的反射层的部件，其中基板具有光学上的微结构化，包括以下步骤： 微结构化到衬底中，在微结构化已经加工到衬底中之后对衬底进行抛光，将反射层施加到衬底上。 用于EUV投影曝光装置的反射型光学部件对应地具有在微结构化和反射层之间的抛光表面。

公开(公告)号：US09041904B2

公开(公告)日：2015-05-26

申请号：US13331549

申请日：2011-12-20

Applicant: Alton H. Phillips

Inventor： Alton H. Phillips

IPC: G03B27/52 ,  G02B7/18 ,  G02B5/08 ,  G03F7/20 ,  G21K1/06

CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger includes at least one well defined therein. The mirror assembly includes a mirror block having a mirrored surface. The mirror assembly also has at least one surface. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The at least one surface is in contact with the liquid metal to transfer heat from the mirror block to the heat exchanger.

Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，一种装置包括热交换器，反射镜组件和第一液态金属界面。 热交换器包括至少一个井。 镜组件包括具有镜面的镜块。 镜组件还具有至少一个表面。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 所述至少一个表面与所述液态金属接触以将热量从所述镜块传递到所述热交换器。

公开(公告)号：US20130176614A1

公开(公告)日：2013-07-11

申请号：US13753127

申请日：2013-01-29

Applicant: Carl Zeiss Laser Optics GmbH

Inventor： Willi Anderl ,  Holger Kierey ,  Markus Bauer ,  Jens Kugler

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  G02B5/0808 ,  G02B5/1861 ,  G02B7/1815 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/065 ,  G21K2201/067

Abstract: An EUV collector mirror shell of an EUV collector for EUV lithography includes a body which has a light incidence-side front part having a reflective optically active area, a rear part, and a cavity between the front and rear parts. The cavity extends essentially along the entire optically active area, and the cavity serves to receive a cooling medium. The body also has at least one inlet and at least one outlet for the cooling medium. A plurality of flow-influencing elements are in the cavity, extending from the front part to the rear part, and connecting the front part to the rear part and monolithically formed with the front and rear parts.

Abstract translation: 用于EUV光刻的EUV收集器的EUV收集器镜壳包括具有光入射侧前部具有反射光学有效区域，后部以及前部和后部之间的空腔的主体。 空腔基本上沿着整个光学有效区域延伸，并且空腔用于接收冷却介质。 主体还具有用于冷却介质的至少一个入口和至少一个出口。 多个流量影响元件位于空腔中，从前部延伸到后部，并且将前部连接到后部并且与前部和后部整体地形成。

公开(公告)号：US20120099088A1

公开(公告)日：2012-04-26

申请号：US13331549

申请日：2011-12-20

Applicant: Alton H. Phillips

Inventor： Alton H. Phillips

IPC: G03B27/70 ,  G02B7/195

CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The minor assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first minor block to the heat exchanger.

Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 次要组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一小块转移到热交换器。

公开(公告)号：US20110181860A1

公开(公告)日：2011-07-28

申请号：US12657650

申请日：2010-01-25

Applicant: John E. Hill ,  Robert J. Munns

Inventor： John E. Hill ,  Robert J. Munns

IPC: G03B27/72 ,  G02B5/08

CPC classification number: G21K1/067 ,  G02B7/1815 ,  G02B7/182 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/70891 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A cooled spider for grazing-incidence collectors includes an outer ring, an inner ring and spokes that mechanically and fluidly connect the inner and outer rings. Cooling channels in the outer and inner rings and in the spokes define a general cooling-fluid flow path through the spider. The general cooling-fluid flow path has input and output points located substantially 180° apart so that the flow path diverges at the input point into two branch flow paths that flow in opposite directions through the spider, and then converge at the output point. Input and output cooling fluid manifolds are fluidly connected to the outer ring at the input and output points and serve to flow cooling fluid over the cooling-fluid flow path.

Abstract translation: 用于放牧收集器的冷却的蜘蛛包括机械地和流体地连接内圈和外圈的外圈，内圈和轮辐。 外环和内环和轮辐中的冷却通道限定通过该蜘蛛的通用冷却液流动路径。 一般的冷却流体流动路径具有大致相距180°的输入和输出点，使得流动路径在输入点处分叉成两个分支流动路径，该分支流动路径沿相反方向流过蜘蛛，然后在输出点处会聚。 输入和输出冷却流体歧管在输入和输出点处流体地连接到外环，并用于使冷却流体流过冷却流体流动路径。