Abstract:
Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
Abstract:
Methods of circumscribing defects in optical devices are described. A perimeter is formed about a defect by laser ablation, where the perimeter electrically isolates the defect. The perimeter does not have damage due to excess energy from the laser and thus does not create new electrical shorts.
Abstract:
Provided are a display panel which can detect a touch position derived from a user's touch and can prevent erroneous touch position data from being generated even when an erroneous connection to a position sensing line is present due a processing deviation or a cell gap deviation, and a manufacturing method of the same. The display panel includes a first substrate, a first sensor pad that is formed on the first substrate, a second sensor pad that is spaced apart from the first sensor pad, a second substrate that is disposed to face the first substrate, a first sensor spacer that is formed on the second substrate to overlap the first sensor pad and protrudes toward the first substrate, a second sensor spacer that is formed on the second substrate to overlap the second sensor pad and protrudes toward the first substrate, and a sensor electrode that is formed on the first sensor spacer and the second sensor spacer to overlap the first sensor pad and the second sensor pad, wherein the second sensor spacer protrudes toward the first substrate more than the first sensor spacer does.
Abstract:
A liquid crystal display device of the present invention is arranged such that a retardation of a liquid crystal layer which obtained while no voltage is applied falls within ± (a value which is one-tenth of a main wavelength) of a value obtained by adding natural number times the main wavelength to a total retardation of at least one optical compensation film. This allows suppression of a transmittance during no voltage application.
Abstract:
A scanning signal line (16) includes an opening (29) leading from the outside of a pixel region through below a data signal line (15) into the pixel region, and first and second scanning electrode portions (16a/16b) or two side portions of the opening confronting in a column direction through that opening. The end portion of the first scanning electrode portion (16a) in the pixel region is a first end portion (EP1), and the end portion of the second scanning electrode portion (16b) in the pixel region is a second end portion (EP2). A first transistor has a source electrode (9a) and a drain electrode (8a) individually overlapping the first electrode portion (16a) but not the first end portion (EP1) in the pixel region. A second transistor has a source electrode (9b) and a drain electrode (8b) individually overlapping the second electrode portion (16b) but not the second end portion EP2) in the pixel region. According to the aforementioned constitution, it is possible to realize a pixel split type active matrix substrate capable of easily correcting the short-circuits of the data signal line (15) and the scanning signal line (16).
Abstract:
A liquid crystal display apparatus (101) for controlling light transmittance corresponding to various defective pixel modes such as luminance point defects and a fabrication method thereof are disclosed. The orientation film (411,413) corresponding to a defective display pixel has protrusion portions that are larger than the orientation film corresponding to each of the normal display pixels. The height and pitches of the protrusion portions are preferably 0.1 µm or more and 10 µm or less, respectively.
Abstract:
Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 108 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.