公开(公告)号：WO02097054A3

公开(公告)日：2003-02-13

申请号：PCT/US0217209

申请日：2002-05-30

Applicant: UNIV OHIO STATE

Inventor： SANDHAGE KENNETH H

IPC: A61K9/00 ,  A61K9/14 ,  B27N3/08 ,  B81C1/00 ,  C23C16/00 ,  G01N33/543 ,  G01N33/544 ,  B29C71/00 ,  A01N1/00

CPC classification number: G01N33/54346 ,  B81B2201/034 ,  B81B2201/035 ,  B81C1/00 ,  B81C99/0085 ,  G01N33/54353 ,  G01N33/544 ,  Y10S977/811 ,  Y10S977/84 ,  Y10S977/89 ,  Y10S977/90

Abstract: The present invention is focused on a revolutionary, low-cost (highly-scaleable) approach for the mass production of three-dimensional microcomponents: the biological reproduction of naturally-derived, biocatalytically-derived, and/or genetically-tailored three-dimensional microtemplates (e.g., frustules of diatoms, microskeletons of radiolarians, shells of mollusks) with desired dimensional features, followed by reactive conversion of such microtemplates into microcomponents with desired compositions that differ from the starting microtemplate and with dimensional features that are similar to those of the starting microtemplate. Because the shapes of such microcomponents may be tailored through genetic engineering of the shapes of the microtemplates, such microcomposites are considered to be Genetically-Engineered Materials (GEMs).

Abstract translation: 本发明集中在用于大规模生产三维微型组件的革命性的低成本（高度可扩展）方法：天然衍生的，生物催化衍生的和/或基因定制的三维微型模板的生物繁殖 （例如，硅藻的截头圆锥体，放射体的微骨架，软体动物的壳）具有所需的尺寸特征，随后将这种微模板反应转化成具有与起始微模板不同的所需组成的微组件，并具有与起始微模板类似的尺寸特征 微模板。 由于这些微型组件的形状可以通过微型模板的形状的遗传工程来定制，所以这种微复合材料被认为是基因工程材料（GEM）。

公开(公告)号：WO00016159A1

公开(公告)日：2000-03-23

申请号：PCT/EP1999/006679

申请日：1999-09-10

IPC: B81C1/00 ,  G03F7/00 ,  B81B1/00

CPC classification number: B81C99/008 ,  B81B2201/035 ,  G03F7/00

Abstract: Methods for producing microstructure bodies are known in which a metallic or ceramic powder comprising an organic binding system is used. The microstructure bodies obtained in such a manner comprise a comparatively low precision due to the volume shrinkage which occurs during debinding. The aim of the invention is to provide a method which is effective without the use of binding systems and which makes it possible to obtain a precision in the lower micrometer and submicrometer range. To this end, a method is provided in which a layer of a radiosensitive plastic is firstly deposited on a substrate surface (10) and is microstructured using a lithographic method. At least one material (14) is deposited onto the microstructured plastic layer (11) obtained in such a manner by means of thermal spraying. Lastly, the plastic layer and/or the substrate are/is completely or partially removed. It is also possible to remove the material applied by spraying at least up to the height of the top edge of microstructures of the plastic layer. Metallic and ceramic microstructure bodies can be obtained with high precision by using this method.

Abstract translation: 方法是已知的用于生产使用具有金属的或已知的陶瓷粉末的有机粘合剂体系的微结构元件。 由于松解如此得到的微结构体时的体积收缩具有相当低的精度。 的目的是提供一种不需要在下部微米使用粘合剂体系的和精确的方法和亚微米允许用下述方法来实现：首先，施加辐射敏感树脂的到基材表面上的层（10），并通过光刻工艺来 微结构。 在由此获得的微结构的塑料层（11）的至少一种材料（14）通过热喷涂施加。 最后，塑料层和/或衬底被完全或部分地除去。 另外，也可以在被喷射的材料去除至少至该塑料层的微观结构的上边缘的高度。 通过该方法，可以以高精度地得到的金属和陶瓷的微结构体。

公开(公告)号：KR1020170030061A

公开(公告)日：2017-03-16

申请号：KR1020160115283

申请日：2016-09-07

Applicant: 니바록스-파 에스.에이.

Inventor： 뒤부아필리쁘

IPC: G04B13/02 ,  B32B17/10

CPC classification number: G04B31/08 ,  B81B2201/035 ,  B81C1/00674 ,  G04B15/14

Abstract: 윤활된표면을포함하는마이크로기계시계부품및 그러한마이크로기계시계부품을제조하기위한방법. 발명은적어도하나의표면을갖는실리콘기재기판 (1) 을포함하는마이크로기계시계부품과관련되며, 상기표면의적어도일부는마이크로기계시계부품의외부표면에서열려있고마찰제 (5) 를포함하는기공들 (2) 을갖는다. 발명은또한, 실리콘기재기판 (1) 으로부터시작하는마이크로기계시계부품을제조하는방법과관련되고, 상기실리콘기재기판은표면을갖고, 표면의적어도일부는마찰제 (5) 에의해윤활되며, 상기방법은, a) 상기실리콘기재기판 (1) 의상기표면의부분의표면상에기공들 (2) 을형성하는단계; 및 b) 상기기공들 (2) 에상기마찰제 (5) 를성막하는단계를순서대로포함한다.

Abstract translation: 微机械手表部件包括润滑表面以及制造这种微机械手表部件的方法。 具有表面基体材料本发明的至少硅与微机械时钟部件相关联，包括一个基底（1），所述孔的至少一部分所述表面包括所述表面上的外开放，并且摩擦微机械时钟部件的剂5 具有（2）。 发明还涉及一种用于制造微机械时钟部件，从硅支撑衬底（1）开始，硅基板的表面，在所述表面的至少一部分由权利要求5的摩擦，其特征在于，润滑 该方法包括以下步骤：a）在硅衬底（1）的一部分表面的表面上形成孔隙（2）; 和b）在孔（2）上沉积摩擦剂（5）。

公开(公告)号：KR1020100007759A

公开(公告)日：2010-01-22

申请号：KR1020090062529

申请日：2009-07-09

Applicant: 더 스와치 그룹 리서치 앤 디벨롭먼트 엘티디

Inventor： 딩제르,루돌프 ,  라브넬,띠에리

IPC: G04B37/04 ,  H01L21/027

CPC classification number: B81C99/008 ,  B81B2201/035 ,  B81C1/00674 ,  B81C2201/112 ,  G04B13/02 ,  G04D3/0069 ,  Y10T29/49579 ,  G03F7/0002 ,  G04B13/026

Abstract: PURPOSE: A manufacturing method for a micromechanical part is provided to manufacture parts provided to the most of watch with a good quality. CONSTITUTION: A manufacturing method for a micromechanical part is as follows. A substrate made with manufacturable minute materials is provided(3). A pattern comprised of parts penetrated through the substrate is etched(5). The etched substrate is installed on supports in order to make the top surface and the bottom surface of the substrate accessible(7). A coating with an excellent rubbing quality is spread on the outer surface of the parts. The parts are separated from the substrate(11).

Abstract translation: 目的：提供一种微机械部件的制造方法，以制造提供给手表最多的部件，质量好。 构成：微机械部件的制造方法如下。 提供由可制造的微小材料制成的基板（3）。 蚀刻由穿透基板的部分构成的图案（5）。 将蚀刻的基板安装在支撑件上，以使基板的顶表面和底表面可接近（7）。 具有优异摩擦质量的涂层涂布在零件的外表面上。 部件与基板（11）分离。

公开(公告)号：US20170068218A1

公开(公告)日：2017-03-09

申请号：US15231876

申请日：2016-08-09

Applicant: Nivarox-FAR S.A.

Inventor： PHILIPPE DUBOIS

IPC: G04B31/08 ,  G04D5/00

CPC classification number: G04B31/08 ,  B81B2201/035 ,  B81C1/00674 ,  G04B15/14

Abstract: The invention relates to a micromechanical timepiece part comprising a silicon-based substrate (1) having at least one surface, at least one part of said surface having pores (2) which open out at the external surface of the micromechanical timepiece part and comprise a tribological agent (5).The invention likewise relates to a method for producing a micromechanical timepiece part starting from a silicon-based substrate (1), said silicon-based substrate having at least one surface, at least one part of which is lubricated by a tribological agent (5), said method comprising, in order, the steps of: a) forming pores (2) on the surface of the part of said surface of said silicon-based substrate (1), b) depositing said tribological agent (5) in said pores (2).

公开(公告)号：US20160378064A1

公开(公告)日：2016-12-29

申请号：US15171012

申请日：2016-06-02

Applicant: Nivarox-FAR S.A.

Inventor： Alex GANDELHMAN

IPC: G04D99/00 ,  C23F1/00

CPC classification number: G04D99/00 ,  B81B2201/035 ,  B81B2203/0384 ,  B81C1/00103 ,  B81C2201/0132 ,  B81C2201/0138 ,  B81C2201/014 ,  C23F1/00

Abstract: The invention relates to a silicon-based component with at least one chamfer formed from a method combining at least one oblique side wall etching step with a “Bosch” etching of vertical side walls, thereby enabling aesthetic improvement and improvement in the mechanical strength of components formed by micromachining a silicon-based wafer.

Abstract translation: 本发明涉及一种具有至少一个倒角的硅基组件，该方法将至少一个倾斜侧壁蚀刻步骤与垂直侧壁的“博世”蚀刻相结合，从而使得美观改进和组件的机械强度得到改善 通过微加工硅基晶片形成。

公开(公告)号：US09284654B2

公开(公告)日：2016-03-15

申请号：US12952825

申请日：2010-11-23

Applicant: Clément Saucy

Inventor： Clément Saucy

IPC: C25D1/00 ,  C25D1/20 ,  B81C99/00 ,  G03F7/00

CPC classification number: C25D1/003 ,  B81B2201/035 ,  B81C99/0085 ,  B81C2201/032 ,  C25D1/20 ,  G03F7/00

Abstract: The invention relates to a process for fabricating a monolayer or multilayer metal structure in LIGA technology, in which a photoresist layer is deposited on a flat metal substrate, a photoresist mold is created by irradiation or electron or ion bombardment, a metal or alloy is electroplated in this mold, the electroformed metal structure is detached from the substrate and the photoresist is separated from this metal structure, wherein the metal substrate is used as an agent involved in the forming of at least one surface of the metal structure other than that formed by the plane surface of the substrate.

Abstract translation: 本发明涉及一种在LIGA技术中制造单层或多层金属结构的方法，其中光致抗蚀剂层沉积在平坦的金属基底上，通过照射或电子或离子轰击产生光致抗蚀剂模具，电镀金属或合金 在该模具中，电铸金属结构与基板分离，并且光致抗蚀剂与该金属结构分离，其中金属基板用作形成金属结构的至少一个表面的试剂，而不是由 基板的平面。

公开(公告)号：US20150309474A1

公开(公告)日：2015-10-29

申请号：US14695697

申请日：2015-04-24

Applicant: ROLEX SA

Inventor： Richard Bossart ,  Denis Favez

IPC: G04B1/14 ,  G04B15/14 ,  G04B13/00 ,  G04B31/004 ,  G04B31/06

CPC classification number: G04B1/145 ,  B81B2201/035 ,  B81C1/00682 ,  G04B13/00 ,  G04B15/14 ,  G04B31/004 ,  G04B31/06

Abstract: The manufacturing process produces a part (10), from a micromachinable material, the part (10) forming a blank of the timepiece component and comprising at least one surface having an initial roughness. It comprises a step of mechanical strengthening treatment of the part in an etching fluid intended to decrease the roughness of said surface. For example, a substrate of said micromachinable material is provided; the substrate is at least partially covered with a protective coating containing at least one aperture; the substrate is etched through the aperture in the protective coating and an etched surface is thus obtained; the mechanical strengthening treatment is applied to said etched surface through the aperture in the protective coating; and then the protective coating is removed. The etching fluid may be a plasma or a liquid chemical etchant.

Abstract translation: 该制造工艺从可微加工材料制造零件（10），所述零件（10）形成钟表件的坯件，并且包括具有初始粗糙度的至少一个表面。 它包括在旨在降低所述表面的粗糙度的蚀刻流体中机械强化处理该部件的步骤。 例如，提供所述可微加工材料的基材; 所述基底至少部分地被包含至少一个孔的保护涂层覆盖; 通过保护涂层中的孔蚀刻衬底，从而获得蚀刻表面; 通过保护涂层中的孔将机械强化处理施加到所述蚀刻表面; 然后去除保护涂层。 蚀刻流体可以是等离子体或液体化学蚀刻剂。

公开(公告)号：US08636403B2

公开(公告)日：2014-01-28

申请号：US12522666

申请日：2008-02-15

Applicant: Frédéric Maier ,  Stéphane Von Gunten ,  Sylvain Jeanneret

Inventor： Frédéric Maier ,  Stéphane Von Gunten ,  Sylvain Jeanneret

IPC: G04B17/00 ,  G04B25/02 ,  G04B31/00 ,  G04B5/16 ,  G04B13/02 ,  G04B17/06

CPC classification number: G04D3/00 ,  B81B2201/035 ,  B81C99/0085 ,  B81C99/0095 ,  G04B5/165 ,  G04B13/02 ,  G04B13/022 ,  G04B13/026 ,  G04B17/063 ,  G04D3/0069 ,  G04F7/08 ,  Y10T29/49579 ,  Y10T29/49581

Abstract: A timepiece component, such as a balance, an oscillating mass or a wheel, having a structure made according to a micro-manufacturing technique, such as the DRIE technique. The component has at least one member formed in or at the periphery of the structure and made of a material different from that of the structure. This member is typically metal and is formed by electro-forming using a cavity of the structure as a mold.

Abstract translation: 具有根据微型制造技术制成的结构的诸如平衡物，振动块或轮的钟表部件，例如DRIE技术。 该部件具有至少一个构件，其形成在结构的外周或其周边，并且由与结构不同的材料制成。 该构件通常是金属，并且通过使用结构的空腔作为模具进行电成型而形成。

公开(公告)号：US08398865B2

公开(公告)日：2013-03-19

申请号：US12501009

申请日：2009-07-10

Applicant: Rudolf Dinger ,  Thierry Ravenel

Inventor： Rudolf Dinger ,  Thierry Ravenel

IPC: C23F1/00

CPC classification number: B81C99/008 ,  B81B2201/035 ,  B81C1/00674 ,  B81C2201/112 ,  G04B13/02 ,  G04D3/0069 ,  Y10T29/49579

Abstract: A method of manufacturing a mechanical part includes the steps of providing a micro-machinable substrate; etching a pattern which includes the part through the entire substrate using photolithography; mounting the etched substrate on a support so as to leave the top and bottom surfaces of said substrate accessible for coating; depositing a tribological quality improving coating of on the outer surface of the part; and releasing the part from the substrate.

Abstract translation: 制造机械部件的方法包括提供可微加工的基板的步骤; 使用光刻法蚀刻通过整个基板包括该部分的图案; 将蚀刻的基板安装在支撑件上，以便使所述基板的顶表面和底表面可接近以进行涂覆; 在部件的外表面上沉积摩擦学质量改进涂层; 并从基底释放该部分。