公开(公告)号：EP2806315A3

公开(公告)日：2016-04-13

申请号：EP14169164.2

申请日：2014-05-20

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Kong, Ching Tom

IPC: G04D3/00 ,  G04B19/12

CPC classification number: G04B19/268 ,  C23C14/35 ,  G03F7/20 ,  G03F7/26 ,  G04B19/12 ,  G04D3/0092

Abstract: A method of fabricating a component including a wafer for use in a watch includes depositing a first thin film (301) onto the wafer (300), the first thin film being adapted to allow light reflected away from the wafer to be indicative of a first colour characteristic. The first thin film (301) may include silicon nitride and have a refractive index greater than 2. The method may also include defining a pattern (12, 13) on the first thin film (301) using photolithography and processing a region within a boundary of the pattern, e.g. by depositing a metal or a ceramic material within the boundary of the pattern, so that the region allows light reflected away from the wafer (300) to be indicate of a second colour characteristic.

公开(公告)号：EP2833221A2

公开(公告)日：2015-02-04

申请号：EP14178831.5

申请日：2014-07-28

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Ching, Ho

IPC: G04B17/06 ,  G04D3/00

CPC classification number: G04B17/066 ,  G04B17/32 ,  G04B17/325 ,  G04D3/0041 ,  Y10T29/49579

Abstract: A method of producing unitary formed silicon balance spring (2) having an overcoil portion for regulation of a mechanical timepiece includes providing a silicon balance spring (2) having a main body portion (23), and an outer portion (22) for formation as an overcoil portion, wherein the outer portion (22) extends radially outward from an outermost turn of the main body portion (23) and wherein said main body portion (23) and said outer portion (22) are integrally formed from a silicon based material and are formed in a co-planar configuration. The outer portion (22) is moved in a direction relative to and out of the plane of said main body portion (23), and in a direction towards over said main body portion (23) and towards the plane of the main body portion. A stress relaxation process is provided to the balance spring so as to relieve internal stresses induced within the balance spring from the second step. After movement of said outer portion (22) into the plane of said main body portion (23), the outer portion (22) is located in an overcoil configuration relative to said main body portion.

Abstract translation: 一种制造具有用于调节机械钟表的上线圈部分的单一成形硅平衡弹簧（2）的方法包括提供具有主体部分（23）的硅平衡弹簧（2）和用于形成的外部部分（22） 一个线圈部分，其中外部部分（22）从主体部分（23）的最外侧的圆周向外延伸，并且其中所述主体部分（23）和所述外部部分（22）由硅基材料 并且形成为共面构造。 外部部分22沿着相对于主体部分23的平面的方向移动，并朝向主体部分23上方向主体部分的平面移动。 向平衡弹簧提供应力松弛过程，以便缓解来自第二步骤的平衡弹簧内部引起的内应力。 在所述外部部分（22）移动到所述主体部分（23）的平面中之后，所述外部部分（22）相对于所述主体部分位于线圈结构中。

公开(公告)号：EP3890784A1

公开(公告)日：2021-10-13

申请号：EP19892949.9

申请日：2019-12-03

Applicant: Master Dynamic Limited

Inventor： CHENG, Ka Wing ,  HUI, Koon Chung ,  KONG, Ching Tom

IPC: A61K47/68 ,  A61K47/64 ,  A61K47/54 ,  A61P35/00

公开(公告)号：EP3133185B1

公开(公告)日：2019-10-30

申请号：EP16001369.4

申请日：2016-06-17

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Miao, Shunan ,  Kong, Ching Tom

IPC: B05D1/18 ,  C23C14/30 ,  C23C14/34 ,  C23C16/505 ,  C23C14/50 ,  A01N33/12 ,  A01N37/02 ,  A01N43/06 ,  B05D1/36 ,  B05D3/10 ,  C23C14/02 ,  C23C14/14 ,  C23C14/22 ,  A01N43/16

公开(公告)号：EP3423901A1

公开(公告)日：2019-01-09

申请号：EP17759245.8

申请日：2017-03-01

Applicant: Master Dynamic Limited

Inventor： WANG, Yingnan ,  KONG, Ching Tom

IPC: G03F7/04 ,  C25D1/10

公开(公告)号：EP2755093B1

公开(公告)日：2017-09-27

申请号：EP14151118.8

申请日：2014-01-14

Applicant: Master Dynamic Limited

Inventor： Chu, Siu Kay ,  Ching, Ho ,  Ko, Pui Hang

IPC: G04B17/34

CPC classification number: G04B17/345

公开(公告)号：EP3131724A1

公开(公告)日：2017-02-22

申请号：EP15779777.0

申请日：2015-04-16

Applicant: Master Dynamic Limited

Inventor： WANG, Yingnan ,  KONG, Ching Tom

IPC: B28D5/00 ,  B44B7/00 ,  B44C1/00 ,  B81C1/00 ,  B82B3/00 ,  G03F7/00

CPC classification number: B44C1/227 ,  B28D5/00 ,  G03F7/00 ,  G03F7/0002 ,  H01J37/321 ,  H01J37/32192 ,  H01J2237/334

Abstract: A method of forming a non-optically detectable identifiable mark at an outer surface of an article formed from a solid state material, said method including the steps of forming a plurality of recesses within a predetermined region of a photoresist 5 applied to an outer surface of an article formed from a solid state material, wherein said plurality of recesses is formed by two-photon absorption lithography and wherein said one or more recesses extend at least partially through the photoresist and from an outer surface of the photoresist and towards said outer surface of the article 10 formed from a solid state material; and applying an etching process such that at least a portion of the outer surface of said article is exposed and etched so as to form a plurality of etched portions extending into said article from the outer surface of the article and corresponding to said plurality of recesses; wherein said predetermined region of said photoresist defines an identifiable mark to be applied to the outer 15 surface of said article; wherein said plurality of etched portions forms the nonoptically identifiable mark on the outer surface of said article; and wherein the maximum width of the etched portions of is less than 200 nm such that the identifiable mark is non-optically detectable in the visible light spectrum.

Abstract translation: 在从固态材料形成的制品的外表面上形成非光学可检测的识别标记的方法，所述的方法包括在的外表面适用于光致抗蚀剂的预定区域内形成的凹部中的多个步骤 物品从固态材料形成，worin凹部，所述多个被双光子吸收的光刻技术形成和worin所述一个或多个凹部通过光致抗蚀剂，并从在所述光致抗蚀剂的外表面和朝向的所述外表面至少部分地延伸 形成了从固态材料制品; 和施加到蚀刻工艺搜索做至少所述物品的外表面的一部分被暴露，从而被蚀刻，以形成从所述制品的外表面延伸到所述制品和对应于凹部的所述多个蚀刻部分的多元性; 说的光致抗蚀剂worin所述预定区域定义检测识别标记将被施加到所述制品的外表面; 蚀刻部分的worin所述多个形成所述制品的外表面上的非光学识别标记; 和worin的小于200nm的蚀刻部分的最大宽度被检查做的识别标记是在可见光光谱的非光学方法检测。

公开(公告)号：EP3056948A8

公开(公告)日：2016-11-23

申请号：EP16155566.9

申请日：2016-02-12

Applicant: Master Dynamic Limited

Inventor： CHING, Ho ,  KO, Pui Hang

IPC: G04B17/06 ,  G04B17/22 ,  G04B1/14

CPC classification number: C30B29/06 ,  C30B33/12 ,  G04B1/145 ,  G04B17/066 ,  G04B17/227

Abstract: Slicon hairspring (100a) as a torque-restoring element for an oscillator for a mechanical timepiece and having an oscillator frequency, said torque restoring element comprising a spiral spring body (110a) having a number N turnings with an inner terminal end for engagement with a rotational inertial element via a collet, and an outer terminal end for engagement with a stationary cock element, and having a width (140a), a height (150a) and a total arc length; wherein the spiral spring body (110a) includes a core (180a) formed from mono-crystalline silicon wafer oriented along the crystallographic axis; and wherein the spiral spring body (110a) includes at least one peripheral coating (190a) of a material having a thermal elastic constant different from that of the core (180a) of the spiral spring body (110a) so as to maintain the oscillator frequency of an oscillator including the torque-restoring element substantially insensitive to variations of ambient temperature.

Abstract translation: 所述转矩恢复元件包括具有数字N的螺旋弹簧主体（110a），所述螺旋弹簧主体（110a）随着内部终端转动而与用于与机械时钟振荡器接合的扭转恢复元件 （140a），高度（150a）和总电弧长度的外端子端部;以及用于与固定旋塞元件接合的外端子端部，其具有宽度（140a），高度（150a）和总弧长; 其中螺旋弹簧体（110a）包括由沿晶轴取向的单晶硅晶片形成的芯（180a） 并且其中螺旋弹簧体（110a）包括具有与螺旋弹簧体（110a）的芯（180a）的热弹性常数不同的热弹性常数的材料的至少一个周边涂层（190a），以维持振荡器频率 包括扭矩恢复元件的振荡器对环境温度的变化基本不敏感。

公开(公告)号：EP2755093A3

公开(公告)日：2015-09-23

申请号：EP14151118.8

申请日：2014-01-14

Applicant: Master Dynamic Limited

Inventor： Chu, Siu Kay ,  Ching, Ho ,  Ko, Pui Hang

IPC: G04B17/34

CPC classification number: G04B17/345

Abstract: A hairspring collet for a hairspring for interference engagement and an interference fit with the cylindrical outer surface of the staff of a balance wheel for a timepiece movement, said hairspring collet portion comprising a plurality of circumferentially extending elastically deformable interconnected arm portions, the arm portions forming an annulus having a central axis and providing an aperture therebetween, wherein each arm portion including a curved concave engagement portion for engagement with the outer surface of a staff of a balance wheel, wherein each engagement portion has substantially the same radius of curvature as each other and are equally spaced from said central axis at a first distance and wherein said first distance is less than the radius of the staff of the balance wheel; said engagement portions have a radius of curvature such that upon deformation of the arm portions and engagement with the outer surface of said staff the engagement portions substantially conform with the outer surface of said staff and an interference fit is formed therebetween, wherein stress induced from said interference fit is transferred and distributed from along the engagement portions to the arm portions adjacent the engagement portions and distributed therein; and wherein the interference fit of the engagement portions with the staff substantially prevents relative movement between the hairspring collet and the staff of the balance wheel upon application of load from a hairspring in use in a timepiece movement.

公开(公告)号：EP2808118A1

公开(公告)日：2014-12-03

申请号：EP14163895.7

申请日：2014-04-08

Applicant: Master Dynamic Limited

Inventor： Hui, Koon Chung ,  Ching, Ho ,  Kong, Ching Tom

IPC: B23K26/00

CPC classification number: B01J19/081 ,  B41M3/14 ,  C30B29/04 ,  C30B29/16 ,  C30B29/20 ,  C30B29/34 ,  C30B33/04 ,  H01J37/00 ,  H01J37/3178 ,  Y10T428/24355

Abstract: A method of forming one or more protrusions on an outer surface of a polished face of a solid state material includes the step of applying focused inert gas ion beam local irradiation (105) towards an outer surface of a polished facet of a solid state material (109) so as to form a protrusion (401) on the outer surface; wherein irradiated focused inert gas ions from said focused inert gas ion bean penetrate the outer surface of said polished facet of said solid state material; and wherein irradiated focused inert gas ions cause expansive strain within the solid state crystal lattice of the solid state material below said outer surface at a pressure so as to induce expansion of solid state crystal lattice, and form a protrusion on the outer surface of the polished face of said solid state material.

Abstract translation: 形成一个或多个凸部的方法是在（在固态材料的抛光面的外表面包括施加朝聚焦惰性气体离子束局部照射（105），以固态材料的抛光面的外表面的步骤 109），以便形成所述外表面上的突起（401）; worin照射从所述聚焦惰性气体离子聚焦惰性气体离子束穿透所述固态材料。所述抛光面的外表面; 和worin照射聚焦惰性气体离子引起下面所述外表面的固态材料的固态晶格内膨胀应变的压力以便诱导固态晶格的膨胀，和抛光的外表面上形成的突起 固态材料的所述面。