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    METHOD AND APPARATUS FOR REDUCING THE EFFECTS OF WINDOW CLOUDING ON A VIEWPORT WINDOW IN A REACTIVE ENVIRONMENT
    2.
    发明申请
    METHOD AND APPARATUS FOR REDUCING THE EFFECTS OF WINDOW CLOUDING ON A VIEWPORT WINDOW IN A REACTIVE ENVIRONMENT 审中-公开
    用于降低窗户云在反应环境中的视窗效果的方法和装置

    公开(公告)号：WO2008115606A3

    公开(公告)日：2009-01-29

    申请号：PCT/US2008005544

    申请日：2008-04-29

    Applicant: VERITY INSTR INC ,  HARVERY KENNETH C

    Inventor： HARVERY KENNETH C

    IPC: H01L21/00

    CPC classification number: H01J37/32477 ,  H01J37/3244 ,  H01J37/32449

    Abstract: Multichannel array for establishing viscous flow for preventing the flow of particulates causing window clouding. Process chamber for confining process pressure within a process volume with a viewport window along the chamber for viewing portion of process volume. Ingress port disposed in the process chamber for receiving flow of process gas and egress port for extracting flow rate of gas from the process volume. Multichannel array (MCA) disposed between viewport window and process volume of the process chamber. Window chamber separate viewport window from MCA with chamber window port for receiving gas. Viscous flow formed at window side of channels, prevents material from entering window chamber and adhering to window. Viscous flow established by increasing pressure in window chamber via chamber window port. Viscous flow rate substantially lower than rate of process gas flow into process volume.

    Abstract translation: 用于建立粘性流动的多通道阵列，用于防止引起窗玻璃的颗粒物流。 处理室，用于将处理体积内的过程压力限制为沿着室的视口窗口，用于观察处理体积的一部分。 入口端口设置在处理室中，用于接收处理气体和出口的流量，用于从处理体积中提取气体的流量。 多通道阵列（MCA）设置在视口窗口和处理室的处理体积之间。 窗户室与MCA分开的视口窗口，带有用于接收气体的室窗口。 在通道的窗口侧形成的粘性流动防止材料进入窗户室并附着在窗户上。 通过室窗口增加窗户室压力建立的粘性流。 粘度流量大大低于工艺气体进入工艺流量的速率。

    APPARATUS AND METHOD FOR ENHANCING DYNAMIC RANGE OF CHARGE COUPLED DEVICE-BASED SPECTROGRAPH
    3.
    发明申请
    APPARATUS AND METHOD FOR ENHANCING DYNAMIC RANGE OF CHARGE COUPLED DEVICE-BASED SPECTROGRAPH 审中-公开
    用于增强充电耦合器件的动态范围的装置和方法

    公开(公告)号：WO2005012954A3

    公开(公告)日：2005-12-29

    申请号：PCT/US2004007207

    申请日：2004-03-09

    Applicant: VERITY INSTR INC ,  KUENY ANDREW WEEKS

    Inventor： KUENY ANDREW WEEKS

    IPC: H04N5/347 ,  H04N5/355 ,  H04N3/14 ,  H01L27/00 ,  H01L27/148 ,  H01L29/768 ,  H04N5/235 ,  H04N5/238 ,  H04N5/335

    CPC classification number: H04N5/347 ,  G01J3/2803 ,  H04N3/1525 ,  H04N3/155 ,  H04N3/1562 ,  H04N5/355 ,  H04N5/35563 ,  H04N5/3728

    Abstract: The present invention is directed to an apparatus, method and software producer for enhancing the dynamic range of a CCD sensor without substantially increasing the noise. Initially, the area of a N x M pixel CCD sensor array is subdivided into two regions, a large region having (M-a) pixels in each column for outputting large-amplitude signals with low noise and a smaller region having a pixels in each column for outputting small-amplitude signals with improved dynamic range. At integration time, the CCD is read out one region's vows at a time into the horizontal shift registers by shifting the pixel charges in either a or M-a vertical shifts. The charges in the horizontal shift registers are then shifted out of the horizontal shift registers in N horizontal shifts.

    Abstract translation: 本发明涉及一种用于增强CCD传感器的动态范围而不显着增加噪声的装置，方法和软件生产者。 最初，N×M像素CCD传感器阵列的区域被细分成两个区域，每个列中具有（Ma）像素的大区域用于输出具有低噪声的大振幅信号，并且具有每列中具有像素的较小区域， 输出具有改善的动态范围的小振幅信号。 在积分时间，CCD通过以a或m-a垂直移位移位像素电荷，一次将一个区域的誓言读出到水平移位寄存器中。 然后水平移位寄存器中的电荷以N个水平移位移出水平移位寄存器。

    CALIBRATION OF A RADIOMETRIC OPTICAL MONITORING SYSTEM USED FOR FAULT DETECTION AND PROCESS MONITORING
    4.
    发明申请
    CALIBRATION OF A RADIOMETRIC OPTICAL MONITORING SYSTEM USED FOR FAULT DETECTION AND PROCESS MONITORING 审中-公开
    用于故障检测和过程监测的无线电光学监测系统的校准

    公开(公告)号：WO2008137169A2

    公开(公告)日：2008-11-13

    申请号：PCT/US2008005852

    申请日：2008-05-06

    Applicant: VERITY INSTR INC ,  WHELAN MIKE ,  KUENY ANDREW WEEKS ,  HARVEY KENNETH C ,  CORLESS JOHN DOUGLAS

    Inventor： WHELAN MIKE ,  KUENY ANDREW WEEKS ,  HARVEY KENNETH C ,  CORLESS JOHN DOUGLAS

    IPC: G06F19/00

    CPC classification number: G01J3/443 ,  G01J3/28 ,  G01J2003/2866

    Abstract: The present invention is directed to a system and method for radiometric calibration of spectroscopy equipment utilized in fault detection and process monitoring. Initially, a reference spectrograph is calibrated to a local primary standard (a calibrated light source with known spectral intensities and traceable to a reference standard). Other spectrographs are then calibrated from the reference spectrograph rather than the local primary calibration standard. This is accomplished by viewing a light source with both the reference spectrograph and the spectrograph to be calibrated. The output from the spectrograph to be calibrated is compared to the output of the reference spectrograph and then adjusted to match that output. The present calibration process can be performed in two stages, the first with the spectrographs calibrated to the reference spectrograph and then are fine tuned to a narrow band light source at the plasma chamber. Alternatively, the reference spectrograph can be calibrated to the local primary standard while optically coupled to the plasma chamber. There, the local primary standard calibration light source is temporarily positioned within the plasma chamber, or in a light chamber disposed along the interior of the chamber for calibrating the reference spectrograph. Other spectrographs can be calibrated to the reference spectrograph while coupled to the plasma chamber with the local primary standard calibration light source, thereby calibrating every component in the entire optical path to the reference spectrograph.

    Abstract translation: 本发明涉及用于故障检测和过程监测中的光谱设备的辐射校准的系统和方法。 最初，将参考光谱仪校准为局部主要标准（具有已知光谱强度且可追溯到参考标准的校准光源）。 然后从参考光谱仪而不是本地主要校准标准校准其他光谱仪。 这是通过用参考光谱仪和要校准的光谱仪来观察光源来实现的。 将要校准的光谱仪的输出与参考光谱仪的输出进行比较，然后进行调整以匹配该输出。 本校准过程可以分两个阶段执行，第一阶段是用参考光谱仪校准的光谱仪，然后在等离子体腔室内对窄带光源进行微调。 或者，参考光谱仪可以校准到局部初级标准，同时光学耦合到等离子体室。 在那里，局部主标准校准光源临时定位在等离子体室内，或者沿着室内设置的光室中，用于校准参考光谱仪。 当使用本地主要标准校准光源耦合到等离子体室时，可以将其他光谱仪校准为参考光谱仪，从而将整个光学路径中的每个分量校准到参考光谱仪。

    HETERODYNE REFLECTOMETER FOR FILM THICKNESS MONITORING AND METHOD FOR IMPLEMENTING
    5.
    发明申请
    HETERODYNE REFLECTOMETER FOR FILM THICKNESS MONITORING AND METHOD FOR IMPLEMENTING 审中-公开
    膜厚检测用异位反射计及其实施方法

    公开(公告)号：WO2006093709A2

    公开(公告)日：2006-09-08

    申请号：PCT/US2006005937

    申请日：2006-02-21

    Applicant: VERITY INSTR INC

    Inventor： AIYER ARUN ANANTH AIYER ,  MELONI MARK A ,  HARVEY KENNETH C ,  KUENY ANDREW WEEKS

    CPC classification number: G01B11/0641 ,  G01B11/0625

    Abstract: A linearly polarized light comprised of two linearly polarized components that are orthogonal to each other, with split optical frequencies, is directed toward a film causing one of the optical polarization components to lag behind the other due to an increase in the optical path in the film for that component. A pair of detectors receives the beam reflected from the film layer and produces a measurement signal, and the beam prior to incidence on the film layer and generates a reference signal, respectively. The measurement signal and reference signal are analyzed by a phase detector for phase shift. The detected phase shift is then fed into a thickness calculator for film thickness results. A grating interferometer may be included with the heterodyne reflectometer system with a grating, which diffracts the reflected beam into zeroth- and first-order bands, which are then detected by separate detectors. A detector receives the zeroth-order beam and generates another measurement signal. Another detector receives the first-order beam and generates a grating signal. The measurement signal from the grating and reference signal may be analyzed by a phase detector for phase shift, which is related to the thickness of the film. Additionally, the zeroth-order beam measurement signal is analyzed with the grating signal by a phase detector for detecting a grating phase shift induced by the grating. The refractive index for the film can then be calculated directly from grating phase shift and the heterodyne phase shift for the grating pitch, and the beam's wavelength and incidence angle on the film of the measurement apparatus. Using the refractive index and heterodyne phase shift, the film's thickness is determined. Conversely, a film thickness calculation may be derived independent of the film's refractive index using from the actual corrected grating phase shift and corrected heterodyne phase shift.

    Abstract translation: 由分裂的光学频率彼此正交的两个线性偏振分量组成的线性偏振光指向一个薄膜，导致光学偏振分量之一由于膜中光路的增加而落后于另一个 为该组件。 一对检测器接收从膜层反射的光束并产生测量信号，并且在入射到膜层之前分别产生参考信号。 测量信号和参考信号由相位检测器分析。 然后将检测到的相移馈送到用于膜厚度结果的厚度计算器中。 光栅干涉仪可以与带有光栅的外差反射计系统一起包含，其将反射光束衍射成零级和一级带，然后由单独的检测器检测。 检测器接收零级光束并产生另一测量信号。 另一个检测器接收一阶光束并产生光栅信号。 来自光栅和参考信号的测量信号可以通过用于相移的相位检测器进行分析，这与膜的厚度有关。 另外，通过用于检测由光栅引起的光栅相移的相位检测器用光栅信号分析零级光束测量信号。 然后可以直接从光栅相移和光栅间距的外差相移以及光束在测量装置的膜上的波长和入射角来计算膜的折射率。 使用折射率和外差相移，确定膜的厚度。 相反，可以根据实际校正的光栅相移和校正的外差相移而不依赖于膜的折射率来导出膜厚度计算。

    AFTERGLOW EMISSION SPECTROSCOPY MONITOR
    7.
    发明公开
    AFTERGLOW EMISSION SPECTROSCOPY MONITOR 审中-公开
    NACHGLÜHEMISSIONSSPEKTROSKOPIEÜBERWACHUNGS-VORRICHTUNG

    公开(公告)号：EP1325304A4

    公开(公告)日：2006-05-17

    申请号：EP01972976

    申请日：2001-09-10

    Applicant: VERITY INSTR INC

    Inventor： VERITY INSTRUMENTS INC

    IPC: G01N21/68 ,  H01J37/32 ,  G01N15/06 ,  C23C16/00 ,  G01N7/00

    CPC classification number: H01J37/32935 ,  G01N21/68 ,  H01J37/32972

    Abstract: Afterglow spectroscopy allows observing light emission of gaseous species in absence of direct plasma light. This absence avoids the creation of a background sprectrum obscuring weak emission from trace species. The geometry of the invention prevents direct plasma light (3) from reaching the observation window (10) while a lens (10) focues afterglow emission light on the entrance of a photo multiplier (11). The invention describes a flowing afterglow version monitoring in-situ the cleanup of vacuum tools during pump/purge cycles. The invention also describes an intermittent afterflow version siutable for trace gas analysis at atmospheric pressure.

    Abstract translation: 余辉光谱学允许在没有直接等离子光的情况下观察气体物质的光发射。 这种缺席避免了创建一个背景spsctrum模糊微量物种的微弱排放。 本发明的几何形状防止直接等离子光（3）到达观察窗（10），而透镜（10）在光电倍增管（11）的入口处聚焦余辉发射光。 本发明描述了在泵/清洗循环期间现场流动余辉版本监测真空工具的清理。 本发明还描述了适用于大气压力下痕量气体分析的间歇式后流式。

    SPECTROSCOPIC ELLIPSOMETER
    9.
    发明公开
    SPECTROSCOPIC ELLIPSOMETER 有权
    SPEKTROSKOPISCHES ELLIPSOMETER

    公开(公告)号：EP1095259A4

    公开(公告)日：2004-06-02

    申请号：EP99938722

    申请日：1999-07-08

    Applicant: VERITY INSTR INC

    Inventor： FLUCKIGER DAVID U ,  KUENY ANDREW W

    IPC: G01J4/04 ,  G01N21/21

    CPC classification number: G01J4/04 ,  G01N21/211

    Abstract: A spectral ellipsometer that enables complete simultaneous measurement of ellipsometric parameters of a surface (18) with thin films and coatings for the full wavelength range of interest by using an imaging spectrograph (24) together with a novel optical arrangement that disperses the polarization information of a time-invariant train of optical signals in a linear spatial array of points along or parallel to an input aperture or slit of the imaging spectrograph (24) and disperses the polarization information in wavelength perpendicular to the aperture or slit to provide a two-dimentional spectrograph image that is collected and stored by an imaging array with one axis relating to wavelength and the other axis relating to the light polarization. Multiple simultaneous measurements of the spectral ellipsometric parameters psi (psi) and DELTA (delta) are taken at all wavelengths without the need of any time-varying or mechanically-moving optical elements.

    10.
    发明专利
    未知

    公开(公告)号：DE69938134T2

    公开(公告)日：2009-02-05

    申请号：DE69938134

    申请日：1999-07-08

    Applicant: VERITY INSTR INC

    Inventor： FLUCKIGER DAVID U ,  KUENY ANDREW W

    IPC: G01N21/21 ,  G01J4/04

    Abstract: A spectral ellipsometer that enables complete simultaneous measurement of ellipsometric parameters of a surface with thin films and coatings for the full wavelength range of interest by using an imaging spectrograph together with a novel optical arrangement that disperses the polarization information of a time-invariant train of optical signals in a linear spatial array of points along or parallel to an input aperture or slit of the imaging spectrograph and disperses the polarization information in wavelength perpendicular to the aperture or slit to provide a two-dimensional spectrograph image that is collected and stored by an imaging array with one axis relating to wavelength and the other axis relating to the light polarization. Multiple simultaneous measurements of the spectral ellipsometric parameters psi (psi) and DELTA (delta) are taken at all wavelengths without the need of any time-varying or mechanically-moving optical elements. The ellipsometer can be used for real-time measurements of ellipsometric parameters of a moving or static surface with the thin films and coatings.

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