A METHOD AND SYSTEM FOR IMPROVED DELIVERY OF A PRECURSOR VAPOR TO A PROCESSING ZONE
    1.
    发明申请
    A METHOD AND SYSTEM FOR IMPROVED DELIVERY OF A PRECURSOR VAPOR TO A PROCESSING ZONE 审中-公开
    一种改进向处理区输送前驱蒸气的方法和系统

    公开(公告)号:WO2006088562A3

    公开(公告)日:2006-12-14

    申请号:PCT/US2005047694

    申请日:2005-12-30

    Abstract: A method and system (1, 100) for improved delivery of a solid precursor (52, 152). A chemically inert coating (43) is provided on internal surfaces (41) in a precursor delivery line (40, 140) to reduce decomposition of a relatively unstable precursor vapor in the precursor delivery line (40, 140), thereby allowing increased delivery of the precursor vapor to a processing zone (33, 133) for depositing a layer on a substrate (25, 125). The solid precursor (52, 152) can, for example, be a ruthenium carbonyl or a rhenium carbonyl. The inert coating (43) can, for example, be a C X F y -containing polymer, such as polytetrafluoroethylene or ethylene­chlorotrifluoroethylene. Other benefits of using an inert coating (43) include easy periodic cleaning of deposits from the precursor delivery line (40, 140).

    Abstract translation: 一种用于改进固体前体(52,152)的输送的方法和系统(1,100)。 在前体输送管线(40,140)的内表面(41)上提供化学惰性涂层(43)以减少前体输送管线(40,140)中相对不稳定的前体蒸气的分解,从而允许增加 所述前体蒸汽通向用于在衬底(25,125)上沉积层的处理区(33,133)。 固体前体(52,152)可以例如是羰基钌或羰基铼。 惰性涂层(43)可以例如是含有聚合物的聚合物,例如聚四氟乙烯或乙烯 - 三氟氯乙烯。 使用惰性涂层(43)的其他益处包括易于定期清洁来自前体输送管线(40,140)的沉积物。

    A METHOD AND SYSTEM FOR IMPROVED DELIVERY OF A PRECURSOR VAPOR TO A PROCESSING ZONE
    2.
    发明申请
    A METHOD AND SYSTEM FOR IMPROVED DELIVERY OF A PRECURSOR VAPOR TO A PROCESSING ZONE 审中-公开
    一种用于将前驱体蒸汽提供给加工区的方法和系统

    公开(公告)号:WO2006088562A2

    公开(公告)日:2006-08-24

    申请号:PCT/US2005/047694

    申请日:2005-12-30

    Abstract: A method and system (1, 100) for improved delivery of a solid precursor (52, 152). A chemically inert coating (43) is provided on internal surfaces (41) in a precursor delivery line (40, 140) to reduce decomposition of a relatively unstable precursor vapor in the precursor delivery line (40, 140), thereby allowing increased delivery of the precursor vapor to a processing zone (33, 133) for depositing a layer on a substrate (25, 125). The solid precursor (52, 152) can, for example, be a ruthenium carbonyl or a rhenium carbonyl. The inert coating (43) can, for example, be a C X F y -containing polymer, such as polytetrafluoroethylene or ethylene­chlorotrifluoroethylene. Other benefits of using an inert coating (43) include easy periodic cleaning of deposits from the precursor delivery line (40, 140).

    Abstract translation: 一种用于改进固体前体(52,152)的输送的方法和系统(1,100)。 在前体输送管线(40,140)中的内表面(41)上提供化学惰性涂层(43),以减少前体输送管线(40,140)中相对不稳定的前体蒸汽的分解,从而允许增加 前体蒸气传送到用于在衬底(25,125)上沉积层的处理区(33,133)。 固体前体(52,152)可以例如是羰基钌或羰基铼。 惰性涂层(43)可以例如是含有聚四氟乙烯或亚乙基三氯三氟乙烯的聚合物。 使用惰性涂层(43)的其他益处包括容易地从前体输送管线(40,140)清洁沉积物。

    FILM PRECURSOR EVAPORATION SYSTEM AND METHOD OF USING
    3.
    发明申请
    FILM PRECURSOR EVAPORATION SYSTEM AND METHOD OF USING 审中-公开
    电影前驱体蒸发系统及其使用方法

    公开(公告)号:WO2007095407A1

    公开(公告)日:2007-08-23

    申请号:PCT/US2007/060561

    申请日:2007-01-16

    CPC classification number: C23C16/4481

    Abstract: A high conductance, multi-tray film precursor evaporation system (1 ) coupled with a high conductance vapor delivery system (40) is described for increasing deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system (50) includes one or more trays (340). Each tray is configured to support and retain film precursor (350) in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel (318) within the stackable trays and through an outlet (322) in the solid precursor evaporation system.

    Abstract translation: 描述了与高电导蒸气输送系统(40)耦合的高电导多托盘膜前体蒸发系统(1),以通过增加膜前体的暴露表面积来提高沉积速率。 多托盘膜前体蒸发系统(50)包括一个或多个托盘(340)。 每个托盘构造成支撑并保持例如固体粉末形式或固体片剂形式的膜前体(350)。 此外,每个托盘构造成在膜前体被加热的同时提供载气在膜前体上的高电导流。 例如,载气在膜前体向内流动,并且垂直向上流过可堆叠托盘内的流动通道(318)并通过固体前驱物蒸发系统中的出口(322)。

    MULTI-TRAY FILM PRECURSOR EVAPORATION SYSTEM AND THIN FILM DEPOSITION SYSTEM INCORPORATING SAME
    4.
    发明申请
    MULTI-TRAY FILM PRECURSOR EVAPORATION SYSTEM AND THIN FILM DEPOSITION SYSTEM INCORPORATING SAME 审中-公开
    多层膜前驱体蒸发系统和薄膜沉积系统

    公开(公告)号:WO2006058310A1

    公开(公告)日:2006-06-01

    申请号:PCT/US2005/043018

    申请日:2005-11-29

    CPC classification number: C23C16/4481 C23C16/16

    Abstract: A high conductance, multi-tray solid precursor evaporation system (50, 150, 300, 300') coupled with a high conductance vapor delivery system (40, 140) is described for increasing deposition rate by increasing exposed surface area of solid precursor (350). The multi-tray solid precursor evaporation system (50, 150, 300, 300') includes a base tray (330) with one or more upper trays (340). Each tray (330, 340) is configured to support and retain film precursor (350) in, for example, solid powder form or solid tablet form. Additionally, each tray (330, 340) is configured to provide for a high conductance flow of carrier gas over the film precursor (350) while the film precursor (350) is heated. For example, the carrier gas flows inward over the film precursor (350), and vertically upward through a flow channel (318) within the stackable trays (340) and through an outlet (322) in the solid precursor evaporation system (50, 150, 300, 300').

    Abstract translation: 描述了与高电导蒸气输送系统(40,140)耦合的高电导多托盘固体前体蒸发系统(50,150,300,300'),以通过增加固体前体(350)的暴露表面积来提高沉积速率 )。 多托盘固体前体蒸发系统(50,150,300,300')包括具有一个或多个上托盘(340)的基托(330)。 每个托盘(330,340)被配置为以例如固体粉末形式或固体片剂形式支撑并保持膜前体(350)。 另外,每个托盘(330,340)构造成在膜前体(350)被加热的同时提供载气在膜前体(350)上的高电导流。 例如,载气在膜前体(350)上向内流动,并且垂直向上流过可堆叠托盘(340)内的流动通道(318)并通过固体前体蒸发系统(50,150)中的出口(322) ,300,300')。

Patent Agency Ranking