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    Method and apparatus for polarizing electromagnetic radiation
    81.
    发明申请
    Method and apparatus for polarizing electromagnetic radiation 有权
    用于偏振电磁辐射的方法和装置

    公开(公告)号：US20060193055A1

    公开(公告)日：2006-08-31

    申请号：US11386496

    申请日：2006-03-21

    Applicant: David Williams ,  James Kardach ,  Michael Goldstein

    Inventor： David Williams ,  James Kardach ,  Michael Goldstein

    IPC: G02B27/12

    CPC classification number: G02B27/286 ,  G02B27/283 ,  G02F1/0136 ,  G02F1/09 ,  G03F7/70058 ,  G03F7/7055 ,  G03F7/70566

    Abstract: According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.

    Abstract translation: 根据本发明的一个方面，提供了一种用于偏振电磁辐射的方法和装置。 电磁辐射可以被分成第一和第二部分，基本上所有的第一部分可以在第一方向上线性偏振，并且基本上所有的第二部分可以在第二方向上线性偏振，第一方向基本上与 第二个方向 可以改变第一和第二部分中的至少一个的线性极化，使得第一和第二部分的基本上全部都在第三方向上线性偏振。 第一部分和第二部分中的至少一个可以被重定向，使得第一部分和第二部分基本上全部都在第四方向上传播。

    Method of manufacturing alloy sputtering targets
    82.
    发明申请
    Method of manufacturing alloy sputtering targets 审中-公开
    制造合金溅射靶的方法

    公开(公告)号：US20060137969A1

    公开(公告)日：2006-06-29

    申请号：US11026644

    申请日：2004-12-29

    Applicant: Gerald Feldewerth ,  John Barnak ,  Michael Goldstein

    Inventor： Gerald Feldewerth ,  John Barnak ,  Michael Goldstein

    IPC: C23C14/00

    CPC classification number: H01J37/3429 ,  C23C14/3407 ,  H01J37/3491

    Abstract: The present invention relates to a composite sputtering target comprising a plurality of bonded metal pieces. The composite sputtering target further comprises a bonded region between the metal pieces. The bonded region may comprise an inter-metallic region upon bonding. The composite sputter target of the present invention may be used in conjunction with an apparatus for sputtering alloy films on substrates.

    Abstract translation: 复合溅射靶技术领域本发明涉及一种复合溅射靶，其包括多个接合金属片。 复合溅射靶还包括金属片之间的接合区域。 接合区域在结合时可以包括金属间区域。 本发明的复合溅射靶可以与用于在基板上溅射合金膜的装置结合使用。

    High reflector tunable stress coating, such as for a MEMS mirror
    83.
    发明授权
    High reflector tunable stress coating, such as for a MEMS mirror 有权

    公开(公告)号：US07057262B2

    公开(公告)日：2006-06-06

    申请号：US10782297

    申请日：2004-02-18

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: H01L23/58

    CPC classification number: B81C1/00666 ,  B81B2201/042 ,  B81C2201/0167 ,  G02B5/0833 ,  G02B26/0833 ,  Y10S438/954

    Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

    Source multiplexing in lithography
    86.
    发明申请
    Source multiplexing in lithography 有权
    光刻中的光源复用

    公开(公告)号：US20050263724A1

    公开(公告)日：2005-12-01

    申请号：US11196231

    申请日：2005-08-02

    Applicant: Michael Goldstein ,  Peter Silverman

    Inventor： Michael Goldstein ,  Peter Silverman

    IPC: G03F7/20 ,  G01J1/00

    CPC classification number: G03F7/7005 ,  G03F7/201

    Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

    Abstract translation: 用于极紫外（EUV）光刻系统的照明系统可以包括多个EUV光源。 当照射面罩时，系统可以组合来自多个源的光。

    Reeling device for a hoisting system
    87.
    发明授权
    Reeling device for a hoisting system 有权
    起重系统的卷取装置

    公开(公告)号：US06923394B2

    公开(公告)日：2005-08-02

    申请号：US10412809

    申请日：2003-04-11

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: B62D43/04 ,  B66D1/34 ,  B66D1/00

    CPC classification number: B62D43/045 ,  B66D1/34

    Abstract: The invention provides a reeling device for a hoisting system, including a flexible member having a lower end and an upper end, a rotatable drum on which the flexible member is windable, disk means rotatably mounted on said drum, to which disk means the upper end of the flexible member is anchored, and a stop mechanism activated by the disk means once the flexible member has completely unreeled from the drum.

    Abstract translation: 本发明提供了一种用于起重系统的卷取装置，其包括具有下端和上端的柔性构件，可旋转滚筒，柔性构件可卷绕在其上，盘装置可旋转地安装在所述滚筒上，盘装置为上端 所述柔性构件被固定，并且一旦所述柔性构件从所述滚筒完全退出，则由所述盘装置启动的止动机构。

    Light condenser
    89.
    发明授权
    Light condenser 有权

    公开(公告)号：US06801298B2

    公开(公告)日：2004-10-05

    申请号：US10206779

    申请日：2002-07-25

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: G03B2754

    CPC classification number: G03F7/702 ,  G03B27/42

    Abstract: A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.

    Reflective spectral filtering of high power extreme ultra-violet radiation
    90.
    发明授权
    Reflective spectral filtering of high power extreme ultra-violet radiation 有权
    大功率极紫外辐射的反射光谱滤波

    公开(公告)号：US06700700B2

    公开(公告)日：2004-03-02

    申请号：US10408033

    申请日：2003-04-03

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: F21V906

    CPC classification number: G03F7/70575 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/702

    Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

    Abstract translation: 在本发明的一个实施例中，蚀刻在镜面基板上的光栅结构具有光栅周期，从而在光路内衍射围绕第一波长的第一波段内的第一入射辐射。 沉积在光栅结构上的多层涂层反射在光路内的第一入射辐射在第一波段内，第二入射辐射在第二波段内反射第二波长。 在另一个实施例中，沉积在反射镜基板上的第一多层涂层在围绕第二波长的第二波段内围绕第一波长和第二入射辐射在第一波段内反射第一入射辐射。 光栅结构沉积在第一多层涂层上。 光栅结构被蚀刻以具有光栅周期，从而使光路中的第二入射辐射在第二波段内衍射。

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