수광장치 및 수광장치의 제조방법
    81.
    发明授权
    수광장치 및 수광장치의 제조방법 有权
    光电设备及其制造方法

    公开(公告)号:KR101605645B1

    公开(公告)日:2016-03-22

    申请号:KR1020147011248

    申请日:2012-10-31

    Abstract: 수광장치는기판과, 상면에수광부를구비하고, 하면이상기기판상에탑재된수광소자와, 평탄한상면및 상기수광소자의상기수광부를노출시키는개구를갖고, 상기기판상에상기수광소자의두께보다두껍게형성되고, 상기수광소자를둘러싸는상기수광소자의측면에밀착되어있는절연수지를포함한다. 상기절연수지는상기평탄한상면과상기수광부의상기상면사이의높이에설치된단부를갖고, 상기단부는상기개구의주위에서상기수광소자의서로대향하는적어도한 쌍의측면에대하여평행하게연장된다.

    Abstract translation: 光接收器件包括:衬底; 将包括其上表面上的感光体部分和其下表面的感光体元件安装在基板上; 以及绝缘树脂块,其包含平坦的上表面和露出感光体元件的感光体部分的开口,所述感光体部件形成在所述基板上,比所述感光体元件的厚度厚,并且紧贴在所述感光体的侧表面 元件,围绕感光体元件的侧表面。 绝缘树脂块包含设置在其平坦上表面和感光体部分的上表面之间的高度的台阶部分; 并且台阶部分在开口的周边平行于感光体元件的至少一对相互相对的侧表面延伸。

    OPTICAL SENSOR SHIELD
    85.
    发明申请
    OPTICAL SENSOR SHIELD 审中-公开
    光学传感器屏蔽

    公开(公告)号:WO2017171986A2

    公开(公告)日:2017-10-05

    申请号:PCT/US2017/014226

    申请日:2017-01-20

    Abstract: Techniques for shielding an optical sensor are described. An example of an electronic device includes an optical sensor and a combined light-focusing and electrical-shielding unit disposed over the optical sensor. The light-focusing and electrical-shielding unit has two portions. The first portion gathers light and focuses the light on the electrical sensor. The second portion encloses sides of the first portion and is coated with an electrically conductive material to shield the optical sensor from electromagnetic interference.

    Abstract translation: 描述了用于屏蔽光学传感器的技术。 电子设备的示例包括光学传感器和设置在光学传感器上的组合光聚焦和电屏蔽单元。 聚光和电气屏蔽单元有两部分。 第一部分收集光线并将光线聚焦在电子传感器上。 第二部分包围第一部分的侧面,并涂有导电材料以遮蔽光学传感器免受电磁干扰。

    METHOD AND SYSTEM OF ARRAY IMAGING
    89.
    发明申请
    METHOD AND SYSTEM OF ARRAY IMAGING 审中-公开
    阵列成像的方法与系统

    公开(公告)号:WO2008051189A2

    公开(公告)日:2008-05-02

    申请号:PCT/US2006/032608

    申请日:2006-08-21

    Inventor: WALT, David R.

    Abstract: The present invention relates to a method and system of array imaging that extends or maximizes the longevity of the sensor array by minimizing the effects of photobleaching. The imaging system has a light source, a variable exposure aperture, and a variable filter system. The system extends the longevity of sensors by (1) using the variable exposure aperture to selectively expose sections of the sensor array containing representative numbers of each type of sensor, and/or (2) using the variable filter system to control the intensity of the excitation light, providing only the intensity required to induce the appropriate excitation and increasing that intensity over time as necessary to counteract the effects of photobleaching.

    Abstract translation: 本发明涉及阵列成像的方法和系统,该方法和系统通过最小化光漂白的影响来延长或最大化传感器阵列的寿命。 成像系统具有光源,可变曝光孔径和可变过滤器系统。 该系统通过(1)使用可变曝光孔径来延长传感器的寿命,以选择性地暴露包含每种类型的传感器的代表数的传感器阵列的部分,和/或(2)使用可变过滤器系统来控制传感器的强度 激发光,仅提供诱导适当激发所需的强度,并随时间增加强度以抵消光漂白的影响。

    STRAY CHARGED PARTICLE REMOVAL DEVICE
    90.
    发明申请
    STRAY CHARGED PARTICLE REMOVAL DEVICE 审中-公开
    带杂质颗粒去除装置

    公开(公告)号:WO2007130093A2

    公开(公告)日:2007-11-15

    申请号:PCT/US2006/022783

    申请日:2006-06-12

    Abstract: In order to reduce the exposure of a detector surface 180 of a photo-multiplier 160 to stray charged particles, an off-axis structure is interposed between the resonant structure and the detector surface of the photo-multiplier. By providing the off-axis structure with at least one reflective surface, photons are reflected toward the detector surface of the photo-multiplier while at the same time absorbing stray charged particles. Stray particles may be absorbed by the reflective surface or by any other part of the off- axis structure. The off-axis structure may additionally be provided with an electrical bias and/or an absorbing coating for absorbing stray charged particles.

    Abstract translation: 为了减少光电倍增器160的检测器表面180暴露于杂散带电粒子,在谐振结构和光电倍增器的检测器表面之间插入偏轴结构。 通过向离轴结构提供至少一个反射表面,光子被朝向光电倍增管的检测器表面反射,同时吸收杂散带电粒子。 杂散颗粒可以被反射表面或离轴结构的任何其它部分吸收。 离轴结构还可以设置有用于吸收杂散带电粒子的电偏压和/或吸收涂层。

Patent Agency Ranking