公开(公告)号：KR1020020034004A

公开(公告)日：2002-05-08

申请号：KR1020000064627

申请日：2000-11-01

Applicant: 대한민국(기술표준원)

Inventor： 신성호 ,  신재혁 ,  박광자 ,  차인석

IPC: C23C14/24

CPC classification number: C23C14/0641 ,  C23C14/24

Abstract: PURPOSE: A method for manufacturing a decorative color stainless steel sheet by nonpolluting dry vacuum deposition is provided which forms a ZrN ceramic thin film on the stainless steel sheet using DC magnetron sputtering. CONSTITUTION: The method for manufacturing a decorative color stainless steel sheet by nonpolluting dry vacuum deposition is characterized in that the method comprises a process in which far more various colors are revealed, factors causing pollution are removed, and a color steel sheet having superior cohesiveness and surface roughness is manufactured when depositing a ZrN ceramic thin film on the stainless steel sheet by varieties of physical and chemical depositions compared with an ordinary wet chemical coating, wherein the method comprises the process of DC sputtering, cathode arc sputtering, ion beam sputtering, electron beam deposition, hollow cathode discharging, or ion plating so as to manufacture the ZrN thin film.

Abstract translation: 目的：提供一种通过非污染干真空沉积制造装饰彩色不锈钢板的方法，其使用DC磁控溅射在不锈钢板上形成ZrN陶瓷薄膜。 构成：通过非污染干真空沉积制造装饰彩色不锈钢板的方法的特征在于该方法包括一种方法，其中显现出更多种不同的颜色，除去造成污染的因素，并且具有优异的内聚力和 与普通湿化学涂层相比，通过各种物理和化学沉积在不锈钢板上沉积ZrN陶瓷薄膜时制造了表面粗糙度，其中该方法包括DC溅射，阴极电弧溅射，离子束溅射，电子 光束沉积，中空阴极放电或离子电镀，以制造ZrN薄膜。

公开(公告)号：KR1020010028341A

公开(公告)日：2001-04-06

申请号：KR1019990040523

申请日：1999-09-21

Applicant: 대한민국(기술표준원)

Inventor： 신성호 ,  신재혁 ,  박광자 ,  이재형 ,  백태일

IPC: G02F1/1343

Abstract: PURPOSE: A method of making transparent conductive thin film is provided to reduce a target fabrication cost and to be coated on a plastic substrate, by making the transparent conductive thin film at a lower temperature below 200 deg.C using a powder target. CONSTITUTION: A direct current magnetron sputtering equipment is used in order to fabricate a transparent conductive indium tin oxide(ITO) film using a powder target. ITO powder(90wt% In2O3+10wt% SnO2) is inserted in a circular copper container of a two-inch size and then pressure is forced to the powder. A sola lime glass and a PET film are used as a substrate. When fabricating a thin film, the PET film of the substrate is not heated and a temperature is maintained at a room temperature(within 50 deg.C).

Abstract translation: 目的：提供一种制造透明导电薄膜的方法，通过使用粉末靶将透明导电薄膜在低于200℃的较低温度下降低目标制造成本并涂覆在塑料基板上。 构成：使用直流磁控溅射设备来制造使用粉末靶的透明导电铟锡氧化物（ITO）膜。 将ITO粉末（90重量％In 2 O 3 + 10重量％SnO 2）插入2英寸尺寸的圆形铜容器中，然后将压力强制至粉末。 硅藻土玻璃和PET膜用作基材。 当制造薄膜时，基板的PET膜不被加热并且将温度保持在室温（50℃）内。