公开(公告)号：SG115590A1

公开(公告)日：2005-10-28

申请号：SG200306868

申请日：2003-11-24

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN

IPC: G02F1/03 ,  G03F1/00 ,  G03F1/32 ,  G03F7/20 ,  H01L21/027 ,  G03F1/14

Abstract: Pixel element for a programmable patterning structure (e.g. a spatial light modulator) which can simultaneously modulate both phase and amplitude. Use of such a programmable patterning structure with lithographic projection apparatus is also described.

公开(公告)号：SG114736A1

公开(公告)日：2005-09-28

申请号：SG200500900

申请日：2005-02-16

Applicant: ASML NETHERLANDS BV

Inventor： GUI CHENG-QUN ,  BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  SYTSMA JOOST

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG110196A1

公开(公告)日：2005-04-28

申请号：SG200405762

申请日：2004-09-16

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： BLEEKER ARNO JAN ,  FRANKEN DOMINICUS JACOBUS PETR ,  KOCHERSPERGER PETER C ,  TROOST KARS ZEGER

IPC: G02B26/08 ,  G02B5/10 ,  G03F7/20 ,  H01L21/027

公开(公告)号：SG104353A1

公开(公告)日：2004-06-21

申请号：SG200207822

申请日：2002-12-27

Applicant: ASML NETHERLANDS BV

Inventor： MULKENS JOHANNES CATHARINUS HU ,  BLEEKER ARNO JAN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus, especially one using a spatial light modulator (5), in which the projection system (PL) includes a means (10) for splitting the patterned beam (4) into patterned beam fractions (12, 15) and projecting them onto separate target portions (25, 26) on the substrate (27).