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公开(公告)号：KR100444212B1
公开(公告)日：2004-09-30
申请号：KR1020000000270
申请日：2000-01-05
Applicant: (주) 인텔리마이크론즈 , 재단법인서울대학교산학협력재단
IPC: B81C1/00
Abstract: PURPOSE: A microactuator and a method for manufacturing the same are provided to manufacture the microactuator in a simple manner and maintain linearity in even case of moving in two-dimension. CONSTITUTION: A method for manufacturing a microactuator includes the steps of anodic-bonding a silicon substrate and a glass substrate by heating, thinning the exposed surface of the silicon substrate by lapping and polishing, applying a photosensitive film to the exposed surface of the silicon substrate and radiating light to the photosensitive film, developing the photosensitive film, etching the silicon substrate by using RIE(Reactive ion etching) for forming positioning controllers, removing polymer and the photosensitive film for completing positioning controller pattern, and wet-etching the glass substrate by making the positioning controllers as a mask and using HF solution.
Abstract translation: 目的：提供一种微致动器及其制造方法，以简单的方式制造微致动器，并且即使在二维移动的情况下也能保持线性。 构成：制造微致动器的方法包括以下步骤：通过加热阳极键合硅基板和玻璃基板，通过研磨和抛光使硅基板的暴露表面变薄，将光敏膜施加到硅基板的暴露表面 并向感光膜照射光，显影感光膜，通过使用用于形成定位控制器的RIE（反应离子蚀刻）来蚀刻硅基板，去除聚合物和感光膜以完成定位控制器图案，并且通过湿蚀刻玻璃基板 将定位控制器作为掩模并使用HF解决方案。
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公开(公告)号：KR1020010049190A
公开(公告)日：2001-06-15
申请号：KR1020000000270
申请日：2000-01-05
Applicant: (주) 인텔리마이크론즈 , 재단법인서울대학교산학협력재단
IPC: B81C1/00
CPC classification number: B81C1/00015 , B81B3/0021 , B81B2201/03 , B81C2201/0101
Abstract: PURPOSE: A microactuator and a method for manufacturing the same are provided to manufacture the microactuator in a simple manner and maintain linearity in even case of moving in two-dimension. CONSTITUTION: A method for manufacturing a microactuator includes the steps of anodic-bonding a silicon substrate and a glass substrate by heating, thinning the exposed surface of the silicon substrate by lapping and polishing, applying a photosensitive film to the exposed surface of the silicon substrate and radiating light to the photosensitive film, developing the photosensitive film, etching the silicon substrate by using RIE(Reactive ion etching) for forming positioning controllers, removing polymer and the photosensitive film for completing positioning controller pattern, and wet-etching the glass substrate by making the positioning controllers as a mask and using HF solution.
Abstract translation: 目的：提供微致动器及其制造方法，以简单的方式制造微致动器，并且即使在二维移动的情况下也保持线性。 构成：微致动器的制造方法包括以下步骤：通过加热使硅衬底和玻璃衬底进行阳极结合，通过研磨和抛光来稀释硅衬底的暴露表面，将光敏膜施加到硅衬底的暴露表面 并且将光照射到感光膜上，使感光膜显影，利用用于形成定位控制器的RIE（反应离子蚀刻），去除聚合物和感光膜来完成定位控制器图案，并通过以下步骤湿法蚀刻玻璃衬底，来蚀刻硅衬底 使定位控制器作为掩模，并使用HF解决方案。
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公开(公告)号：KR100695756B1
公开(公告)日：2007-03-15
申请号：KR1019990050723
申请日：1999-11-15
Applicant: 김용권 , (주) 인텔리마이크론즈 , 장현기
Abstract: 본 발명은 자외선 리가(UV LIGA) 공정에 관한 것으로서, 우선 실리콘 기판 상부에 산화 규소로 이루어진 절연막과 알루미늄 등의 희생층을 형성하고, 희생층을 패터닝하여 개구부를 가지는 희생층 패턴을 형성한다. 다음, 도금 기반층을 형성하고 열 처리 공정을 실시하고 그 상부에 버퍼층을 형성한다. 이때, 버퍼층은 이후에 형성되는 감광막 패턴의 응력을 흡수하며 접착력을 향상시키기 위해 TEOS(tetraethoxysilane)막을 사용하는 것이 좋다. 이어, 감광막을 도포한 후, 마스크를 이용한 사진 공정으로 자외선을 이용하여 감광막을 노광하고 현상하여 높은 형상비를 갖는 미세 구조물의 도금 틀인 감광막 패턴을 형성한다. 이때, 감광막은 자외선에 대하여 감광 특성이 우수한 에폭시 기반의 후막 감광제를 사용하여 높은 정밀도의 패턴을 형성한다. 이어, 드러난 버퍼층을 제거하고, 전해 또는 무전해 도금을 이용하여 도금 기반층의 상부에 미세 구조물의 도금층을 형성한다. 이어, 도금 틀인 감광막 패턴을 제거하고, 나머지 버퍼층을 모두 제거하고, 미세 구조물인 도금층으로 가리지 않는 도금 기반층을 제거하고, 도금 기반층을 지지하는 하부의 희생층 패턴을 모두 제거하여 기판으로부터 뜬 미세 구조물을 완성한다.
자외선 리가공정(UV LIGA), 에폭시 기반의 후막 감광제, 자외선, 형상비-
公开(公告)号：KR1020020066486A
公开(公告)日：2002-08-19
申请号：KR1020010006695
申请日：2001-02-12
Applicant: (주) 인텔리마이크론즈 , 김용권
IPC: G01C19/02
CPC classification number: B81B3/0078 , B81B3/0062 , B81B2201/0242 , B81B2203/0136 , B81B2203/04 , G01C19/5755
Abstract: PURPOSE: A gyroscope and method for manufacturing the same is provided to obtain a gyroscope which is capable of operating at an atmospheric pressure and has a large displacement at a high frequency, while avoiding mechanical interference between the operation mode and detection mode. CONSTITUTION: A gyroscope comprises a driving unit, a detection unit and an inertial mass body(23). The driving unit includes a fixed electrode(26); and a displacement electrode(24) opposed to the fixed electrode, and which performs displacement in a first direction. The inertial mass body is connected to the displacement electrode, and displaced in the first direction along with the displacement of the displacement electrode and in a second direction when an angular velocity is applied. The detection unit includes a displacement electrode(22) connected to the inertial mass body, and which is capable of being displaced in the second direction along with the displacement of the inertial mass body; and a fixed electrode(25) opposed to the displacement electrode of the detection unit.
Abstract translation: 目的：提供陀螺仪及其制造方法，以获得能够在大气压下工作并且在高频下具有大的位移的陀螺仪，同时避免操作模式与检测模式之间的机械干扰。 构成：陀螺仪包括驱动单元，检测单元和惯性质量体（23）。 驱动单元包括固定电极（26）; 以及与固定电极相对的位移电极（24），并且在第一方向上进行位移。 惯性质量体连接到位移电极，并且随着位移电极的位移而沿着第一方向移位，并且当施加角速度时沿第二方向移动。 检测单元包括连接到惯性质量体的位移电极（22），并且能够沿惯性体的位移沿第二方向移位; 以及与检测单元的位移电极相对的固定电极（25）。
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公开(公告)号：KR100418624B1
公开(公告)日：2004-02-11
申请号：KR1020010006695
申请日：2001-02-12
Applicant: (주) 인텔리마이크론즈 , 김용권
IPC: G01C19/02
CPC classification number: B81B3/0078 , B81B3/0062 , B81B2201/0242 , B81B2203/0136 , B81B2203/04 , G01C19/5755
Abstract: A gyroscope which comprises: a driving fixed electrode (26) being fixed; a driving displacement electrode (24) being opposite to the driving fixed electrode, and being able to be displaced in a first direction; an inertial mass (23) being connected to the driving displacement electrode (24), being displaced in the first direction according to the first directional displacement of the driving displacement electrode (24), and being displaced in a second direction when an angular rate is applied; a sensing displacement electrode (22) being connected to the inertial mass (23), and being able to be displaced in the second direction according to the second directional displacement of the inertial mass (23); and a sensing fixed electrode (25) being opposite to the sensing displacement electrode and being fixed. The driving displacement electrode (24) is supported by a folded spring (31) movable in the first direction, and the sensing displacement electrode is supported by a folded spring (32) movable in the second direction.
Abstract translation: 一种陀螺仪，包括：固定的驱动固定电极（26） 驱动位移电极（24），其与所述驱动用固定电极相对，且能够在第一方向上位移; 与驱动位移电极（24）连接的惯性质量（23），根据驱动位移电极（24）的第一方向位移沿第一方向位移，并且当角速率为 应用; 感测位移电极（22），连接到惯性质量（23），并且能够根据惯性质量（23）的第二方向位移在第二方向上移位; 以及与感测位移电极相对并固定的感测固定电极（25）。 驱动位移电极（24）由在第一方向上可移动的折叠弹簧（31）支撑，并且感测位移电极由可沿第二方向移动的折叠弹簧（32）支撑。
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Patent Agency Ranking
公开(公告)号：KR100492772B1
公开(公告)日：2005-06-07
申请号：KR1020030010367
申请日：2003-02-19
Applicant: (주) 인텔리마이크론즈 , 김용권
IPC: G02B26/10
Abstract: 고정 프레임; 고정 프레임과 소정 간격 이격되어 내측에 배치되어 있으며, 제1 회전축을 중심으로 소정 각도 회전하는 회전 프레임; 회전 프레임과 소정 간격 이격되어 내측에 배치되어 있으며, 제1 회전축과 직교하는 제2 회전축을 중심으로 소정 각도 회전하는 미러; 회전 프레임 및 미러 아래에 배치되어 있는 영구 자석; 회전 프레임 위에 형성되어 있으며, 회전 프레임에 제1 회전력을 발생시키는 회전 프레임 구동 도전선; 회전 프레임 및 미러 위에 형성되어 있으며, 미러에 제2 회전력을 발생시키는 미러 구동 도전선; 회전 프레임에 형성되어 있는 미러 구동 도전선과 대응하는 위치에 미러 구동 도전선과 절연되어 형성되어 있는 보상 도전선; 고정 프레임과 회전 프레임을 연결하고 있는 회전 프레임 스프링; 회전 프레임과 미러를 연결하고 있는 미러 스프링을 포함하는 2 자유도 스캐닝 미러 및 그 제조 방법.
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公开(公告)号：KR1020010046815A
公开(公告)日：2001-06-15
申请号：KR1019990050723
申请日：1999-11-15
Applicant: 김용권 , (주) 인텔리마이크론즈 , 장현기
CPC classification number: G03F1/22 , G03F1/32 , G03F7/2039 , G03F7/707 , H01L21/0337
Abstract: PURPOSE: A LIGA process for forming an overhanging structure is provided which minimizes the manufacturing unit cost of the LIGA process. CONSTITUTION: The process comprises steps of: (i) forming an insulating film on top of a base plate; (ii) forming a sacrificing layer on the top of the insulating film; (iii) patterning the sacrificing layer to form a sacrificing layer pattern have an opening part; (iv) forming a plating basis layer on the top of the base plate; (v) forming a buffer layer on the top of the plating basis layer; (vi) coating the top of the buffer layer with a photosensitive film; (vii) forming a photosensitive film pattern of a plating frame of an overhanging structure through a photographing process of the photosensitive film by using a mask; (viii) etching the buffer layer uncovered by the photosensitive film pattern to expose the plating basis layer; (ix) forming a plating layer of overhanging structure on the top of the plating basis layer; (x) eliminating the photosensitive pattern; (xi) completely eliminating the buffer layer; (xii) eliminating the plating basis layer uncovered by the plating layer; and (xiii) completely eliminating the sacrificing layer pattern in the lower part of the plating basis layer.
Abstract translation: 目的：提供用于形成悬垂结构的LIGA工艺，其使LIGA工艺的制造单元成本最小化。 构成：该方法包括以下步骤：（i）在基板的顶部形成绝缘膜; （ii）在绝缘膜的顶部上形成牺牲层; （iii）图案化牺牲层以形成具有开口部分的牺牲层图案; （iv）在基板的顶部形成电镀基层; （v）在电镀基层的顶部上形成缓冲层; （vi）用感光膜涂覆缓冲层的顶部; （vii）通过使用掩模通过感光膜的拍摄过程形成悬垂结构的电镀框架的感光膜图案; （viii）蚀刻由感光膜图案未覆盖的缓冲层以暴露电镀基层; （ix）在电镀基层的顶部上形成悬垂结构的镀层; （x）消除感光图案; （xi）完全消除缓冲层; （xii）消除由镀层未覆盖的电镀基层; 和（xiii）完全消除电镀基层的下部的牺牲层图案。
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公开(公告)号：KR1020040074477A
公开(公告)日：2004-08-25
申请号：KR1020030010367
申请日：2003-02-19
Applicant: (주) 인텔리마이크론즈 , 김용권
IPC: G02B26/10
Abstract: PURPOSE: A scanning mirror with two degree of freedom and its fabrication method are provided which has an electronic force driving scheme with low interference between two rotation axes. CONSTITUTION: The scanning mirror with two degree of freedom includes a fixed frame(10), and a rotating frame(20) arranged by being separated from the fixed frame and rotating around the first rotation axis. A mirror(30) is arranged by being separated from the rotating frame, and rotates around the second axis orthogonal to the first rotation axis. A permanent magnet(40) is arranged below the rotating frame and the mirror. A conductive line driving a rotating frame(50) is formed on the rotating frame, and generates the first rotation force to the rotating frame. A conductive line(60) driving mirror is formed on the rotating frame and the mirror, and generates the second rotation force to the mirror. A compensation conductive line is formed by being isolated from the conductive line(60) on a position corresponding to the conductive line(60). A rotating frame spring(80) connects the fixed frame and the rotating frame. And a mirror spring(90) connects the rotating frame and the mirror.
Abstract translation: 目的：提供具有两个自由度的扫描镜及其制造方法，其具有在两个旋转轴之间具有低干涉的电子力驱动方案。 构成：具有两个自由度的扫描镜包括固定框架（10）和通过与固定框架分离并围绕第一旋转轴线旋转而布置的旋转框架（20）。 反射镜（30）通过与旋转框架分离设置，并且绕与第一旋转轴线正交的第二轴线旋转。 永磁体（40）布置在旋转框架和反射镜下方。 驱动旋转框架（50）的导线形成在旋转框架上，并向旋转框架产生第一旋转力。 在旋转框架和反射镜上形成导线（60）驱动反射镜，并向反射镜产生第二旋转力。 补偿导线通过在对应于导线（60）的位置与导线（60）隔离而形成。 旋转框架弹簧（80）连接固定框架和旋转框架。 并且镜子弹簧（90）连接旋转框架和镜子。
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公开(公告)号：KR1020070003463A
公开(公告)日：2007-01-05
申请号：KR1020050059458
申请日：2005-07-02
Applicant: 재단법인서울대학교산학협력재단
IPC: C07H19/10
Abstract: Peptide nucleic acid(PNA) monomers having a photolabile protecting group are provided to improve preparation speed and economical efficiency of PNA through photolithograph method. The peptide nucleic acid monomers represented by the formulas(I) to (IV) are provided, wherein P is the photolabile protecting group; An is 4-methoxybenzoyl group; iBu is isobutyryl group; and the photolabile protecting group is selected from 2-nitrobenzyl derivative, 2-methyl-2-(2-nitrophenyl)propyloxycarbonyl derivative, benzoin derivative and ortho-nitrobenzyloxy derivative or further includes the compound represented by the formula(V). A method for preparing the peptide nucleic acids represented by the formula(XV) comprises the steps of: (i) reacting the compound represented by the formula(XIII) with the photolabile protecting group so as to prepare the compound represented by the formula(XIV); and (ii) independently reacting the compound represented by the formula(XIV) with 1-(carboxymethyl)-4-N-(4-methoxybenzoyl)cytosine, 9-(carboxymethyl)-2-N-(isobutyryl) guanine, 1-N-carboxymethylthymine and 9-(carboxymethyl)-6-N-(4-methoxybenzoyl)adenine.
Abstract translation: 提供具有光不稳定保护基的肽核酸（PNA）单体，通过光刻法提高PNA的制备速度和经济性。 提供由式（I）至（IV）表示的肽核酸单体，其中P是光不稳定保护基; An是4-甲氧基苯甲酰基; iBu是异丁酰基; 并且光不稳定保护基选自2-硝基苄基衍生物，2-甲基-2-（2-硝基苯基）丙氧基羰基衍生物，苯偶姻衍生物和邻硝基苄氧基衍生物，或还包括由式（V）表示的化合物。 制备由式（ⅩⅤ）表示的肽核酸的方法包括以下步骤：（ⅰ）使由式（ⅩⅢ）代表的化合物与光不稳定保护基反应，以制备由式（ⅩⅣ）表示的化合物 ）; 和（ii）使式（XIV）表示的化合物与1-（羧甲基）-4-N-（4-甲氧基苯甲酰基）胞嘧啶，9-（羧甲基）-2-N-（异丁酰基）鸟嘌呤， N-羧甲基胸腺嘧啶和9-（羧甲基）-6-N-（4-甲氧基苯甲酰基）腺嘌呤。
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公开(公告)号：KR101413067B1
公开(公告)日：2014-07-01
申请号：KR1020080007191
申请日：2008-01-23
Applicant: 삼성전자주식회사 , 재단법인서울대학교산학협력재단
Abstract: 어레이 타입의 가변 캐패시터 장치가 개시된다. 라인부는 접지라인과, 하부전극으로 동작하는 신호라인을 포함하며, 복수의 플레이트는 어레이 타입으로 구비되어 상부전극으로 동작하며, 라인부와 연동하여 캐패시턴스를 발생하며, 서로 다른 강도(stiffness)를 갖는다.
가변 캐패시터, RF 시스템, stiffness, 강도
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