公开(公告)号：KR1020110132235A

公开(公告)日：2011-12-07

申请号：KR1020110047982

申请日：2011-05-20

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 햐쿠타케히로노부 ,  시모무라신이치로

IPC: H01L21/306

CPC classification number: H01L21/67109 ,  H01L21/67086

Abstract: PURPOSE: A substrate processing apparatus and method, and a recording medium are provided to uniformly process a plurality of substrates with a medicinal fluid by uniformly maintaining the medicinal fluid in a process bath with uniform temperature. CONSTITUTION: A process bath(10) has a pair of sidewalls which is faced each other. The process bath undercurrents a medicinal fluid and processes a plurality of substrates with the medicinal fluid. A board support apparatus(20) comprises a maintenance unit which sets a plurality of substrates stand up and maintains. The board support apparatus dips the substrate which is maintained in the maintenance unit in the medicinal fluid. A heater(80) which is installed in the process bath heats the medicinal fluid. The heater comprises a first heater which is installed in one side of a sidewall and a second heater which is installed in the other side of the sidewall.

Abstract translation: 目的：提供一种基板处理装置和方法以及记录介质，通过将药液均匀地保持在均匀温度的工艺槽中，均匀地处理多个基板与药液。 构成：工艺槽（10）具有彼此面对的一对侧壁。 处理液使医药流体下流，并且用药液处理多个基板。 板支撑装置（20）包括设置多个基板的维护单元，并维持。 板支撑装置将保持在维护单元中的基板浸入药液中。 安装在处理槽中的加热器（80）加热药液。 加热器包括安装在侧壁一侧的第一加热器和安装在侧壁另一侧的第二加热器。

公开(公告)号：KR101545373B1

公开(公告)日：2015-08-18

申请号：KR1020110047982

申请日：2011-05-20

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 햐쿠타케히로노부 ,  시모무라신이치로

IPC: H01L21/306

CPC classification number: H01L21/67109 ,  H01L21/67086

Abstract: 본발명은약액처리시에처리조안의약액의온도를균일하게하여, 복수의기판을균일하게약액처리할수 있는기판처리장치를제공하는것을목적으로한다. 본발명에따른기판처리장치(1)는, 서로대향하는한 쌍의측벽(10a, 10b)을가지며, 약액을저류하여복수의기판을약액처리하는처리조(10)와, 복수의기판을기립시켜유지하는유지부(21)와, 유지부(21)에연결되고, 처리조(10) 안에반입되었을때에, 유지부(21)에유지된기판과처리조(10)의한쪽측벽(10a) 사이에개재되는배부(22)를가지며, 유지부(21)에유지된기판을약액에침지시키는기판유지기구(20)를구비한다. 처리조(10)에, 저류된약액을가열하는가열기(80)가설치된다. 이가열기(80)는한쪽측벽(10a)에설치된제1 가열기(81)와, 다른쪽측벽(10b)에설치된제2 가열기(82)를갖고, 제1 가열기(81)의출력과제2 가열기(82)의출력은개별적으로제어된다.

公开(公告)号：KR101916474B1

公开(公告)日：2018-11-07

申请号：KR1020130005789

申请日：2013-01-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가사하라마사토시 ,  시모무라신이치로

IPC: H01L21/302 ,  H01L21/02

CPC classification number: B65B3/04 ,  H01L21/67017

Abstract: 본발명은기판처리장치에있어서, 처리액교환시의처리액소비량을줄이는방법을제공한다. 처리액을저류하는저류탱크와, 상기저류탱크에그 양단이접속된순환라인과, 상기순환라인에설치된순환펌프와, 상기순환라인에분기관로를통하여접속된처리액공급노즐을구비한기판처리장치의처리액을교환하는처리액교환방법은, 상기저류탱크내의처리액을배액하는처리액배액공정과, 상기순환라인에대한상기분기관로의접속영역보다도상류측인제1 위치에서상기순환라인에퍼지가스를공급하고, 상기순환라인내에잔존하는처리액을, 상기순환라인에대한상기분기관로의접속영역보다도하류측이면서상기저류탱크보다도상류측인제2 위치에서상기순환라인에접속된드레인부로부터배출하는액배출공정과, 상기저류탱크내에처리액을공급하는처리액공급공정을포함한다.

公开(公告)号：KR1020150125586A

公开(公告)日：2015-11-09

申请号：KR1020150057995

申请日：2015-04-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이도야스유키 ,  신도나오키 ,  오리이다케히코 ,  에가시라게이스케 ,  하치야요스케 ,  오오이시고타로 ,  가와노히사시 ,  시모무라신이치로

IPC: H01L21/67

CPC classification number: H01L21/67051 ,  B05B12/14 ,  B05C11/115 ,  H01L21/306 ,  H01L21/31 ,  H01L21/67017 ,  H01L21/6715

Abstract: 노즐내에서의가수분해열화에따른실릴화액의폐기량을저감한다. 노즐(43) 내의실릴화액유로(431)에차단유체를공급함으로써, 실릴화액유로내에있는실릴화액보다토출구(434)에가까운측에존재하는차단유체에의해실릴화액유로내에있는실릴화액을토출구의외부의분위기로부터차단한다.

Abstract translation: 由于喷嘴中的水解劣化引起的消耗的甲硅烷基化液体的量减少。 向喷嘴（43）中的甲硅烷基化液体流路（431）供给封闭流体，以通过存在于更靠近排出口的一侧的阻塞流体从排出孔的外部气氛中阻断甲硅烷醇化液体流路中的甲硅烷基化液体 （434）比硅烷化液体流路中的甲硅烷基化液体。

公开(公告)号：KR1020130097650A

公开(公告)日：2013-09-03

申请号：KR1020130005789

申请日：2013-01-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가사하라마사토시 ,  시모무라신이치로

IPC: H01L21/302 ,  H01L21/02

CPC classification number: B65B3/04 ,  H01L21/67017

Abstract: PURPOSE: A processing liquid exchanging method and a substrate processing apparatus are provided to reduce the consumption of processing liquids for cleaning a processing liquid circulating system by forcedly discharging the remaining processing liquids from a circulation line through the supply of a purge gas. CONSTITUTION: A processing liquid circulating system (10) includes a storage tank (11) which stores processing liquids and a circulation line (12) which is connected to the storage tank. A processing block (20) includes a plurality of processing units (21) with the same structures. A processing liquid supply system (40) includes a supply tank (41) to supply the processing liquids to the storage tank of the processing liquid circulating system. A DIW supply device (50) supplies DIW to the processing liquid circulating system and includes a DIW supply source (51), a DIW supply line (52), and a valve (53) which is installed on the DIW supply line.

Abstract translation: 目的：提供一种处理液体交换方法和基板处理装置，以通过供给吹扫气体强制排出来自循环管线的剩余处理液体来减少用于清洗处理液循环系统的处理液的消耗。 构成：处理液循环系统（10）包括储存处理液体的储罐（11）和与储罐连接的循环管线（12）。 处理块（20）包括具有相同结构的多个处理单元（21）。 处理液供应系统（40）包括供应罐（41），用于将处理液体供应到处理液循环系统的储罐。 DIW供应装置（50）向处理液循环系统供应DIW，并且包括DIW供应源（51），DIW供应管线（52）和安装在DIW供应管线上的阀门（53）。