Abstract:
A selective area deposition on a substrate surface having a separate areas of different materials comprises forming a plasma (optionally ignited by filament (35)) over the substrate (37) on pedestal (16) and insulator (17), injecting coating species into the plasma by either sputtering from source (26) or gaseous injection, adding a reactive gas via inlet (33) for altering surface binding energy at the coating surface, and biasing (19, 21) the substrate during deposition to bombard the substrate with ionic species from the plasma. Surface binding energy is altered differently for the separate areas, enhancing selectivity. Bias power is controlled to exploit the alteration in surface binding energy. For gaseous injection of the coating species, and in some cases of sputtering of the coating material, the temperature of the substrate surface is controlled (23, 24, 25) also. In an alternative embodiment, selectivity is to phase of the coating material rather than to specific areas on the substrate, and a selected phase may be preferentially deposited on the substrate.
Abstract:
A selective area deposition on a substrate surface having a separate areas of different materials comprises forming a plasma (optionally ignited by filament (35)) over the substrate (37) on pedestal (16) and insulator (17), injecting coating species into the plasma by either sputtering from source (26) or gaseous injection, adding a reactive gas via inlet (33) for altering surface binding energy at the coating surface, and biasing (19, 21) the substrate during deposition to bombard the substrate with ionic species from the plasma. Surface binding energy is altered differently for the separate areas, enhancing selectivity. Bias power is controlled to exploit the alteration in surface binding energy. For gaseous injection of the coating species, and in some cases of sputtering of the coating material, the temperature of the substrate surface is controlled (23, 24, 25) also. In an alternative embodiment, selectivity is to phase of the coating material rather than to specific areas on the substrate, and a selected phase may be preferentially deposited on the substrate.
Abstract:
A MEMS valve device driven by electrostatic forces is provided. The MEMS valve device includes a substrate having an aperture formed therein, a substrate electrode, a moveable membrane that overlies the aperture and has an electrode element and a biasing element. Additionally, at least one resiliently compressible dielectric layer is provided to insure electrical isolation between the substrate electrode and electrode element of the moveable membrane. In operation, a voltage differential is established between the substrate electrode and the electrode element of the moveable membrane to move the membrane relative to the aperture to thereby controllably adjust the portion of the aperture that is covered by the membrane. In another embodiment the resiliently compressible dielectric layer(s) have a textured surface; either at the valve seat, the valve seal or at both surfaces. In another embodiment of the invention a pressure-relieving aperture is defined within the substrate and is positioned to underlie the moveable membrane.
Abstract:
An optical device for switching an optical signal between a first optical path and a second optical path, including a substrate, a first guide forming at least a portion of the first optical path, formed on the substrate, and having a movable portion separated from the substrate, a second guide forming at least a portion of the second optical path and disposed adjacent to the first guide, and means for electro statically bending the movable portion so as to optically couple the first guide to the second guide.
Abstract:
This invention provides a continuous display with non-uniform pixel density, forming a foveated display. A single, continuous display has a higher pixel density at the center of the display than at the periphery of the display. Where two continuous displays are used in accordance with the present invention, the central forward gaze of the viewer's image will be displayed in high resolution while the leftmost portion of the left eye display will be in low resolution and the rightmost portion of the right eye display will be in low resolution. The pixel resolution of the visual display may correspond to the visual acuity of the human eye. A foveated image display system using a continuous display with non-uniform pixel density increases the field of view while reducing the image bandwidth. A foveated image display system may be hardware-based by employing anamorphic lenses or sensors rather than relying upon image interpolation to modify the resolution of the resultant image data communicated to the continuous display with non-uniform pixel density.
Abstract:
A MEMS valve device driven by electrostatic forces is provided. The MEMS valve device includes a substrate having an aperture formed therein, a substrate electrode, a moveable membrane that overlies the aperture and has an electrode element and a biasing element. Additionally, at least one resiliently compressible dielectric layer is provided to insure electrical isolation between the substrate electrode and electrode element of the moveable membrane. In operation, a voltage differential is established between the substrate electrode and the electrode element of the moveable membrane to move the membrane relative to the aperture to thereby controllably adjust the portion of the aperture that is covered by the membrane. In another embodiment the resiliently compressible dielectric layer(s) have a textured surface; either at the valve seat, the valve seal or at both surfaces. In another embodiment of the invention a pressure-relieving aperture is defined within the substrate and is positioned to underlie the moveable membrane.
Abstract:
A selective area deposition on a substrate surface having a separate areas of different materials comprises forming a plasma (optionally ignited by filament (35)) over the substrate (37) on pedestal (16) and insulator (17), injecting coating species into the plasma by either sputtering from source (26) or gaseous injection, adding a reactive gas via inlet (33) for altering surface binding energy at the coating surface, and biasing (19, 21) the substrate during deposition to bombard the substrate with ionic species from the plasma. Surface binding energy is altered differently for the separate areas, enhancing selectivity. Bias power is controlled to exploit the alteration in surface binding energy. For gaseous injection of the coating species, and in some cases of sputtering of the coating material, the temperature of the substrate surface is controlled (23, 24, 25) also. In an alternative embodiment, selectivity is to phase of the coating material rather than to specific areas on the substrate, and a selected phase may be preferentially deposited on the substrate.