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公开(公告)号：KR101916474B1
公开(公告)日：2018-11-07
申请号：KR1020130005789
申请日：2013-01-18
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302 , H01L21/02
CPC classification number: B65B3/04 , H01L21/67017
Abstract: 본발명은기판처리장치에있어서, 처리액교환시의처리액소비량을줄이는방법을제공한다. 처리액을저류하는저류탱크와, 상기저류탱크에그 양단이접속된순환라인과, 상기순환라인에설치된순환펌프와, 상기순환라인에분기관로를통하여접속된처리액공급노즐을구비한기판처리장치의처리액을교환하는처리액교환방법은, 상기저류탱크내의처리액을배액하는처리액배액공정과, 상기순환라인에대한상기분기관로의접속영역보다도상류측인제1 위치에서상기순환라인에퍼지가스를공급하고, 상기순환라인내에잔존하는처리액을, 상기순환라인에대한상기분기관로의접속영역보다도하류측이면서상기저류탱크보다도상류측인제2 위치에서상기순환라인에접속된드레인부로부터배출하는액배출공정과, 상기저류탱크내에처리액을공급하는처리액공급공정을포함한다.
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公开(公告)号：KR1020130097650A
公开(公告)日：2013-09-03
申请号：KR1020130005789
申请日：2013-01-18
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302 , H01L21/02
CPC classification number: B65B3/04 , H01L21/67017
Abstract: PURPOSE: A processing liquid exchanging method and a substrate processing apparatus are provided to reduce the consumption of processing liquids for cleaning a processing liquid circulating system by forcedly discharging the remaining processing liquids from a circulation line through the supply of a purge gas. CONSTITUTION: A processing liquid circulating system (10) includes a storage tank (11) which stores processing liquids and a circulation line (12) which is connected to the storage tank. A processing block (20) includes a plurality of processing units (21) with the same structures. A processing liquid supply system (40) includes a supply tank (41) to supply the processing liquids to the storage tank of the processing liquid circulating system. A DIW supply device (50) supplies DIW to the processing liquid circulating system and includes a DIW supply source (51), a DIW supply line (52), and a valve (53) which is installed on the DIW supply line.
Abstract translation: 目的：提供一种处理液体交换方法和基板处理装置，以通过供给吹扫气体强制排出来自循环管线的剩余处理液体来减少用于清洗处理液循环系统的处理液的消耗。 构成：处理液循环系统（10）包括储存处理液体的储罐（11）和与储罐连接的循环管线（12）。 处理块（20）包括具有相同结构的多个处理单元（21）。 处理液供应系统（40）包括供应罐（41），用于将处理液体供应到处理液循环系统的储罐。 DIW供应装置（50）向处理液循环系统供应DIW，并且包括DIW供应源（51），DIW供应管线（52）和安装在DIW供应管线上的阀门（53）。
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