公开(公告)号：DE68926257D1

公开(公告)日：1996-05-23

申请号：DE68926257

申请日：1989-01-05

Applicant: CA ATOMIC ENERGY LTD

Inventor： KOLPIN HANS JOACHIM

IPC: H01J37/06 ,  H01J3/02 ,  H01J37/065 ,  H01J3/38

Abstract: An electron gun which is rugged, provides good thermal decoupling of the cathode, permits precise alignment of the electrodes to be achieved easily and allows geometric changes to be carried out with ease is described. In the cathode assembly three set screws (18) and a split ring (20) of insulating material are used to secure the cathode. Alignment is achieved by suitably adjusting the set screws and because contact can be limited to the three set screws thermal coupling is reduced. Similarly a Whenelt electrode (32) is secured and aligned by a further group of set screws (35). Finally, the anode (42) is secured to replaceable stand-offs (2) by means of screws (48) passing through oversized holes in an anode plate. The oversized holes permit easy alignment and the use of stand-offs permits the spacing between anode and cathode to be changed as desired by replacing the stand-offs.

公开(公告)号：HK109893A

公开(公告)日：1993-10-29

申请号：HK109893

申请日：1993-10-21

Applicant: RCA THOMSON LICENSING CORP

Inventor： LYDEN THOMAS BURKE

IPC: H01J9/00 ,  H01J29/76 ,  H01J9/44 ,  H01J29/82 ,  H01J3/38

Abstract: A deflection yoke is mounted to a cathode ray tube by the use of two adhesives having different hardening rates. A first adhesive is applied between the yoke and the tube by a dispensing machine in a sufficient quantity to temporarily hold the yoke on the tube. A second adhesive having a hardening rate slower than the first adhesive is applied between the yoke and tube by the dispensing machine. The second adhesive purges the first adhesive from the dispensing machine. The quantities of the first and second adhesives are required to permanently mount the yoke to the tube. This arrangement may be used to assemble the yoke itself, as well as assembling the yoke and mounting it to a tube in the same operation.

公开(公告)号：CA2086976A1

公开(公告)日：1993-07-25

申请号：CA2086976

申请日：1993-01-08

Applicant: ETEC SYSTEMS INC

Inventor： GESLEY MARK A ,  DEBRA DANIEL B

IPC: H01J37/12 ,  H01J37/06 ,  H01J37/073 ,  H01J37/08 ,  H01J37/15 ,  H01L21/027 ,  H01J3/38

Abstract: MECHANICALLY STABLE FIELD EMISSION GUN Mark A. Gesley Daniel B. DeBra An improved electron or ion gun support structure includes a hollow cylinder for rigidly connecting the source assembly to the source-motion ring, with the source cathode and associated lens extending into the hollow portion of the cylinder. The gun is thus made very stable and less susceptible to outside vibrations.

公开(公告)号：GB2000903B

公开(公告)日：1982-01-20

申请号：GB7827691

申请日：1978-06-23

Applicant: CONTROL DATA CORP

IPC: H01J3/38 ,  G09G1/04 ,  G11C11/30 ,  H01J27/00 ,  H01J29/46 ,  H01J29/56 ,  H01J29/70 ,  H01J31/08 ,  H01J31/60 ,  H01J29/74

Abstract: An electron beam tube electrostatic deflection system and method of operation is described. The electron beam tube includes an eight-fold deflector and means are provided for applying two different quadrupole correction electric potentials to selected ones of the eight-fold deflector members and for applying an octupole correction electrical potential to all eight deflector members. In the preferred embodiment, the quadrupole and octupole correction potentials applied to one set of four deflector members are represented by the respective values (V2c - V), (-V2c - V), (V2c - V) and (-V2c - V), and the quadrupole and octupole correction potentials applied to the second set of four deflector members are represented respectively by the values (V2s + V), (-V2s + V), (V2s + V) and (-V2s + V) where the quadrupole correction electric potential V2c = [A2c(Vx2 - Vy2)]/Vc, (1) THE QUADRUPOLE CORRECTION ELECTRIC POTENTIAL V2s = (2A2s VxVy)/Vc, (2) AND THE OCTUPOLE CORRECTION POTENTIAL V applied to all eight of the eight-fold deflector members is given by the expression V = [A4(Vx4 - 6Vx2Vy2 + Vy4)]/4Vc3 (3) WHERE A2c, A2s and A4 are constants, Vx and Vy are the x and y deflection electric potentials, and -Vc is the cathode voltage of the electron gun used in the electron beam tube apparatus. In preferred arrangements, the electrostatic deflection system further includes means for applying a dynamic focusing electric potential to the objective lens assembly of the electron beam tube apparatus in conjunction with both the correction and deflection electric potentials described above. The dynamic focusing electric potential is VOBJ(DF) = VOBJ(0) + [(ADF(Vx2 + Vy2))/Vc](4) WHERE ADF is a constant and VOBJ(O) is the uncorrected value of the direct current objective lens supply voltage. Both deflection and correction electric potentials are developed by an eight-fold deflector voltage generator which includes as its heart a novel octupole-quadrupole generator.

公开(公告)号：AU3772778A

公开(公告)日：1980-01-10

申请号：AU3772778

申请日：1978-07-03

Applicant: CONTROL DATA CORP

Inventor： HARTE KENNETH J

IPC: H01J3/38 ,  G09G1/04 ,  G11C11/30 ,  H01J27/00 ,  H01J29/46 ,  H01J29/56 ,  H01J29/70 ,  H01J31/08 ,  H01J31/60 ,  H01J29/74 ,  H01J29/98

Abstract: An electron beam tube electrostatic deflection system and method of operation is described. The electron beam tube includes an eight-fold deflector and means are provided for applying two different quadrupole correction electric potentials to selected ones of the eight-fold deflector members and for applying an octupole correction electrical potential to all eight deflector members. In the preferred embodiment, the quadrupole and octupole correction potentials applied to one set of four deflector members are represented by the respective values (V2c - V), (-V2c - V), (V2c - V) and (-V2c - V), and the quadrupole and octupole correction potentials applied to the second set of four deflector members are represented respectively by the values (V2s + V), (-V2s + V), (V2s + V) and (-V2s + V) where the quadrupole correction electric potential V2c = [A2c(Vx2 - Vy2)]/Vc, (1) THE QUADRUPOLE CORRECTION ELECTRIC POTENTIAL V2s = (2A2s VxVy)/Vc, (2) AND THE OCTUPOLE CORRECTION POTENTIAL V applied to all eight of the eight-fold deflector members is given by the expression V = [A4(Vx4 - 6Vx2Vy2 + Vy4)]/4Vc3 (3) WHERE A2c, A2s and A4 are constants, Vx and Vy are the x and y deflection electric potentials, and -Vc is the cathode voltage of the electron gun used in the electron beam tube apparatus. In preferred arrangements, the electrostatic deflection system further includes means for applying a dynamic focusing electric potential to the objective lens assembly of the electron beam tube apparatus in conjunction with both the correction and deflection electric potentials described above. The dynamic focusing electric potential is VOBJ(DF) = VOBJ(0) + [(ADF(Vx2 + Vy2))/Vc](4) WHERE ADF is a constant and VOBJ(O) is the uncorrected value of the direct current objective lens supply voltage. Both deflection and correction electric potentials are developed by an eight-fold deflector voltage generator which includes as its heart a novel octupole-quadrupole generator.

公开(公告)号：FR2172230B1

公开(公告)日：1978-02-10

申请号：FR7305200

申请日：1973-02-14

Applicant: ATOMIC ENERGY COMMISSION

IPC: H01J1/18 ,  H01J3/02 ,  H01S3/038 ,  H01S3/097 ,  H01J3/38 ,  H01J33/00 ,  H01S3/02

公开(公告)号：FR2172230A1

公开(公告)日：1973-09-28

申请号：FR7305200

申请日：1973-02-14

Applicant: ATOMIC ENERGY COMMISSION

IPC: H01J1/18 ,  H01J3/02 ,  H01S3/038 ,  H01S3/097 ,  H01J3/38 ,  H01J33/00 ,  H01S3/02

公开(公告)号：SE309634B

公开(公告)日：1969-03-31

申请号：SE148367

申请日：1967-02-02

Applicant: FORD MOTOR CO

Inventor： COLVIN A ,  NILSSEN O ,  TURNER A

IPC: H01J3/38

公开(公告)号：DE1489175A1

公开(公告)日：1969-03-13

申请号：DE1489175

申请日：1964-08-25

Applicant: PHILIPS NV

Inventor： JOZEF FRANKEN ADRIANUS ,  LANGERHORST JACOB

IPC: H01J37/20 ,  H01J3/38

公开(公告)号：US10950408B2

公开(公告)日：2021-03-16

申请号：US16774886

申请日：2020-01-28

Applicant: Honeywell International Inc.

Inventor： Daniel Youngner

IPC: H01J3/38 ,  H01J9/14 ,  G06N10/00 ,  B82Y10/00 ,  G21K1/00 ,  H01J49/00 ,  H01L29/94

Abstract: Apparatuses, systems, and methods for ion traps are described herein. One apparatus includes a number of microwave (MW) rails and a number of radio frequency (RF) rails formed with substantially parallel longitudinal axes and with substantially coplanar upper surfaces. The apparatus includes two sequences of direct current (DC) electrodes with each sequence formed to extend substantially parallel to the substantially parallel longitudinal axes of the MW rails and the RF rails. The apparatus further includes a number of through-silicon vias (TSVs) formed through a substrate of the ion trap and a trench capacitor formed in the substrate around at least one TSV.