公开(公告)号：JP2006071651A

公开(公告)日：2006-03-16

申请号：JP2005328829

申请日：2005-11-14

Applicant: Osmic Inc ,  オスミック,インコーポレイテッド

Inventor： JIANG LICAI

IPC: G01N23/201 ,  G21K1/02 ,  G21K1/04 ,  G21K1/06 ,  G21K5/00

CPC classification number: G01N23/201

Abstract: PROBLEM TO BE SOLVED: To solve the problem that alignment of slits result causes serious difficulties, especially, in a small sized slit and a plurality of slits, in an apparatus that forms X-ray beams.
SOLUTION: The apparatus comprises a plate and an opening formed in the plate, and the opening has a contour that converges to an vertex, an opening formed at a known distance from the vertex on the plate, and an X-ray detector used as feedback, when orienting the X-ray beams. The X-ray beams are arranged so as to pass through the opening to the X-ray detector, and the X-ray beams and the opening are made to move mutual, with respect to the other. The X-ray beams move to the vertex, by using the feedback of the X-ray detector and the X-ray beams move by the known distance to the opening.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题为了解决在形成X射线束的装置中狭缝的排列导致严重困难的问题，特别是在小尺寸狭缝和多个狭缝中的问题。 解决方案：该装置包括板和形成在板中的开口，并且开口具有会聚到顶点的轮廓，形成在板上顶部已知距离处的开口，以及X射线检测器 用于定向X射线束时的反馈。 X射线束被布置成穿过开口到X射线检测器，并且使X射线束和开口相对于另一个相互移动。 通过使用X射线检测器的反馈和X射线束移动到开口的已知距离，X射线束移动到顶点。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2013210377A

公开(公告)日：2013-10-10

申请号：JP2013101193

申请日：2013-05-13

Applicant: Osmic Inc ,  オスミック、インコーポレイテッド

Inventor： BORIS VERMAN ,  HARADA JINPEI

IPC: G21K1/06 ,  A61N5/10 ,  G02B26/08 ,  G21K1/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: PROBLEM TO BE SOLVED: To provide an improved X-ray optical system for adjusting an X-ray beam by using a crystal.SOLUTION: The present invention provides an X-ray beam adjustment system having a Kirkpatrick Baez type diffraction optical component including two optical elements one of which is a crystal. The elements are arranged by adjoining structure. The crystal may be a perfect crystal. One or both diffraction elements may be mosaic crystals. One element may be a multilayer optical component. For example, the multilayer optical component may be an oval mirror or parabolic mirror in which lattice spacing gradually changes. The gradually changing lattice spacing can be made to gradually change in the horizontal direction, or to change in the depth direction, either or both of them.

Abstract translation: 要解决的问题：提供一种通过使用晶体来调整X射线束的改进的X射线光学系统。解决方案：本发明提供一种具有Kirkpatrick Baez型衍射光学部件的X射线束调节系统，包括两个光学 元素之一是水晶。 元件由邻接结构排列。 水晶可能是一个完美的水晶。 一个或两个衍射元件可以是镶嵌晶体。 一个元件可以是多层光学部件。 例如，多层光学部件可以是晶格间距逐渐变化的椭圆镜或抛物面镜。 逐渐变化的晶格间距可以在水平方向上逐渐变化，或者在深度方向上变化，其中一个或两个。

公开(公告)号：US20030128811A1

公开(公告)日：2003-07-10

申请号：US10146712

申请日：2002-05-14

Applicant: Osmic, Inc.

Inventor： Boris Verman ,  Licai Jiang ,  Bonglea Kim ,  Karsten Dan Joensen

IPC: G21K001/06

CPC classification number: G21K1/06 ,  A61N2005/1091 ,  A61N2005/1095

Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

公开(公告)号：JP2012094531A

公开(公告)日：2012-05-17

申请号：JP2011279345

申请日：2011-12-21

Applicant: Osmic Inc ,  オスミック、インコーポレイテッド

Inventor： BONGLEA KIM

IPC: H01J35/28 ,  H01J35/08 ,  H01J35/14 ,  H01J35/16 ,  H01J35/24

CPC classification number: H01J35/24 ,  H01J35/14

Abstract: PROBLEM TO BE SOLVED: To provide an X-ray from a single-spot micro-focusing x-ray source having the advantages of long service life and durability associated with a rotating anode and high luminance needed for advanced x-ray applications.SOLUTION: Emitted electrons travel towards a target 30 in parallel with a longitudinal axis extending between an electron-generation chamber 12 and a target chamber 14, and bombard the target to generate x-rays. The target is displaceable, while being bombarded with electrons, with respect to a support structure in at least one direction perpendicular to the longitudinal axis.

Abstract translation: 要解决的问题：为了提供来自单点微聚焦X射线源的X射线，其具有与旋转阳极相关联的长使用寿命和耐久性以及高级x射线应用所需的高亮度的优点 。 解决方案：发射的电子朝向与电子发生室12和目标室14之间延伸的纵轴平行的靶30行进，并且轰击靶以产生X射线。 在与垂直于纵向轴线的至少一个方向相对于支撑结构相对于电子轰击的目标是可置换的。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2006250952A

公开(公告)日：2006-09-21

申请号：JP2006157925

申请日：2006-06-07

Applicant: Osmic Inc ,  オスミック,インコーポレイテッド

Inventor： JIANG LICAI

IPC: G01N23/201 ,  G21K1/06

CPC classification number: G01N23/201

Abstract: PROBLEM TO BE SOLVED: To provide method and system for generating X-ray beam which reduces beam divergence of X-rays used for small angle X-ray scattering application.
SOLUTION: This is the X-ray analysis system which contains convergence optical system for converging X-ray beam into a focal point, a 1st slit to optically be combined with the convergence optical system, a 2nd slit to optically be combined with the 1st slit, and an X-ray detector, where the focal point is located in front of the detector.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于产生X射线束的方法和系统，其减少用于小角度X射线散射应用的X射线的光束发散。

解决方案：这是一种X射线分析系统，其包含用于将X射线束会聚到焦点的聚光光学系统，第一狭缝以光学地与会聚光学系统组合，第二狭缝，光学地与 第一缝和X射线检测器，其中焦点位于检测器的前面。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：US20040170250A1

公开(公告)日：2004-09-02

申请号：US10787516

申请日：2004-02-26

Applicant: Osmic, Inc.

Inventor： Boris Verman ,  Licai Jiang

IPC: G21K001/06

CPC classification number: G21K1/06 ,  G21K1/04

Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.

Abstract translation: X射线光学装置包括光学元件和可选择的孔，其可以选择性地遮挡X射线束的一部分。 可调整孔径可以位于光学元件和样品之间，并且可以与光学元件集成或者位于光学元件附近。 可调孔径使用户能够容易且有效地调节x射线的收敛。 在这样做时，可以通过使用具有对于所有潜在测量允许的最大收敛的光学器件，然后通过调节光圈来选择用于特定测量的会聚来优化X射线光学器件的通量和分辨率。

公开(公告)号：US20030002622A1

公开(公告)日：2003-01-02

申请号：US09896458

申请日：2001-06-29

Applicant: Osmic, Inc.

Inventor： Vladimir V. Martynov ,  Yuriy Platonov

IPC: G21K001/06

CPC classification number: B82Y10/00 ,  G02B5/1809 ,  G02B5/1838 ,  G21K1/06 ,  G21K1/062

Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.

Abstract translation: 一种光栅，其包括具有交替的材料层的多层结构，在多个焊盘之间形成多个槽，其中所述多个槽和多个焊盘中的至少一个结构参数在所述多层结构中随机形成。

公开(公告)号：US20030128810A1

公开(公告)日：2003-07-10

申请号：US10043817

申请日：2002-01-10

Applicant: Osmic, Inc.

Inventor： Boris Verman ,  Karsten Joensen ,  Yuriy Platonov ,  Srivatsan Seshadri

IPC: G21K001/06

CPC classification number: B82Y10/00 ,  G21K1/062

Abstract: An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.

Abstract translation: 一种用于衍射X射线的光学元件，包括衬底，施加到衬底的衍射结构，衍射结构包括背离衬底的外表面和能够衍射X射线的衍射结构和施加到衬底的保护层 外表面。

公开(公告)号：US20030072412A1

公开(公告)日：2003-04-17

申请号：US10302481

申请日：2002-11-22

Applicant: Osmic, Inc.

Inventor： Vladimir V. Martynov ,  Yuriy Platonov

IPC: G01T001/36 ,  G21K001/06

CPC classification number: B82Y10/00 ,  G02B5/1809 ,  G02B5/1838 ,  G21K1/06 ,  G21K1/062

Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.

公开(公告)号：WO2005093779A1

公开(公告)日：2005-10-06

申请号：PCT/US2004/039118

申请日：2004-11-19

Applicant: OSMIC, INC. ,  BONGLEA, Kim

Inventor： BONGLEA, Kim

IPC: H01J35/28

CPC classification number: H01J35/24 ,  H01J35/14

Abstract: The present invention provides an x-ray source (10) including an electron-generation chamber (12) with an electron beam source (22) that emits electrons and a target chamber (14) with a support structure (36) and a target (30) positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.

Abstract translation: 本发明提供一种X射线源（10），其包括具有发射电子的电子束源（22）的电子发生室（12）和具有支撑结构（36）和靶（14）的靶室（14） 30）定位在支撑结构内。 发射的电子沿着基本上平行于电子发生室和目标室之间延伸的纵轴的方向朝向靶并且轰击靶以产生X射线。 目标是在垂直于纵向轴线的至少一个方向上相对于支撑结构被电子轰击的同时被移动。