公开(公告)号：KR100444212B1

公开(公告)日：2004-09-30

申请号：KR1020000000270

申请日：2000-01-05

Applicant: (주) 인텔리마이크론즈 ,  재단법인서울대학교산학협력재단

Inventor： 김용권 ,  김재흥

IPC: B81C1/00

Abstract: PURPOSE: A microactuator and a method for manufacturing the same are provided to manufacture the microactuator in a simple manner and maintain linearity in even case of moving in two-dimension. CONSTITUTION: A method for manufacturing a microactuator includes the steps of anodic-bonding a silicon substrate and a glass substrate by heating, thinning the exposed surface of the silicon substrate by lapping and polishing, applying a photosensitive film to the exposed surface of the silicon substrate and radiating light to the photosensitive film, developing the photosensitive film, etching the silicon substrate by using RIE(Reactive ion etching) for forming positioning controllers, removing polymer and the photosensitive film for completing positioning controller pattern, and wet-etching the glass substrate by making the positioning controllers as a mask and using HF solution.

Abstract translation: 目的：提供一种微致动器及其制造方法，以简单的方式制造微致动器，并且即使在二维移动的情况下也能保持线性。 构成：制造微致动器的方法包括以下步骤：通过加热阳极键合硅基板和玻璃基板，通过研磨和抛光使硅基板的暴露表面变薄，将光敏膜施加到硅基板的暴露表面 并向感光膜照射光，显影感光膜，通过使用用于形成定位控制器的RIE（反应离子蚀刻）来蚀刻硅基板，去除聚合物和感光膜以完成定位控制器图案，并且通过湿蚀刻玻璃基板 将定位控制器作为掩模并使用HF解决方案。

公开(公告)号：KR1020010049190A

公开(公告)日：2001-06-15

申请号：KR1020000000270

申请日：2000-01-05

Applicant: (주) 인텔리마이크론즈 ,  재단법인서울대학교산학협력재단

Inventor： 김용권 ,  김재흥

IPC: B81C1/00

CPC classification number: B81C1/00015 ,  B81B3/0021 ,  B81B2201/03 ,  B81C2201/0101

Abstract: PURPOSE: A microactuator and a method for manufacturing the same are provided to manufacture the microactuator in a simple manner and maintain linearity in even case of moving in two-dimension. CONSTITUTION: A method for manufacturing a microactuator includes the steps of anodic-bonding a silicon substrate and a glass substrate by heating, thinning the exposed surface of the silicon substrate by lapping and polishing, applying a photosensitive film to the exposed surface of the silicon substrate and radiating light to the photosensitive film, developing the photosensitive film, etching the silicon substrate by using RIE(Reactive ion etching) for forming positioning controllers, removing polymer and the photosensitive film for completing positioning controller pattern, and wet-etching the glass substrate by making the positioning controllers as a mask and using HF solution.

Abstract translation: 目的：提供微致动器及其制造方法，以简单的方式制造微致动器，并且即使在二维移动的情况下也保持线性。 构成：微致动器的制造方法包括以下步骤：通过加热使硅衬底和玻璃衬底进行阳极结合，通过研磨和抛光来稀释硅衬底的暴露表面，将光敏膜施加到硅衬底的暴露表面 并且将光照射到感光膜上，使感光膜显影，利用用于形成定位控制器的RIE（反应离子蚀刻），去除聚合物和感光膜来完成定位控制器图案，并通过以下步骤湿法蚀刻玻璃衬底，来蚀刻硅衬底 使定位控制器作为掩模，并使用HF解决方案。