Abstract:
It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nanoimprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.
Abstract:
Ce procédé pour la réalisation de moyens de connexion et/ou de soudure ou de scellement, d'un composant présent sur un substrat 1 consiste : - à déposer sur ledit substrat 1 une couche 2 en un matériau ductile, le cas échéant, conducteur de l'électricité ; - à emboutir la couche 2 ainsi réalisée au moyen d'une matrice gravée 3, dont les gravures sont fonction de la forme que l'on souhaite conférer auxdits moyens de connexion et/ou de soudure.
Abstract:
A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mould to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first temperature being able to reduce the elastic modulus of the article; and using a second mould to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.
Abstract:
Ce procédé pour la réalisation de moyens de connexion et/ou de soudure ou de scellement, d'un composant présent sur un substrat 1 consiste : - à déposer sur ledit substrat 1 une couche 2 en un matériau ductile, le cas échéant, conducteur de l'électricité ; - à emboutir la couche 2 ainsi réalisée au moyen d'une matrice gravée 3, dont les gravures sont fonction de la forme que l'on souhaite conférer auxdits moyens de connexion et/ou de soudure.
Abstract:
By forming metallization structures on the basis of an imprint technique, in which via openings and trenches may be commonly formed, a significant reduction of process complexity may be achieved due to the omission of at least one further alignment process as required in conventional process techniques. Furthermore, the flexibility and efficiency of imprint lithography may be increased by providing appropriately designed imprint molds in order to provide via openings and trenches exhibiting an increased fill capability, thereby also improving the performance of the finally obtained metallization structures with respect to reliability, resistance against electromigration and the like.
Abstract:
The present invention provides a method adhering a layer to a substrate that features defining first and second interfaces by having a composition present between the layer and the substrate that forms covalent bonds to the layer and adheres to the substrate employing one or more of covalent bonds, ionic bonds and Van der Waals forces. In this manner, the strength of the adhering force of the layer to the composition is assured to be stronger than the adhering force of the layer to the composition formed from a predetermined adhering mechanism, i.e., an adhering mechanism that does not include covalent bonding. Additionally, the present invention is directed to a composition of adhering together first and second materials. The composition features a multi-functional reactive compound that includes a backbone group and first and second functional groups; a cross-linker, and a catalyst. The first functional group is responsive to a first actinic energy to form cross-linked molecules and to adhere a subset of the cross-linked molecules to the first material. The second functional group is responsive to a second actinic energy, differing from the first actinic energy to adhere to the second material.
Abstract:
A method for manufacturing a three dimensional structure is provided to facilitate the formation of the three dimensional pattern with a complex structure without an additional process for removing a residual layer by using the imprint and a photo lithography process. A photo resist is deposited by performing spin coating in an upper part of a substrate(S110). An imprint process is performed on the deposited photo resist with a predetermined temperature and a predetermined pressure by using a mold with a predetermined pattern(S120). A three dimensional structure with a specific pattern is formed through an exposure process and a development process by using a photo mask with the predetermined pattern on the structure(S130). The thickness of a photo resist residual layer is controlled through an imprint process time. The imprint process time is 1 to 60 seconds.
Abstract:
A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mould to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first temperature being able to reduce the elastic modulus of the article; and using a second mould to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.
Abstract:
L'invention porte notamment sur un procédé de réalisation de motifs ultérieurs dans une couche sous-jacente (120), le procédé comprenant au moins une étape de réalisation de motifs antérieurs dans une couche imprimable (110) surmontant la couche sous-jacente (120), la réalisation des motifs antérieurs comprenant une impression nanométrique de la couche imprimable (110) et laissent en place une couche continue formée par la couche imprimable (110) et recouvrant la couche sous- jacente (120), caractérisé en ce qu'il comprend l'étape suivante: au moins une étape de modification de la couche sous-jacente (120) par implantation (421 ) d'ions au sein de la couche sous-jacente (120), l'implantation (421 ) étant réalisée au travers de la couche imprimable (110) comprenant les motifs ultérieurs, les paramètres de l'implantation (421) étant choisis de manière à former dans la couche sous-jacente (120) des zones (122) implantées et des zones non implantées, les zones non implantées définissant les motifs ultérieurs et présentant une géométrie qui est fonction des motifs antérieurs.
Abstract:
The invention relates to a moulded product comprising a substrate (1), to which a plurality of first fibres (10) is applied, the underside (11) of each fibre being permanently fixed to the surface (2) of the substrate (1), and a plurality of second fibres (20), the respective undersides (21) of which are permanently connected to the surfaces (12) of the first fibres (10). The flanks (15) of the first fibres (10) and the flanks (25) of the second fibres (20) are concave. The invention further relates to a method for producing a moulded product of this type and to the use of said product as the attachment surface of an object.