Abstract:
A method and system (1, 100) for improved delivery of a solid precursor (52, 152). A chemically inert coating (43) is provided on internal surfaces (41) in a precursor delivery line (40, 140) to reduce decomposition of a relatively unstable precursor vapor in the precursor delivery line (40, 140), thereby allowing increased delivery of the precursor vapor to a processing zone (33, 133) for depositing a layer on a substrate (25, 125). The solid precursor (52, 152) can, for example, be a ruthenium carbonyl or a rhenium carbonyl. The inert coating (43) can, for example, be a C X F y -containing polymer, such as polytetrafluoroethylene or ethylenechlorotrifluoroethylene. Other benefits of using an inert coating (43) include easy periodic cleaning of deposits from the precursor delivery line (40, 140).
Abstract:
A method and system (1, 100) for improved delivery of a solid precursor (52, 152). A chemically inert coating (43) is provided on internal surfaces (41) in a precursor delivery line (40, 140) to reduce decomposition of a relatively unstable precursor vapor in the precursor delivery line (40, 140), thereby allowing increased delivery of the precursor vapor to a processing zone (33, 133) for depositing a layer on a substrate (25, 125). The solid precursor (52, 152) can, for example, be a ruthenium carbonyl or a rhenium carbonyl. The inert coating (43) can, for example, be a C X F y -containing polymer, such as polytetrafluoroethylene or ethylenechlorotrifluoroethylene. Other benefits of using an inert coating (43) include easy periodic cleaning of deposits from the precursor delivery line (40, 140).
Abstract:
A high conductance, multi-tray film precursor evaporation system (1 ) coupled with a high conductance vapor delivery system (40) is described for increasing deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system (50) includes one or more trays (340). Each tray is configured to support and retain film precursor (350) in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel (318) within the stackable trays and through an outlet (322) in the solid precursor evaporation system.
Abstract:
A high conductance, multi-tray solid precursor evaporation system (50, 150, 300, 300') coupled with a high conductance vapor delivery system (40, 140) is described for increasing deposition rate by increasing exposed surface area of solid precursor (350). The multi-tray solid precursor evaporation system (50, 150, 300, 300') includes a base tray (330) with one or more upper trays (340). Each tray (330, 340) is configured to support and retain film precursor (350) in, for example, solid powder form or solid tablet form. Additionally, each tray (330, 340) is configured to provide for a high conductance flow of carrier gas over the film precursor (350) while the film precursor (350) is heated. For example, the carrier gas flows inward over the film precursor (350), and vertically upward through a flow channel (318) within the stackable trays (340) and through an outlet (322) in the solid precursor evaporation system (50, 150, 300, 300').