公开(公告)号：WO2012110465A4

公开(公告)日：2012-12-27

申请号：PCT/EP2012052431

申请日：2012-02-13

Applicant: MAPPER LITHOGRAPHY IP BV ,  ROSENTHAL ALON

Inventor： ROSENTHAL ALON

IPC: G03F7/20 ,  H01J37/147 ,  H01J37/317 ,  H01L21/67

CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

Abstract: The invention relates to a system (100) for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber (102) and a set of two coils (120a; 120b). The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

Abstract translation: 本发明涉及用于对带电粒子光刻设备进行磁屏蔽的系统（100）。 该系统包括第一室，第二室（102）和一组两个盘管（120a; 120b）。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。

公开(公告)号：WO2012110465A3

公开(公告)日：2012-11-01

申请号：PCT/EP2012052431

申请日：2012-02-13

Applicant: MAPPER LITHOGRAPHY IP BV ,  ROSENTHAL ALON

Inventor： ROSENTHAL ALON

IPC: G03F7/20 ,  H01J37/147 ,  H01J37/317 ,  H01L21/67

CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

Abstract: The invention relates to a system (100) for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber (102) and a set of two coils (120a; 120b). The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统（100）。 该系统包括第一室，第二室（102）和一组两个线圈（120a; 120b）。 第一腔室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二腔室还具有包含磁屏蔽材料的壁，并包围第一腔室。 该组两个线圈设置在第一室的相对侧上的第二室中。 两个线圈有一个公共轴。

公开(公告)号：WO2012110465A2

公开(公告)日：2012-08-23

申请号：PCT/EP2012/052431

申请日：2012-02-13

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  ROSENTHAL, Alon

Inventor： ROSENTHAL, Alon

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。