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公开(公告)号：KR1020160092526A
公开(公告)日：2016-08-05
申请号：KR1020140193585
申请日：2014-12-30
Applicant: 도레이첨단소재 주식회사
Abstract: 본발명은투명기재필름층의일면에하드코팅층, 무기층및 무기산화물층이순차적층된투명배리어필름에관한것이다. 본발명은하드코팅층에의해필름의투과율을향상시키고, 무기층에의해층간밀착력을개선하고, 무기산화물층에의해가스배리어성을향상시킬수 있도록층 구조를최적화함으로써, 투명성과우수한층간밀착력을유지하면서낮은투습율뿐만아니라가시광선투과율, 헤이즈및 황색도(b*) 등의광특성이우수한투명배리어필름을제공할수 있다.
Abstract translation: 本发明涉及具有透明基膜层的透明阻挡膜，其中硬涂层，无机层和无机氧化物层依次层叠在透明基膜层的一个表面上。 本发明可以提供一种保持透明性和优异的层间粘合性并且具有优异的光学性能如透湿性，视觉透光率，雾度和黄度（b *）的透明阻挡膜，因为层结构被优化以增强膜的透明度 通过硬涂层，无机层的层间粘合和无机氧化物层的阻气性。
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公开(公告)号：KR1020140078350A
公开(公告)日：2014-06-25
申请号：KR1020120147622
申请日：2012-12-17
Applicant: 도레이첨단소재 주식회사
Abstract: The present invention relates to a transparent conductive film having improved adhesive strength which secures the initial and long-term reliability of adhesive strength by a vacuum deposition method of depositing Si on the interface of a transparent conductive film and a transparent film and improves transparency and transmission, and a manufacturing method thereof. For this, the transparent conductive film having improved adhesive strength according to the present invention includes a transparent substrate, a first dielectric layer which is an SiOx layer which is formed on the transparent substrate (x is 1
Abstract translation: 本发明涉及一种具有改进的粘合强度的透明导电膜，其通过在透明导电膜和透明膜的界面上沉积Si的真空沉积方法来确保粘合强度的初始和长期可靠性，并提高透明度和透射率 ，及其制造方法。 为此，根据本发明的具有改善的粘合强度的透明导电膜包括透明基板，形成在透明基板上的SiO x层的第一介电层（x为1
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公开(公告)号：KR101864878B1
公开(公告)日：2018-07-16
申请号：KR1020140193585
申请日：2014-12-30
Applicant: 도레이첨단소재 주식회사
Abstract: 본발명은투명기재필름층의일면에하드코팅층, 무기층및 무기산화물층이순차적층된투명배리어필름에관한것이다. 본발명은하드코팅층에의해필름의투과율을향상시키고, 무기층에의해층간밀착력을개선하고, 무기산화물층에의해가스배리어성을향상시킬수 있도록층 구조를최적화함으로써, 투명성과우수한층간밀착력을유지하면서낮은투습율뿐만아니라가시광선투과율, 헤이즈및 황색도(b*) 등의광특성이우수한투명배리어필름을제공할수 있다.
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