公开(公告)号：US07759661B2

公开(公告)日：2010-07-20

申请号：US11706075

申请日：2007-02-13

Applicant: Tzvi Avnery

Inventor： Tzvi Avnery

IPC: G21G1/04 ,  G21K5/02 ,  A61L2/08

CPC classification number: G21K5/04 ,  A61L2202/23 ,  B65B55/08 ,  H01J33/02

Abstract: An electron beam emitter including a vacuum chamber having a width. An electron generator can be positioned within the vacuum chamber for generating electrons. An elongate nozzle can extend from the vacuum chamber along a longitudinal axis and have an exit window at a distal end of the nozzle. The nozzle can have a width that is less than the width of the vacuum chamber. The electron generator can be shaped and dimensioned, and positioned with the vacuum chamber to form and direct a narrow electron beam that enters and travels through the nozzle, and exits out the exit window.

Abstract translation: 一种电子束发射器，包括具有宽度的真空室。 电子发生器可以位于真空室内以产生电子。 细长的喷嘴可以沿着纵向轴线从真空室延伸并且在喷嘴的远端具有出口窗口。 喷嘴的宽度可以小于真空室的宽度。 电子发生器的形状和尺寸可以与真空室一起定位，以形成并引导进入并穿过喷嘴的窄电子束，并从出射窗口离开。

公开(公告)号：US20070114434A1

公开(公告)日：2007-05-24

申请号：US11320515

申请日：2005-12-28

Applicant: Sha Chang ,  Otto Zhou

Inventor： Sha Chang ,  Otto Zhou

IPC: G01K1/08

CPC classification number: H01J37/304 ,  G21K5/04 ,  H01J33/02 ,  H01J33/04 ,  H01J37/302 ,  H01J37/317 ,  H01J2201/30469 ,  H01J2237/0635 ,  H01J2237/2004 ,  H01J2237/2006 ,  H01J2237/316

Abstract: Multi-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually addressable electron field emitters sealed in a vacuum. The multi-pixel electron microbeam irradiator system can include an anode comprising one or more electron permeable portions corresponding to the plurality of electron field emitters. Further, the multi-pixel electron microbeam irradiator system can include a controller operable to individually control electron extraction from each of the electron field emitters for selectively irradiating predetermined locations such as cells or cell locations.

Abstract translation: 提供了多像素电子微束照射器系统和方法，其特别适用于选择性地照射预定的细胞或细胞位置。 多像素电子微束照射器系统可以包括在真空中密封的多个可单独寻址的电子场发射器。 多像素电子微束照射器系统可以包括阳极，该阳极包括对应于多个电子场发射体的一个或多个电子透过部分。 此外，多像素电子微束照射器系统可以包括控制器，其可操作以单独地控制来自每个电子场发射器的电子提取，以选择性地照射诸如单元或单元位置的预定位置。

公开(公告)号：US20070114432A1

公开(公告)日：2007-05-24

申请号：US11258212

申请日：2005-10-26

Applicant: Anders Kristiansson ,  Lars-Ake Naslund ,  Hans Hallstadius ,  Anders Olsson

Inventor： Anders Kristiansson ,  Lars-Ake Naslund ,  Hans Hallstadius ,  Anders Olsson

IPC: H01J3/14

CPC classification number: H01J33/02 ,  A61L2/087 ,  H01J2237/244

Abstract: A detector is disclosed for sensing an intensity of an electron beam generated along a path. An exemplary detector includes an exposed conductor attached to a support which is configured to locate the exposed conductor within a path of an electron beam; a grounded conductor isolated from the exposed conductor, the grounded conductor partly surrounding the exposed conductor to form a plasma shield having a window positioned at least in a direction of the electron beam path.

Abstract translation: 公开了一种用于感测沿着路径产生的电子束的强度的检测器。 示例性检测器包括附接到支撑件的暴露导体，其被配置为将暴露的导体定位在电子束的路径内; 与暴露的导体隔离的接地导体，接地导体部分围绕暴露的导体以形成具有至少位于电子束路径的方向上的窗口的等离子体屏蔽。

公开(公告)号：US20040245481A1

公开(公告)日：2004-12-09

申请号：US10796796

申请日：2004-03-08

Applicant: Advanced Electron Beams, Inc.

Inventor： Tzvi Avnery

IPC: G01N023/00

CPC classification number: G21K5/04 ,  A61L2/0011 ,  A61L2/08 ,  H01J33/02

Abstract: An apparatus for irradiating surfaces includes an electron beam generator for generating a beam of electrons. The beam of electrons exits the electron beam generator through an exit window. A robotic device moves the beam of electrons over the surfaces to irradiate selected regions of the surfaces. The robotic device includes a propulsion system for propelling the robotic device.

Abstract translation: 用于照射表面的装置包括用于产生电子束的电子束发生器。 电子束通过出射窗离开电子束发生器。 机器人装置将电子束移动到表面上以照射表面的选定区域。 机器人装置包括用于推进机器人装置的推进系统。

公开(公告)号：US06570162B2

公开(公告)日：2003-05-27

申请号：US09926744

申请日：2001-12-11

Applicant: Masahiro Kiga ,  Atsushi Nakamura

Inventor： Masahiro Kiga ,  Atsushi Nakamura

IPC: H01J3710

CPC classification number: H01J33/00 ,  H01J33/02

Abstract: A method and apparatus (11) for irradiating an electron beam, wherein a triangular wave generator (22) provides a triangular wave current to a scanning coil (17) to move the electron beam in a first scanning direction (Y), while a square wave generator (21) provides a square wave current to a deflecting coil (16) to move the electron beam in a second scanning direction (X) orthogonal to the first scanning direction (Y). The triangular wave current provided from the triangular wave generator is modulated to cancel the effects of hysteresis in the scanning coil. Further, the rise of the square wave current is synchronized and shifted a prescribed interval in relation to the peak values of the triangular wave current in order to distribute the reversing points on the electron beam path along the second scanning direction.

公开(公告)号：US20020134946A1

公开(公告)日：2002-09-26

申请号：US09926744

申请日：2001-12-11

Inventor： Masahiro Kiga ,  Atsushi Nakamura

IPC: H01J003/14

CPC classification number: H01J33/00 ,  H01J33/02

Abstract: A method and apparatus (11) for irradiating an electron beam, wherein a triangular wave generator (22) provides a triangular wave current to a scanning coil (17) to move the electron beam in a first scanning direction (Y), while a square wave generator (21) provides a square wave current to a deflecting coil (16) to move the electron beam in a second scanning direction (X) orthogonal to the first scanning direction (Y). The triangular wave current provided from the triangular wave generator is modulated to cancel the effects of hysteresis in the scanning coil. Further, the rise of the square wave current is synchronized and shifted a prescribed interval in relation to the peak values of the triangular wave current in order to distribute the reversing points on the electron beam path along the second scanning direction.

Abstract translation: 一种用于照射电子束的方法和装置（11），其中三角波发生器（22）向扫描线圈（17）提供三角波电流以沿第一扫描方向（Y）移动电子束，而方波 波发生器（21）向偏转线圈（16）提供方波电流，以沿与第一扫描方向（Y）正交的第二扫描方向（X）移动电子束。 由三角波发生器提供的三角波电流被调制以消除扫描线圈中的滞后效应。 此外，方波电流的上升相对于三角波电流的峰值被同步并移位规定的间隔，以便沿着第二扫描方向将反转点分布在电子束路径上。

公开(公告)号：US5955829A

公开(公告)日：1999-09-21

申请号：US934678

申请日：1997-09-22

Applicant: Ulf Seyfert ,  Olaf Roder ,  Siegfried Schiller ,  Siegfried Panzer ,  Robert Mohs

Inventor： Ulf Seyfert ,  Olaf Roder ,  Siegfried Schiller ,  Siegfried Panzer ,  Robert Mohs

IPC: H01J33/02 ,  H01J37/065 ,  H01J1/46

CPC classification number: H01J33/02 ,  H01J37/065

Abstract: Electron gun with band-shaped beams that includes a vacuum chamber extend in a longitudinal direction, a beam window running in the longitudinal direction along the vacuum chamber, and a cathode control-electrode system positioned within the vacuum chamber in the longitudinal direction. The cathode control-electrode system includes at least one substantially straight cathode positioned substantially parallel to a longitudinal axis of the cathode control-electrode system and the at least one substantially straight cathode has bulges formed at defined distances. The bulges are shaped to produce a substantially homogeneous current density distribution along the at least one substantially straight cathode and support units are located in the cathode control-electrode system to correspond with the bulges. The bulges are removably couplable to the support units.

Abstract translation: 具有带状梁的电子枪，其包括在纵向方向上延伸的真空室，沿着该真空室在纵向方向上延伸的梁窗，以及沿纵向方向定位在真空室内的阴极控制电极系统。 阴极控制电极系统包括基本上平行于阴极控制电极系统的纵轴定向的至少一个基本上直的阴极，并且至少一个基本上直的阴极具有以限定的距离形成的凸起。 凸起成形为沿着至少一个基本上直的阴极产生基本均匀的电流密度分布，并且支撑单元位于阴极控制电极系统中以对应于凸起。 凸起可拆卸地联接到支撑单元。

公开(公告)号：US5631471A

公开(公告)日：1997-05-20

申请号：US528957

申请日：1995-09-15

Applicant: Peter Anderl ,  Klaus Bloemer ,  Alfred Mueller ,  Ulrich Schwab ,  Eberhard Hartmann ,  Reiner Mehnert ,  Alexander Mende

Inventor： Peter Anderl ,  Klaus Bloemer ,  Alfred Mueller ,  Ulrich Schwab ,  Eberhard Hartmann ,  Reiner Mehnert ,  Alexander Mende

IPC: B05D3/06 ,  H01J33/02 ,  H01J37/065

CPC classification number: H01J33/02 ,  B05D3/068

Abstract: The invention relates to a device to irradiate surfaces with electrons, especially to harden surface layers. The device includes a vacuum chamber that has an electron beam window; an electron beam-permeable film that closes off the vacuum chamber from the ambient medium; and an electron beam generating system, consisting of a cathode and a forming electrode which are connected to a high-voltage and beam current feed line. In order to achieve an increase of the electron beam power and to reduce the energy losses during the transfer out of the electron beam window in such a device, according to the invention, the forming electrode is designed as a tubular hollow body with inner hollow space lengthwise dividers and with a lengthwise slit that is open towards the electron beam window. A wire-shaped cathode is arranged in each hollow space segment divided off by the hollow space lengthwise divider.

Abstract translation: 本发明涉及一种用电子照射表面的装置，特别涉及硬化表面层。 该装置包括具有电子束窗的真空室; 一个电子束可透过的膜，它从真空室中封闭环境介质; 以及由阴极和成形电极组成的电子束产生系统，其连接到高压和束电流馈送线。 根据本发明，为了实现电子束功率的增加和减少在这种装置中的电子束窗口传送期间的能量损失，成形电极被设计成具有内部中空空间的管状空心体 并且具有向电子束窗开放的纵向狭缝。 在由中空空间纵向分隔线分隔的每个中空空间段中布置有线状阴极。

公开(公告)号：US5523577A

公开(公告)日：1996-06-04

申请号：US360372

申请日：1994-12-21

Applicant: Peter R. Schonberg ,  Russell G. Schonberg ,  David R. Fadness

Inventor： Peter R. Schonberg ,  Russell G. Schonberg ,  David R. Fadness

IPC: A62D3/00 ,  A62D3/15 ,  A62D3/34 ,  A62D3/38 ,  A62D101/20 ,  A62D101/22 ,  B01D53/00 ,  B01D53/32 ,  B01D53/34 ,  B01D53/75 ,  B01J19/08 ,  B01J19/12 ,  B01J19/24 ,  B09C1/00 ,  B09C1/06 ,  B09C1/08 ,  C02F1/00 ,  C02F1/30 ,  C02F1/72 ,  C02F1/76 ,  C02F1/78 ,  H01J33/00 ,  H01J33/02

CPC classification number: B01D53/007 ,  A62D3/15 ,  B01D53/323 ,  B01D53/75 ,  B01J19/085 ,  B01J19/2415 ,  B01J19/2425 ,  B09C1/00 ,  B09C1/06 ,  B09C1/08 ,  C02F1/30 ,  C02F1/722 ,  C02F1/76 ,  C02F1/766 ,  C02F1/78 ,  H01J33/00 ,  H01J33/02 ,  A62D2101/20 ,  A62D2203/10 ,  B01D2257/708 ,  B01D2259/812 ,  B01J2219/00076 ,  B01J2219/00103 ,  B01J2219/00132 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/00162 ,  C02F1/008 ,  C02F1/305

Abstract: An electron beam source or generator is described for the treatment of toxic materials in a treatment system in which electron beams are reacted with a flowing influent in a reaction chamber. The system is modular allowing different configurations as demanded by the site and by the clean-up job. It is also portable in that it can be easily moved from place to place. If mounted on a movable base it can be taken from place to place for use.

公开(公告)号：WO2013004562A1

公开(公告)日：2013-01-10

申请号：PCT/EP2012/062450

申请日：2012-06-27

Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A. ,  WITTWER, Hans ,  HOSTETTLER, Urs ,  WABER, Toni ,  REUSSER, Hans

Inventor： WITTWER, Hans ,  HOSTETTLER, Urs ,  WABER, Toni ,  REUSSER, Hans

IPC: G21K5/02 ,  H01J1/88

CPC classification number: H01J1/88 ,  G21K5/02 ,  H01J9/36 ,  H01J33/02

Abstract: A cathode-housing suspension of an electron beam device having a tubular body of elongate shape with an exit window extending in the longitudinal direction and a connector end in one end of the tubular body is disclosed. The electron beam device further comprises a cathode housing having an elongate shape and comprising a free end and an attachment end remote to the free end, and the attachment end comprises an outwardly extending flange (116) provided with threaded openings for set screws (124) and non-threaded openings for attachment bolts (122), for attaching the attachment end to a corresponding socket (118) of the tubular body, wherein means (120) configured to bias the attachment end away from the socket are arranged in the tubular body.

Abstract translation: 公开了一种具有细长形状管状体的电子束装置的阴极 - 壳体悬架，其具有在纵向方向上延伸的出射窗口和在管状体的一端中的连接器端部。 电子束装置还包括具有细长形状并且包括远离自由端的自由端和附接端的阴极壳体，并且附接端包括设置有用于固定螺钉（124）的螺纹开口的向外延伸的凸缘（116） 和用于附接螺栓（122）的非螺纹开口，用于将连接端附接到管状体的相应插口（118），其中构造成将附接端偏离插座的装置（120）布置在管状体 。