公开(公告)号：EP0115720B1

公开(公告)日：1987-03-11

申请号：EP83402408.5

申请日：1983-12-13

Applicant: C.G.R. MeV

Inventor： Leboutet, Hubert ,  Aucouturier, Jeanne

IPC: H01J3/00 ,  H05H9/00

CPC classification number: H05H7/18 ,  H05H9/00

公开(公告)号：EP0204541A2

公开(公告)日：1986-12-10

申请号：EP86304202.4

申请日：1986-06-03

Applicant: English Electric Valve Company Limited

Inventor： Maitland, Arthur ,  Menown, Hugh ,  Neale, Christopher Vince

IPC: H01S3/03 ,  H01J1/02 ,  H01J3/00

CPC classification number: H01J61/90 ,  H01S3/03 ,  H01S3/031

Abstract: Discharge tube apparatus includes an outer containing vessel 8 and a structure comprising five metal cylinders 10, 11, 12, 13 and 14 located coaxially within it. Each of the metal cylinders includes projecting spacers 15 on its outer surface which serve to space it from adjacent ones. Such a structure is thermally insulating and enables a large temperature difference to be maintained between the interior of the discharge tube and the outer containing vessel 8.
In other embodiments (not shown), a plurality of structures are included disposed along the axis of the tube. Also dispenser segments for dispensing part of the amplifying medium of a metal vapour laser may be included and arranged to shield vulnerable surfaces in the tube from direct exposure to the discharge.

公开(公告)号：EP0115720A1

公开(公告)日：1984-08-15

申请号：EP83402408.5

申请日：1983-12-13

Applicant: C.G.R. MeV

Inventor： Leboutet, Hubert ,  Aucouturier, Jeanne

IPC: H01J3/00 ,  H05H9/00

CPC classification number: H05H7/18 ,  H05H9/00

Abstract: L'invention concerne un canon à électrons pour accélérateur linéaire, capable de fournir un courant électronique modulé destiné à être injecté dans une structure accélératrice (3).
Un tel canon (1) à électrons comporte une cavité résonnante (13-18) dans laquelle, une cathode (8) et une grille (10) délimitent un espace grille-cathode (10-8) sur lequel est fermée cette cavité résonnante (13-18); une onde eléctromagne- tique injectée dans cette cavité résonnante (13-18), détermine entre la grille (10) et la cathode (8) une différence de potentiel alternative par laquelle est modulé le courant électronique.
L'invention s'applique notamment à des machines d'irradiation industrielles.

公开(公告)号：WO2021041837A1

公开(公告)日：2021-03-04

申请号：PCT/US2020/048443

申请日：2020-08-28

Applicant: TAE TECHNOLOGIES, INC.

Inventor： VEKSELMAN, Vladislav ,  DUNAEVSKY, Alexander

IPC: A61N5/10 ,  A61N5/00 ,  H01J3/14 ,  H01J3/00

Abstract: Embodiments of systems, devices, and methods relate to fast beam position monitoring for detecting beam misalignment in a beam line. In an example, a fast beam position monitor includes a plurality of electrodes extending into an interior of a component of a beam line. The fast beam position monitor is configured to detect a position of a beam passing through the component of the beam line based on beam halo current. Embodiments of systems, devices, and methods further relate to noninvasively monitoring parameters of beams advancing along a beam line. In examples, gas is puffed into a pumping chamber along a beam line. One or more beam parameters are measured from fluorescence resulting from collisions of energetic beam particulates of a beam advancing through the beam line.

公开(公告)号：WO2015097503A1

公开(公告)日：2015-07-02

申请号：PCT/IB2014/002482

申请日：2014-11-18

Applicant: DH TECHNOLOGIES DEVELOPMENT PTE. LTD.

Inventor： BABA, Takashi

IPC: H01J49/26 ,  H01J3/00

CPC classification number: H01J49/0095 ,  H01J49/0072 ,  H01J49/062 ,  H01J49/4225 ,  H01J49/4295

Abstract: An ion reaction device is provided having an ion injection inlet for receiving a plurality of ions and an ion ejection outlet through which ions can exit the device. The reaction device includes a plurality of non-linear rods disposed relative to one another so as to provide an axial region configured to receive a plurality of anions and cations via said ion injection inlet, and a plurality of trapping regions in communication with the axial region in which said anions and cations can be confined. A DC voltage source is adapted to apply a DC voltage across at least two of said rods so as to generate an electric field within at least a portion of said axial region for spatially separating the received anions and cations and guiding the anions into one of said trapping regions and the cations into another one of said trapping regions.

Abstract translation: 提供了一种离子反应装置，其具有用于接收多个离子的离子注入口和离子可以离开装置的离子喷射出口。 反应装置包括相对于彼此设置的多个非线性杆，以提供构造成经由所述离子注入口接收多个阴离子和阳离子的轴向区域，以及与轴向区域连通的多个捕获区域 其中阴离子和阳离子可以被限制。 直流电压源适于跨所述杆中的至少两个施加直流电压，以便在所述轴向区域的至少一部分内产生电场，用于空间分离所接收的阴离子和阳离子，并将阴离子引导到所述 捕获区域和阳离子到另一个所述捕获区域。

公开(公告)号：WO02097845A3

公开(公告)日：2003-05-15

申请号：PCT/IB0201988

申请日：2002-06-03

Applicant: KONINKL PHILIPS ELECTRONICS NV ,  VAN DER VAART NIJS C ,  VAN DER POEL WILLIBRORDUS A J ,  KUNNEN HENRICUS JOSEPHUS EM

Inventor： VAN DER VAART NIJS C ,  VAN DER POEL WILLIBRORDUS A J ,  VAN GORKOM GERARDUS G P DI

IPC: H01J29/04 ,  H01J3/00 ,  H01J3/02 ,  H01J3/40 ,  H01J29/48 ,  H01J29/84

CPC classification number: H01J3/021 ,  H01J3/40 ,  H01J29/481 ,  H01J29/84

Abstract: The invention relates to an electron gun 100 for use in a cathode ray tube. The electron gun 100 has an electron source 10, a body 20 with a transmission cavity 25 of which the wall 28 is at least partly coated with an electrical insulator for the emission of secondary electrons, and an electrode 30 for applying a first electric field between the entrance 26 and the exit 27 of the cavity. The electron gun is characterized in that it comprises means for preventing the travelling of positive ions, which are formed by collisions of electrons that have exited from the cavity 25, in reverse direction along the same path as the electrons and colliding with the module 20. Such collisions can damage the cavity exit 27 or the electrical insulator on the wall 28. This is undesirable because the current density of the electron beam 101 exiting from the cavity 25 will deteriorate.

Abstract translation: 本发明涉及一种用于阴极射线管的电子枪100。 电子枪100具有电子源10，具有透射空腔25的主体20，其中壁28至少部分地涂覆有用于发射二次电子的电绝缘体，以及用于在第二电场之间施加第一电场的电极30， 空腔的入口26和出口27。 电子枪的特征在于，其包括用于防止正离子行进的装置，这些正离子通过沿着与电子相同的路径相反的方向与空腔25相撞而形成，并与模块20碰撞。 这种碰撞可以损坏腔出口27或壁28上的电绝缘体。这是不希望的，因为从空腔25离开的电子束101的电流密度将劣化。

公开(公告)号：WO2002097844A2

公开(公告)日：2002-12-05

申请号：PCT/IB2002/001948

申请日：2002-05-30

Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V. ,  VAN DER VAART, Nijs, C. ,  VAN DER POEL, Willibrordus, A., J., A. ,  DAMEN, Daniel, M.

Inventor： VAN DER VAART, Nijs, C. ,  VAN DER POEL, Willibrordus, A., J., A. ,  DAMEN, Daniel, M.

IPC: H01J3/00

CPC classification number: H01J29/481 ,  H01J29/023 ,  H01J29/488 ,  H01J29/51 ,  H01J2229/4824

Abstract: A display tube comprises an electron source (10), a module (20) provided with a guidance cavity (25R, 25G, 25B) for guiding electrons emitted by the electron source (10) to an exit aperture (27R, 27G, 27B) of the guidance cavity (25R, 25G, 25B) and beam-shaping means (30) for forming an electron beam (EBR, EBG, EBB) from guided electrons leaving the exit aperture (27R, 27G, 27B). The electron beam (EBR, EBG, EBB) travels towards a display screen (3). The beam-shaping means (30) are arranged to change a direction in which the electron beam (EBR, EBG, EBB) leaves the guidance cavity (25R, 25G, 25B) in accordance with a predetermined application. For example, the electron beam (EBR, EBG, EBB) is deflected to realize gun pitch modulation in the electron gun of a cathode ray tube. As the electron beam is deflected near the exit aperture (27R, 27G, 27B), spot errors are reduced and the display tube has a relatively high image quality.

Abstract translation: 显示管包括电子源（10），设置有用于将由电子源（10）发射的电子引导到出射孔（27R，27G，27B）的引导腔（25R，25G，25B）的模块（20） （25R，25G，25B）和用于从离开出口孔（27R，27G，27B）的引导电子形成电子束（EBR，EBG，EBB）的光束整形装置（30）。 电子束（EBR，EBG，EBB）向显示屏（3）行进。 光束整形装置（30）被布置为根据预定应用改变电子束（EBR，EBG，EBB）离开引导腔（25R，25G，25B）的方向。 例如，电子束（EBR，EBG，EBB）被偏转以在阴极射线管的电子枪中实现枪间距调制。 当电子束在出射孔（27R，27G，27B）附近偏转时，斑点误差减小，显像管具有较高的图像质量。

公开(公告)号：WO02082489A2

公开(公告)日：2002-10-17

申请号：PCT/US0210113

申请日：2002-04-03

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT

Inventor： REYES JAIME M

IPC: H01J27/04 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/265 ,  H01J3/00

CPC classification number: H01J27/04 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01J2237/31701 ,  H01L21/26506

Abstract: Ion source filaments, as well as methods and apparatus associated with the same are provided. The source filaments have a design that includes a relatively small surface area from which electrons are emitted (i.e., active portion) as compared to certain conventional source filaments. Suitable designs include filaments that have a V-shape or U-shape active portion, rather than a coiled active portion as in certain conventional source filaments. The source filaments of the present invention can increase the efficiency of ion generation and, in particular, the generation of multiply charged ionic species. The increased ion generation efficiency may enable formation of ion beams having relatively high beam currents suitable for implantation.

Abstract translation: 提供了离子源丝，以及与其相关的方法和装置。 源极丝具有包括与某些常规源丝相比发射电子的相对小的表面积（即，活性部分）的设计。 合适的设计包括具有V形或U形活性部分的长丝，而不是像某些常规的源长丝中的卷绕的活性部分。 本发明的源丝可以提高离子产生的效率，特别是产生多电荷离子物质。 增加的离子产生效率可以形成具有适合于植入的相对较高的束流的离子束。

公开(公告)号：WO02009135A2

公开(公告)日：2002-01-31

申请号：PCT/US2001/041439

申请日：2001-07-25

IPC: G03F7/20 ,  G01Q30/18 ,  H01J37/141 ,  H01J37/305 ,  H01L21/027 ,  H01J3/00

CPC classification number: H01J37/141 ,  H01J2237/1035 ,  H01J2237/3175

Abstract: An immersion lens for a charged particle beam lithography system includes a magnetically floating shield that limits a deflection magnetic field from creating eddy currents in electrically conductive components of the system downstream from the shield. The surface of the shield lies parallel or approximately parallel to a magnetic equipotential surface of the focusing magnetic field so that the shield does not affect the focusing magnetic field. The shield is, e.g., a ferrite disk or a hollow ferrite cone defining a central bore for passage of the charged particle beam.

Abstract translation: 用于带电粒子束光刻系统的浸没透镜包括磁浮屏蔽，其限制偏转磁场在屏蔽体下游的系统的导电部件中产生涡流。 屏蔽表面平行或近似平行于聚焦磁场的磁等势面，使屏蔽不影响聚焦磁场。 屏蔽是例如铁氧体磁盘或中空铁素体磁体，限定用于带电粒子束通过的中心孔。

公开(公告)号：EP3889591B1

公开(公告)日：2022-11-02

申请号：EP21164764.9

申请日：2021-03-25

Inventor： Buijsse, Bart ,  Henstra, Alexander ,  Deng, Yuchen

IPC: G01N23/20058 ,  H01J3/00 ,  H01J37/00