Abstract:
A portable terminal is disclosed. The portable terminal comprises: a flexible display element or a display assembly including at least a partially flexible functional region; a first antenna element disposed at a first region on the display element; a second antenna element disposed at a foldable second region on the display element to face the first region; and a switch element configured to connect or disconnect the second antenna element, wherein, when the display element is folded or rolled, the first and second antenna elements partially overlap with each other and the switch element disconnects the second antenna element. The portable terminal with an antenna device described above can maintain a stable transmission/reception performance even in a folded or rolled state though the portable terminal is provided with the flexible display element or display assembly. Also, when a plurality of antenna elements are provided, the portable terminal can implement a MIMO antenna device, in which the antenna elements perform transmission and reception operations independently from each other, in a state where the flexible display element is spread.
Abstract:
본 발명은 전달하고자 하는 정보가 없는 패킷인 널(Null) 패킷과 전달 정보를 가지고 있는 리얼(Real) 패킷을 지원하는 패킷 스위칭 네트워크에서, 패킷 플로우(flow) 별 비어있는 큐(queue)를 검출하고, 비어 있는 큐의 존재 여부에 따라 패킷 서비스 방식을 결정하는 패킷 스위칭 네트워크의 패킷 플로우 스케줄링 방법과 장치에 관한 것이다. 본 발명에 의하면, 비어 있는 큐 내에 널(Null) 패킷을 생성하여 처리하는 것으로 인해, 패킷 스위칭 네트워크의 최대 지연값(maximum delay)을 감소시키고 패킷 스위칭 네트워크에서의 서비스 품질(QoS)을 보장할 수 있다. 패킷 스위칭 네트워크, 플로우 스케줄링, 비어 있는 큐, 널 패킷
Abstract:
A photo spinner apparatus and a controlling method thereof are provided to reduce an error rate and to enhance productivity by inspecting photoresist patterns before loading a wafer cassette into a wafer cassette loader. A wafer cassette loader(230) loads a wafer cassette for storing a plurality of wafers. An index arm is formed to extract the wafers from the wafer cassette. A wafer transfer(250) transfers the wafers extracted by the index arm. A spin coater(210) rotates the wafers at a high speed in order to coat photoresist on the wafers. A bake unit(260) heats the wafers in order to harden the photoresist. A developing unit forms residual photoresist patterns on the wafers by developing the photoresist exposed by an exposure unit. An inspection unit(300) inspects the presence of the photoresist patterns and set positions of the photoresist patterns before the wafers are loaded into the wafer cassette.