公开(公告)号：WO2014190908A1

公开(公告)日：2014-12-04

申请号：PCT/CN2014/078663

申请日：2014-05-28

Applicant: 先健科技(深圳)有限公司

Inventor： 张德元 ,  王文彬 ,  刘自强

IPC: A61F2/82

CPC classification number: A61L31/022 ,  A61L31/148 ,  A61L31/16 ,  C23C8/02 ,  C23C8/26 ,  C23C8/38 ,  C23C8/80 ,  C23F1/00 ,  H01J37/00 ,  H01J2237/316

Abstract: 一种铁基合金医疗器械的制作方法，包括：对350-550°C的铁基合金预制件渗氮30-100分钟；离子刻蚀所述铁基合金预制件，所述离子刻蚀时间为渗氮时间的80%-110%。使用该制作方法可在同一设备原位进行离子渗氮和离子刻蚀，具有较高的生产效率；且离子渗氮和离子刻蚀工艺中，氮原子持续渗入预制件内，使医疗器械被人体吸收的时间、器械表面硬度和强度都达到要求。

公开(公告)号：EP3316912A1

公开(公告)日：2018-05-09

申请号：EP16817376.3

申请日：2016-06-26

Applicant: Technion Research & Development Foundation Ltd. ,  Yeda Research and Development Co. Ltd

Inventor： BLANK, Aharon ,  KATZ, Itai ,  FEINTUCH, Akiva

IPC: A61K49/20 ,  G01R33/28 ,  G01R33/56 ,  H01J37/00

CPC classification number: G01R33/5601 ,  A61B5/055 ,  A61K49/20 ,  A61M5/007 ,  A61M2005/006 ,  G01R33/282 ,  G01R33/4806 ,  G01R33/62 ,  H01J37/00

Abstract: A method for the preparation of a highly polarized nuclear spins containing sample of an organic or inorganic material, containing H or OH groups or adsorbed water molecules. Such highly polarized nuclear spins containing samples can be subjected to nuclear magnetic resonance (NMR) measurement and/or can be thawed and immediately administered to an individual undergoing a magnetic resonance imaging (MRI) scan. The method is based on generating unstable radicals on the surface of the sample in the presence of ionized environment followed by cooling the sample to cryogenic temperatures. A device for carrying out a particular step of said method is also discloses.

公开(公告)号：EP2629079A3

公开(公告)日：2017-12-20

申请号：EP13155360.4

申请日：2013-02-15

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Stegmann, Heiko

IPC: G01N1/28 ,  G01N1/32 ,  H01J37/00

CPC classification number: G01N23/04 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/045 ,  G01N2001/2886 ,  H01J37/00 ,  H01J37/317 ,  H01J2237/206 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Verfahren und Vorrichtungen zur Präparation mikroskopischer Proben mittels Lichtpulsen, wobei Volumen abgetragen werden, die größer als 100 µm 3 sind. Das Verfahren umfasst folgende Schritte:
- Inspizieren eines Objekts mittels eines Rasterelektronenmikroskops (REM) oder eines fokussierten Ionenstrahls (FIB), wobei ein Bild des Objekts aufgenommen wird
- Festlegen eines zu untersuchenden Bereichs des Objekts
- Festlegen eines Laser-Bearbeitungsweges anhand des Bilds des Objekts derart, dass eine Probe aus dem Objekt herauspräpariert werden kann.
- Entfernen eines abzutragenden Volumens durch Laserbearbeitung entlang des festgelegten Laser-Bearbeitungswegs
- Inspizieren des Objekts mittels Rasterelektronenmikroskop (REM) oder fokussiertem Ionenstrahl (FIB).

Abstract translation: 通过光脉冲制备微观样品的方法和设备，其中除去的体积大于100微米。 该方法包括以下步骤： - 使用扫描电子显微镜（SEM）或聚焦离子束（FIB）检查物体，所述物体的图像被拾取 - 设置对象的被调查区域 - 设置的激光加工路径基于所述对象的图像上 使得可以从物体制备样品。 - 通过激光加工沿指定的激光加工路径去除要去除的体积 - 通过扫描电子显微镜（SEM）或聚焦离子束（FIB）检查物体。

公开(公告)号：EP3222539A4

公开(公告)日：2017-11-29

申请号：EP15860506

申请日：2015-11-17

Applicant: HITACHI SHIPBUILDING ENG CO

Inventor： SASAKI KAZUAKI ,  YOKOBAYASHI TAKAYASU ,  TAKEDA SHINICHI

IPC: B65B55/08 ,  A61L2/08 ,  B65B55/04 ,  G21K5/00 ,  H01J37/00

CPC classification number: A61L2/087 ,  A61L2202/23 ,  B65B55/04 ,  B65B55/08 ,  G21K5/00 ,  H01J37/00

Abstract: An electron beam sterilization device includes: a sterilization chamber (6) in which electron beams are applied to containers to perform sterilization; a blocking cover member that covers the sterilization chamber (6) and blocks radiations; and a rotational member having an upper portion exposed through an opening portion (44) formed in the blocking cover member. The blocking cover member includes a fixed blocking cover (41) that covers the upper portion of the rotational member. Between the rotational member and the fixed blocking cover (41), there are provided a rotational annular blocking plate (64) that projects from the rotational member toward the fixed blocking cover (41) and a fixed annular blocking plate (65) that projects from the blocking cover member toward the rotational member. The rotational annular blocking plate (64) and the fixed annular blocking plate (65) face each other with a blocking gap (66) therebetween. The rotational annular blocking plate (64) and the fixed annular blocking plate (65) constitute a blocking lap portion (67) that blocks radiations.

公开(公告)号：EP3222540A1

公开(公告)日：2017-09-27

申请号：EP15861399.2

申请日：2015-11-17

Applicant: Hitachi Zosen Corporation

Inventor： SASAKI Kazuaki ,  YOKOBAYASHI Takayasu ,  TAKEDA Shinichi

IPC: B65B55/08 ,  A61L2/08 ,  B65B55/04

CPC classification number: A61L2/087 ,  A61L2202/121 ,  A61L2202/23 ,  H01J37/00

Abstract: An electron beam sterilization device (1) includes a rotational member (22) that rotates around vertical rotational shafts (33), (34), and the rotational member (22) includes an upper stage (25), a middle stage (27), and a lower stage (26). On the upper stage (25), there are provided a plurality of electron beam emission units (15) arranged along the circumferential direction. On the middle stage (27), there is provided a retaining device (17) that retains a container (2). On the lower stage (26), there are provided a plurality of power supply units (71) that supply power to the electron beam emission units (15). Power supply cables (72) extend from the power supply units (71) to the upper stage (25) along the rotational shafts (33), (34) and are connected to the electron beam emission units (15).

Abstract translation: 本发明的电子射线杀菌装置（1）具有以垂直旋转轴（33），（34）为中心旋转的旋转部件（22），旋转部件（22）具有上层（25），中层（27） ，和下级（26）。 在上层（25）上，设置有沿圆周方向排列的多个电子束发射单元（15）。 在中间台架（27）上，设有保持容器（2）的保持装置（17）。 在下层（26）上，设置有多个向电子束发射单元（15）供电的电源单元（71）。 电源电缆72沿着旋转轴33,34从电源单元71延伸到上层25并连接到电子束发射单元15。

公开(公告)号：EP2870835A4

公开(公告)日：2016-03-09

申请号：EP13819589

申请日：2013-06-30

Applicant: TRIBOFILM RES INC

Inventor： THORNTON JACKSON ,  SAKHRANI VINAY ,  TOMASINO CHARLES ,  MINEO ROBERT

IPC: H05H7/12 ,  A61M5/31 ,  C10M107/50 ,  C10M177/00 ,  H01J37/00

CPC classification number: C10M107/50 ,  A61M5/3129 ,  A61M5/31513 ,  A61M2005/3131 ,  C10M107/38 ,  C10M147/04 ,  C10M155/02 ,  C10M177/00 ,  C10M2213/0606 ,  C10M2229/0405 ,  C10M2229/0415 ,  C10N2230/06 ,  C10N2240/66 ,  C10N2280/00 ,  H01J37/00 ,  H01J37/321 ,  H01J37/32192 ,  H05H2001/466 ,  H05H2001/4667

公开(公告)号：EP2253009A4

公开(公告)日：2015-10-14

申请号：EP09709743

申请日：2009-02-11

Applicant: PURDUE RESEARCH FOUNDATION

Inventor： OUYANG ZHENG ,  HARPER JASON ,  CHARIPAR NICHOLAS ,  COOKS ROBERT

IPC: H01J49/14 ,  H01J49/10 ,  H05H1/24

CPC classification number: H01J37/32009 ,  H01J27/022 ,  H01J37/00 ,  H01J37/32348 ,  H01J49/02 ,  H01J49/105 ,  H01J49/142 ,  H01J2237/0044 ,  H05H1/24 ,  H05H1/2406 ,  H05H1/30 ,  H05H2001/2412 ,  H05H2001/2443 ,  H05H2240/10 ,  H05H2240/20 ,  Y10T436/145555 ,  Y10T436/147777 ,  Y10T436/173076 ,  Y10T436/203332 ,  Y10T436/24

Abstract: The present invention generally relates to a low temperature plasma probe for desorbing and ionizing at least one analyte in a sample material and methods of use thereof. In one embodiment, the invention generally relates to a low temperature plasma probe including: a housing having a discharge gas inlet port, a probe tip, two electrodes, and a dielectric barrier, in which the two electrodes are separated by the dielectric barrier, in which application of voltage from a power supply generates a low temperature plasma, and in which the low temperature plasma is propelled out of the discharge region by the electric field and/or the discharge gas flow.

公开(公告)号：EP2870835A1

公开(公告)日：2015-05-13

申请号：EP13819589.6

申请日：2013-06-30

Applicant: Tribofilm Research, INC.

Inventor： THORNTON, Jackson ,  SAKHRANI, Vinay ,  TOMASINO, Charles ,  MINEO, Robert

IPC: H05H7/12

CPC classification number: C10M107/50 ,  A61M5/3129 ,  A61M5/31513 ,  A61M2005/3131 ,  C10M107/38 ,  C10M147/04 ,  C10M155/02 ,  C10M177/00 ,  C10M2213/0606 ,  C10M2229/0405 ,  C10M2229/0415 ,  C10N2230/06 ,  C10N2240/66 ,  C10N2280/00 ,  H01J37/00 ,  H01J37/321 ,  H01J37/32192 ,  H05H2001/466 ,  H05H2001/4667

Abstract: The present application is directed to methods and devices for altering material properties of lubricants and other cross-linkable compounds comprising organic or organometallic materials through exposure to energized gaseous species. The energized gaseous species may create reactive sites among lubricant molecules that may alter their material properties by cross-linking at least a portion of the lubricant molecules. The cross-linked lubricant may reduce the ability of the lubricant to migrate away when force is applied between lubricated sliding friction surfaces.

公开(公告)号：RU2016124807A

公开(公告)日：2018-01-16

申请号：RU2016124807

申请日：2014-11-12

IPC: B01J8/12 ,  A01C1/08 ,  A61L2/08 ,  B01J19/08 ,  H01J37/06

CPC classification number: A01C1/08 ,  A61L2/087 ,  A61L2/26 ,  A61L2202/11 ,  B01J8/12 ,  B01J19/085 ,  B01J2219/0815 ,  B01J2219/0833 ,  B01J2219/0879 ,  H01J37/00 ,  H01J37/06 ,  H01J2237/06375 ,  H01J2237/15

公开(公告)号：WO2018063325A1

公开(公告)日：2018-04-05

申请号：PCT/US2016/054781

申请日：2016-09-30

Applicant: INTEL CORPORATION

Inventor： TANDON, Shakul ,  PHILLIPS, Mark C. ,  OGADHOH, Shem O. ,  SWANSON, John A.

IPC: H01L21/027 ,  G03F7/20 ,  G03F1/78

CPC classification number: G03F7/2059 ,  G03F7/2024 ,  H01J37/00 ,  H01J37/3177 ,  H01J2237/024 ,  H01L21/027

Abstract: Lithographic apparatuses suitable for complementary e-beam lithography (CEBL) are described. In an example, method of forming a pattern for a semiconductor structure including forming a pattern of parallel lines above a substrate. The method also includes aligning the substrate in an e-beam tool to provide the pattern of parallel lines parallel with a scan direction of the e-beam tool. The e-beam tool includes a blanker aperture array (BAA) having a staggered pair of columns of openings along an array direction. The array direction has an acute rotation angle from an axis orthogonal to the scan direction. The method also includes forming a pattern of cuts or vias in or above the pattern of parallel lines to provide line breaks for the pattern of parallel lines by scanning the substrate along the scan direction.

Abstract translation: 描述了适用于互补电子束光刻（CEBL）的光刻设备。 在一个示例中，形成用于半导体结构的图案的方法包括在衬底上方形成平行线的图案。 该方法还包括在电子束工具中对准衬底以提供与电子束工具的扫描方向平行的平行线的图案。 电子束工具包括沿着阵列方向具有交错的一对开口列的阻断开口阵列（BAA）。 阵列方向与正交于扫描方向的轴具有锐角旋转角度。 该方法还包括在平行线的图案中或上方形成切口或过孔的图案，以通过沿着扫描方向扫描衬底来为平行线图案提供断线。