公开(公告)号：US20110019174A1

公开(公告)日：2011-01-27

申请号：US12919741

申请日：2009-02-24

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC: G03F7/20 ,  G02B5/22 ,  G02B5/26 ,  G03B27/72

CPC classification number: G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

Abstract translation: 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：US07622727B2

公开(公告)日：2009-11-24

申请号：US11617163

申请日：2006-12-28

Applicant: Takahiro Shirai ,  Kyohei Seki

Inventor： Takahiro Shirai ,  Kyohei Seki

IPC: H01J7/36 ,  H05H1/00

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G21K2201/065 ,  H05G2/003 ,  H05G2/005

Abstract: An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics. Between them, an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with a laser. Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

Abstract translation: 具有腔室的EUV辐射源装置，其被分成放电空间和设置有EUV收集器光学器件的收集器反射镜空间。 在它们之间提供了具有被冷却的开口的孔部件。 旋转第一放电电极和第二放电电极。 用激光照射Sn或Li。 在第一和第二放电电极之间施加脉冲功率以在两个电极之间形成高密度和高温等离子体，从而发射波长为13.5nm的EUV辐射，由EUV收集器光学器件聚焦并被引导到辐照 曝光工具的光学系统。 存在用于泵送放电空间和收集器反射镜空间的第一泵送装置和第二泵送装置。 放电空间保持在几Pa，收集器反射镜空间保持在几百Pa。

公开(公告)号：US07397531B2

公开(公告)日：2008-07-08

申请号：US10960784

申请日：2004-10-08

Applicant: Dominicus Jacobus Petrus Adrianus Franken

Inventor： Dominicus Jacobus Petrus Adrianus Franken

IPC: G03B27/52 ,  G03B27/68 ,  G02B7/02

CPC classification number: G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the patterning device, or the projection system, and the illumination system includes a reflector assembly that includes a reflector substrate with a reflective surface for reflecting part of incident radiation, and a heat exchanger system that is constructed and arranged to exchange heat with the reflector substrate. The heat exchanger system includes a thermally active element that is disposed in a recess of the reflector substrate at a side of the reflector substrate that is different from the reflective surface.

Abstract translation: 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于使投影光束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 图案形成装置或投影系统中的至少一个以及照明系统包括反射器组件，该反射器组件包括具有用于反射入射辐射的一部分的反射表面的反射器基板，以及构造和布置成交换热量的热交换器系统 与反射器基板。 热交换器系统包括热活性元件，该热活性元件设置在反射器基板的与反射表面不同的一侧的凹部中。

公开(公告)号：US20080013680A1

公开(公告)日：2008-01-17

申请号：US11825078

申请日：2007-07-03

Applicant: Wolfgang Singer ,  Wilhelm Egle ,  Markus Wiess ,  Joachim Hainz ,  Jochen Wietzorrek ,  Frank Melzer ,  Johannes Wangler

Inventor： Wolfgang Singer ,  Wilhelm Egle ,  Markus Wiess ,  Joachim Hainz ,  Jochen Wietzorrek ,  Frank Melzer ,  Johannes Wangler

IPC: G21K5/00 ,  G02B5/08 ,  G02B5/10

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B5/09 ,  G02B17/006 ,  G02B19/0014 ,  G02B19/0019 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G21K2201/065 ,  G21K2201/067

Abstract: There is provided a collector. The collector includes a first mirror shell positioned inside a second mirror shell that has a chamfered end.

Abstract translation: 有一个收藏家。 收集器包括位于具有倒角端的第二镜壳内的第一镜壳。

公开(公告)号：US07244954B2

公开(公告)日：2007-07-17

申请号：US11243403

申请日：2005-10-04

Applicant: Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Jochen Wietzorrek ,  Frank Melzer ,  Johannes Wangler

Inventor： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Jochen Wietzorrek ,  Frank Melzer ,  Johannes Wangler

IPC: G02B27/10

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B5/09 ,  G02B17/006 ,  G02B19/0014 ,  G02B19/0019 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G21K2201/065 ,  G21K2201/067

Abstract: There is provided a collector for illumination systems for light having a wavelength ≦193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract translation: 提供了一种用于具有波长<= 193nm的光的照明系统的收集器。 收集器包括（a）第一反射镜壳体，其围绕公共旋转轴线邻近第二反射镜壳体并位于其内部，其中第一和第二反射镜壳体旋转对称，以及（b）区域中的部件 在第一和第二镜壳之间。 收集器用于经由物体侧孔口接收来自光源的光并且用于照射图像侧平面中的区域，并且该区域不被光使用。

公开(公告)号：US20070158597A1

公开(公告)日：2007-07-12

申请号：US11647016

申请日：2006-12-27

Applicant: Igor Fomenkov ,  Alexander Ershov

Inventor： Igor Fomenkov ,  Alexander Ershov

IPC: G01J3/10

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis. of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US20070035814A1

公开(公告)日：2007-02-15

申请号：US10577163

申请日：2003-09-27

Applicant: Udo Dinger ,  Frank Eisert ,  Stefan Koehler ,  Andreas Ochse ,  Johannes Zellner ,  Martin Lowisch ,  Timo Laufer

Inventor： Udo Dinger ,  Frank Eisert ,  Stefan Koehler ,  Andreas Ochse ,  Johannes Zellner ,  Martin Lowisch ,  Timo Laufer

IPC: G06K7/10

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B1/00 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70891 ,  G21K1/062 ,  G21K2201/065

Abstract: A projection objective 1 for short wavelengths, in particular for wavelengths λ

Abstract translation: 用于短波长的投影物镜1，特别是对于波长λ<157nm的投影物镜1设置有多个反射镜M 1，M 2，M 3，M 4，M 5和M 6，其被精确地相对于光学 轴5。 反射镜M 1，M 2，M 3，M 4，M 5和M 6具有多层涂层。 提供了至少两种不同的镜材料，其热膨胀系数的上升与热膨胀系数的过零区域中的温度的函数不同，特别是大小的符号。

公开(公告)号：US20060221474A1

公开(公告)日：2006-10-05

申请号：US10546517

申请日：2004-09-07

Applicant: Kyoko Imai ,  Kenji Ando ,  Hidehiro Kanazawa

Inventor： Kyoko Imai ,  Kenji Ando ,  Hidehiro Kanazawa

IPC: G02B5/08

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/283 ,  G03F7/70891 ,  G03F7/70958 ,  G03F7/70983 ,  G21K2201/065

Abstract: To provide an optical thin film structure capable of efficiently dissipating heat in an optical thin film which is generated upon irradiating a surface of an X-ray mirror made up of the optical thin film with an X-ray. The optical thin film having an isotope purity higher than a natural isotope abundance ratio is formed on a mirror to increase heat conductivity of the optical thin film itself and quickly dissipate heat accumulated in the thin film to the outside of an optical system. Consequently, the mirror having high reflectively can be obtained, in which a fine structure of the optical thin film is by no means broken.

Abstract translation: 提供能够在用X射线照射由该光学薄膜构成的X射线镜的表面上产生的光学薄膜中有效散发热的光学薄膜结构。 在反射镜上形成具有高于天然同位素丰度比的同位素纯度的光学薄膜，以提高光学薄膜本身的导热性，并将薄膜中累积的热量迅速地散发到光学系统的外部。 因此，可以获得高反射率的反射镜，其中光学薄膜的精细结构绝不破裂。

公开(公告)号：US20050199829A1

公开(公告)日：2005-09-15

申请号：US10900839

申请日：2004-07-27

Applicant: William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

Inventor： William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

IPC: G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00 ,  H01J65/04

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US20050073663A1

公开(公告)日：2005-04-07

申请号：US10647376

申请日：2003-08-26

Applicant: Yoshikazu Miyajima

Inventor： Yoshikazu Miyajima

IPC: G02B5/10 ,  G02B17/00 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G03B27/52

CPC classification number: G21K1/06 ,  G02B7/1815 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.

Abstract translation: 用于通过反射引导曝光来进行曝光处理的曝光装置的反射光学系统的反射镜装置具有反射面，以反射曝光光的反射镜和设置在远离位置的辐射冷却用辐射板 从镜子的外表面。 辐射板被设置成确保入射到反射镜的反射表面上并从其反射的曝光光的通过区域。 此外，通过冷却流经冷却管的液体对各个辐射板进行温度控制。 因此，可以抑制在曝光装置的反射光学系统中使用的反射镜的温度升高，并且可以保持镜面反射面的表面形状的精度。