公开(公告)号：WO2011133303A3

公开(公告)日：2011-12-22

申请号：PCT/US2011030596

申请日：2011-03-30

Applicant: QUALCOMM MEMS TECHNOLOGIES INC ,  FLOYD PHILIP ,  KAO TSONGMING ,  MIGNARD MARC ,  GANTI SURYAPRAKASH ,  KOTHARI MANISH

Inventor： FLOYD PHILIP ,  KAO TSONGMING ,  MIGNARD MARC ,  GANTI SURYAPRAKASH ,  KOTHARI MANISH

IPC: G01J3/51 ,  G01J3/26 ,  G01S17/02 ,  G02B5/28 ,  G02B26/00

CPC classification number: G01J3/51 ,  G01J3/26 ,  G01J3/513 ,  G01J2003/1247 ,  G02B26/001 ,  G06F3/042

Abstract: This disclosure provides systems, methods and apparatus, including computer programs encoded on computer storage media, for detecting proximity and/or color of an object. In one aspect, an optical sensor includes a plurality of transmissive interferometric elements, a plurality of detectors positioned to detect the presence and/or intensity of light transmitted through the elements, and a processor to determine the proximity of an object based at least in part upon input from the detectors. An optical signal can be sensed by selectively actuating certain elements in a set of transmissive interferometric elements in an array to allow transmission of optical signals within a first spectrum through the array, and detecting optical signals transmitted through the array.

Abstract translation: 本公开提供了用于检测物体的接近度和/或颜色的系统，方法和装置，包括编码在计算机存储介质上的计算机程序。 在一个方面，一种光学传感器包括多个透射干涉测量元件，多个检测器，多个检测器被定位成检测透过所述元件的光的存在和/或强度，以及处理器，用于至少部分地 根据探测器的输入。 可以通过选择性地激励阵列中的一组透射干涉测量元件中的某些元件来感测光信号，以允许第一频谱内的光信号通过该阵列的传输，并且检测通过该阵列传输的光信号。

公开(公告)号：WO2011133693A2

公开(公告)日：2011-10-27

申请号：PCT/US2011/033290

申请日：2011-04-20

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  GOVIL, Alok ,  KAO, Tsongming ,  MIGNARD, Marc, M. ,  GANTI, Suryaprakash ,  FLOYD, Philip, D. ,  KOTHARI, Manish

Inventor： GOVIL, Alok ,  KAO, Tsongming ,  MIGNARD, Marc, M. ,  GANTI, Suryaprakash ,  FLOYD, Philip, D. ,  KOTHARI, Manish

IPC: G09G3/34

CPC classification number: G09G3/3466 ,  G09G5/395 ,  G09G2300/0809 ,  G09G2300/0842 ,  G09G2340/12

Abstract: This disclosure provides methods, systems and apparatus for storing and processing image data at the pixel using augmented active matrix pixels. Some implementations of a display device may include a substrate, an array of display elements associated with the substrate and configured to display an image, an array of processor units associated with the substrate, wherein each processor unit is configured to process image data for a respective portion of the display elements and an array of memory units associated with the array of processor units, wherein each memory unit is configured to store data for a respective portion of the display elements. Some implementations may enable color processing image data at the pixel, layering of image data at the pixel or temporal modulation of image data at the pixel. Further, in some implementations, the display element may be an interferometric modulator (IMOD). Some other implementations may additionally include a display, a processor configured to communicate with the display and a memory device that is configured to communicate with the processor.

Abstract translation: 本公开提供了使用增强的有源矩阵像素在像素处存储和处理图像数据的方法，系统和装置。 显示设备的一些实施方式可以包括衬底，与衬底相关联并被配置为显示图像的显示元件的阵列，与衬底相关联的处理器单元的阵列，其中每个处理器单元被配置为处理相应的图像数据 显示元件的一部分和与处理器单元阵列相关联的存储器单元的阵列，其中每个存储器单元被配置为存储用于显示元件的相应部分的数据。 一些实施方式可以实现在像素处的图像数据的颜色处理，像素处的图像数据的分层或像素处的图像数据的时间调制。 此外，在一些实现中，显示元件可以是干涉式调制器（IMOD）。 一些其它实现可以另外包括显示器，被配置为与显示器通信的处理器和被配置为与处理器通信的存储器设备。

公开(公告)号：WO2011133303A2

公开(公告)日：2011-10-27

申请号：PCT/US2011/030596

申请日：2011-03-30

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  FLOYD, Philip ,  KAO, Tsongming ,  MIGNARD, Marc ,  GANTI, Suryaprakash ,  KOTHARI, Manish

Inventor： FLOYD, Philip ,  KAO, Tsongming ,  MIGNARD, Marc ,  GANTI, Suryaprakash ,  KOTHARI, Manish

IPC: G01J3/51

CPC classification number: G01J3/51 ,  G01J3/26 ,  G01J3/513 ,  G01J2003/1247 ,  G02B26/001 ,  G06F3/042

Abstract: This disclosure provides systems, methods and apparatus, including computer programs encoded on computer storage media, for detecting proximity and/or color of an object. In one aspect, an optical sensor includes a plurality of transmissive interferometric elements, a plurality of detectors positioned to detect the presence and/or intensity of light transmitted through the elements, and a processor to determine the proximity of an object based at least in part upon input from the detectors. An optical signal can be sensed by selectively actuating certain elements in a set of transmissive interferometric elements in an array to allow transmission of optical signals within a first spectrum through the array, and detecting optical signals transmitted through the array.

Abstract translation: 本公开提供了系统，方法和装置，包括在计算机存储介质上编码的用于检测对象的接近度和/或颜色的计算机程序。 在一个方面，光学传感器包括多个透射干涉测量元件，多个检测器被定位成检测透过元件的光的存在和/或强度，以及处理器，用于至少部分地确定物体的接近度 一旦从检测器输入。 可以通过选择性地驱动阵列中的一组透射干涉测量元件中的某些元件来检测光信号，以允许通过阵列在第一光谱内传输光信号，以及检测通过阵列传输的光信号。

公开(公告)号：WO2009036215A3

公开(公告)日：2009-06-11

申请号：PCT/US2008076077

申请日：2008-09-11

Applicant: QUALCOMM MEMS TECHNOLOGIES INC ,  YAN XIAOMING ,  HO CHOK ,  HEALD DAVID ,  GOUSEV EVGENI ,  HERTZLER BENJAMIN W ,  FLOYD PHILIP ,  SASAGAWA TERUO ,  LONDERGAN ANA ,  BITA ION ,  ZION TODD

Inventor： YAN XIAOMING ,  HO CHOK ,  HEALD DAVID ,  GOUSEV EVGENI ,  HERTZLER BENJAMIN W ,  FLOYD PHILIP ,  SASAGAWA TERUO ,  LONDERGAN ANA ,  BITA ION ,  ZION TODD

IPC: H01L21/311 ,  B01D53/68 ,  H01L21/3213

CPC classification number: H01L21/32135 ,  B01D53/002 ,  B01D2257/11 ,  B01D2257/2027 ,  H01L21/31116

Abstract: A method of fabricating an electonic device which comprises a step of etching a sacrificial layer with an etchant comprising a noble gas fluoride, e.g. Xenon Fluoride (Xe F2). The efficiency of the etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.

Abstract translation: 一种制造电子器件的方法，其包括用包含惰性气体氟化物的蚀刻剂蚀刻牺牲层的步骤，例如， 氟化氙（Xe F2）。 可以以各种方式提高蚀刻工艺的效率，并且可以降低蚀刻工艺的成本。 未蚀刻的蚀刻剂可以在蚀刻过程中被隔离并再循环。 蚀刻副产物可以在蚀刻过程中从蚀刻系统中收集和去除。 蚀刻剂的组分可以被分离并用于一般的另外的蚀刻剂。 蚀刻剂或被蚀刻的层中的任一个或两者也可以针对特定的蚀刻工艺进行优化。

公开(公告)号：WO2008140926A3

公开(公告)日：2009-05-28

申请号：PCT/US2008061812

申请日：2008-04-28

Applicant: QUALCOMM MEMS TECHNOLOGIES INC ,  SAMPSELL JEFFREY BRIAN ,  GALLY BRIAN JAMES ,  FLOYD PHILIP DON

Inventor： SAMPSELL JEFFREY BRIAN ,  GALLY BRIAN JAMES ,  FLOYD PHILIP DON

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B3/007 ,  B81B2201/042 ,  B81B2207/07 ,  B81B2207/092 ,  G02B5/284 ,  G02B26/001 ,  H01L31/04 ,  Y10T29/49126

Abstract: Methods of fabricating a microelectromechanical systems (MEMS) device with reduced masking and MEMS devices formed by the same are disclosed. In one embodiment, a MEMS device (900) is fabricated by laminating a front substrate (910) and a carrier (950), each of which has components preformed thereon. The front substrate (910) is provided with stationary electrodes formed thereover. A carrier (950) including movable electrodes (1360) formed thereover is attached to the front substrate (910). The carrier (3500) of some embodiments is released after transferring the movable electrodes (3510) to the front substrate (3570). In other embodiments, the carrier (3450) stays over the front substrate (3410), and serves as a backplate for the MEMS device (3400). Features are formed by deposition and patterning, by embossing, or by patterning and etching. In some embodiments in which the MEMS device (5200) serves as an interferometric modulator, the front substrate (5010) is also provided with black masks (5220) to prevent or mitigate bright areas in the actuated state of the MEMS device. Static interferometric modulators (5400) can also be formed by shaping or preformation and lamination. The methods not only reduce the manufacturing costs, but also provide a higher yield. The resulting MEMS devices can trap smaller volumes between laminated substrates and are less susceptible to pressure variations and moisture leakage.

Abstract translation: 公开了制造具有减小的掩蔽的微机电系统（MEMS）装置和由其形成的MEMS装置的方法。 在一个实施例中，MEMS器件（900）通过层压前基板（910）和载体（950）而制造，每个基板具有在其上预成型的部件。 前基板（910）上设有固定电极。 包括在其上形成的可动电极（1360）的载体（950）附接到前基板（910）。 一些实施例的载体（3500）在将可移动电极（3510）转移到前基板（3570）之后被释放。 在其它实施例中，载体（3450）停留在前基板（3410）上，并且用作MEMS装置（3400）的背板。 特征通过沉积和图案化，通过压花或通过图案化和蚀刻形成。 在其中MEMS器件（5200）用作干涉式调制器的一些实施例中，前基板（5010）还具有黑色掩模（5220），以防止或减轻MEMS器件的致动状态下的亮区。 静态干涉式调制器（5400）也可以通过成形或预形成和层压形成。 该方法不仅降低了制造成本，而且提供了更高的产量。 所得到的MEMS器件可以在层压基板之间捕获更小的体积，并且不易受压力变化和水分泄漏的影响。

公开(公告)号：WO2009006162A2

公开(公告)日：2009-01-08

申请号：PCT/US2008068205

申请日：2008-06-25

Applicant: QUALCOMM MEMS TECHNOLOGIES INC ,  HEALD DAVID L ,  ZHONG FAN ,  FLOYD PHILIP DON

Inventor： HEALD DAVID L ,  ZHONG FAN ,  FLOYD PHILIP DON

IPC: G02B26/08

CPC classification number: G02B26/001 ,  B81B3/0072 ,  B81B2201/047

Abstract: Disclosed is a microelectromechanical system (MEMS) device and method of manufacturing the same. In one aspect, MEMS such as an interferometric modulator include one or more elongated interior posts and support rails supporting a deformable reflective layer, where the elongated interior posts are entirely within an interferometric cavity and aligned parallel with the support rails. In another aspect, the interferometric modulator includes one or more elongated etch release holes formed in the deformable reflective layer and aligned parallel with channels formed in the deformable reflective layer defining parallel strips of the deformable reflective layer.

Abstract translation: 公开了一种微机电系统（MEMS）装置及其制造方法。 在一个方面，诸如干涉式调制器的MEMS包括一个或多个细长的内部柱和支撑可变形的反射层的支撑轨道，其中细长的内部柱完全在干涉式空腔内并与支撑轨平行排列。 在另一方面，干涉式调制器包括形成在可变形反射层中的一个或多个细长蚀刻释放孔，并且与形成在可变形反射层中形成的沟道平行排列，所述可变形反射层限定可变形反射层的平行条带。

公开(公告)号：WO2006036437A1

公开(公告)日：2006-04-06

申请号：PCT/US2005/030927

申请日：2005-08-30

Applicant: IDC, LLC ,  FLOYD, Philip, D.

Inventor： FLOYD, Philip, D.

IPC: G02B26/00

CPC classification number: G02B26/001

Abstract: By varying the spacing between a partially-reflective, partially-transmissive surface 16 and a highly reflective surface 14 positioned behind the partially-reflective, partially-transmissive surface 16, an interferometric modulator 12 selectively creates constructive and/or destructive interference between light waves reflecting off the two surfaces 14, 16. The spacing can be varied by applying a voltage to create electrostatic attraction between the two surfaces 14, 16, which causes one or both surfaces 14, 16 to deform and move closer together. In the absence of such attraction, the surfaces 14, 16 are in a relaxed position, where they are farther apart from one another. An actuation voltage is needed to create sufficient electrostatic attraction to cause a surface 14, 16 to deform. The actuation voltage can be modified by implanting ions in a dielectric layer 102 attached to one or both surfaces 14, 16. Upon the application of a voltage, the ions create a baseline level of repulsion or attraction between the two surfaces 14, 16, which thus require more or less voltage, respectively, to cause a surface 14, 16 to deform. The degree of ion implantation can be chosen to set the actuation voltage as desired, or the surfaces 14, 16 can be made to deform at a given voltage by appropriately selecting the degree of ion implantation.

Abstract translation: 通过改变部分反射的部分透射表面16和位于部分反射的部分透射表面16之后的高反射表面14之间的间隔，干涉式调制器12选择性地在反射的光波之间产生建构性和/或相消干涉 离开两个表面14,16。可以通过施加电压以在两个表面14,16之间产生静电吸引力来改变间隔，这导致一个或两个表面14,16变形并且更靠近移动。 在没有这种吸引力的情况下，表面14,16处于松弛的位置，在那里它们彼此远离。 需要致动电压以产生足够的静电吸引力以使表面14,16变形。 激活电压可以通过将离子注入到连接到一个或两个表面14,16的电介质层102中来进行修改。在施加电压时，离子产生两个表面14,16之间的排斥或吸引的基线水平， 因此分别需要或多或少的电压使得表面14,16变形。 可以选择离子注入的程度以根据需要设定致动电压，或者可以通过适当地选择离子注入的程度使表面14,16在给定电压下变形。

公开(公告)号：WO2013063495A1

公开(公告)日：2013-05-02

申请号：PCT/US2012/062262

申请日：2012-10-26

Applicant: QUALCOMM INCORPORATED ,  MEADOR, James Chester ,  GRIFFITHS, Jonathan Charles ,  SETHI, Gaurav ,  BURNS, David William ,  FLOYD, Philip Don

Inventor： MEADOR, James Chester ,  GRIFFITHS, Jonathan Charles ,  SETHI, Gaurav ,  BURNS, David William ,  FLOYD, Philip Don

IPC: H04L29/08 ,  H04L12/28 ,  H04W4/02 ,  H04W4/00 ,  H04W4/04

CPC classification number: H04L67/125 ,  H04L12/2807 ,  H04L2012/2841 ,  H04W4/043

Abstract: Techniques disclosed herein provide for utilizing network nodes in a building automation system (BAS) that provide a low cost, highly-accurate positioning system. During a commissioning process, nodes can be used to automatically determine a location of other nodes within the building, and the other nodes can be automatically associated with certain sensors and/or controls, based on their locations and attributes. Additional information may be exchanged between the other nodes and other elements of the BAS during the commissioning process. Ranging techniques can be used to locate and/or track nodes, allowing assets and people to be accurately located within the building.

Abstract translation: 本文公开的技术提供了在建筑物自动化系统（BAS）中利用提供低成本，高精度定位系统的网络节点。 在调试过程中，可以使用节点来自动确定建筑物内其他节点的位置，其他节点可以根据其位置和属性自动与某些传感器和/或控件相关联。 在调试过程中，可以在其他节点和BAS的其他元件之间交换附加信息。 测距技术可用于定位和/或跟踪节点，允许资产和人员准确地位于建筑物内。

公开(公告)号：WO2011133706A1

公开(公告)日：2011-10-27

申请号：PCT/US2011/033308

申请日：2011-04-20

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  GOVIL, Alok ,  KAO, Tsongming ,  MIGNARD, Marc, M. ,  GANTI, Suryaprakash ,  FLOYD, Philip, D. ,  KOTHARI, Manish

Inventor： GOVIL, Alok ,  KAO, Tsongming ,  MIGNARD, Marc, M. ,  GANTI, Suryaprakash ,  FLOYD, Philip, D. ,  KOTHARI, Manish

IPC: G09G3/34

CPC classification number: G09G3/3466 ,  G09G5/34 ,  G09G2300/0809 ,  G09G2300/0814 ,  G09G2300/0857

Abstract: This disclosure provides systems, methods and apparatus for sharing image data between interconnected pixels in a display device. Some implementations of a display device may include an array of pixels, where each pixel includes a display element, a memory element, one or more data interconnect lines connecting the pixel to one or more other pixels, one or more switches positioned in one or more of the interconnect lines and one or more scroll data lines connected to one or more of the switches. Some implementations may enable scrolling of image data on a display without writing new image data to the display. Further, in some implementations, the display element may be an interferometric modulator (IMOD). Some other implementations may additionally include a display, a processor configured to communicate with the display and a memory device that is configured to communicate with the processor.

Abstract translation: 本公开提供了用于在显示设备中的互连像素之间共享图像数据的系统，方法和装置。 显示设备的一些实现可以包括像素阵列，其中每个像素包括显示元件，存储元件，将像素连接到一个或多个其他像素的一个或多个数据互连线，位于一个或多个 以及连接到一个或多个开关的一个或多个滚动数据线。 一些实施方式可以实现在显示器上滚动图像数据而不向显示器写入新的图像数据。 此外，在一些实现中，显示元件可以是干涉式调制器（IMOD）。 一些其它实现可以另外包括显示器，被配置为与显示器通信的处理器和被配置为与处理器通信的存储器设备。

公开(公告)号：WO2009036215A2

公开(公告)日：2009-03-19

申请号：PCT/US2008/076077

申请日：2008-09-11

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC. ,  YAN, Xiaoming ,  HO, Chok ,  HEALD, David ,  GOUSEV, Evgeni ,  HERTZLER, Benjamin, W. ,  FLOYD, Philip ,  SASAGAWA, Teruo ,  LONDERGAN, Ana ,  BITA, Ion ,  ZION, Todd

Inventor： YAN, Xiaoming ,  HO, Chok ,  HEALD, David ,  GOUSEV, Evgeni ,  HERTZLER, Benjamin, W. ,  FLOYD, Philip ,  SASAGAWA, Teruo ,  LONDERGAN, Ana ,  BITA, Ion ,  ZION, Todd

IPC: H01L21/311 ,  H01L21/3213 ,  B01D53/68

CPC classification number: H01L21/32135 ,  B01D53/002 ,  B01D2257/11 ,  B01D2257/2027 ,  H01L21/31116

Abstract: The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.

Abstract translation: 可以以各种方式增加蚀刻工艺的效率，并且可以降低蚀刻工艺的成本。 未蚀刻的蚀刻剂可以在蚀刻过程中被隔离并再循环。 蚀刻副产物可以在蚀刻过程中从蚀刻系统中收集和去除。 蚀刻剂的组分可以被分离并用于一般的另外的蚀刻剂。 蚀刻剂或被蚀刻的层中的任一个或两者也可以针对特定的蚀刻工艺进行优化。