公开(公告)号：KR1020130110005A

公开(公告)日：2013-10-08

申请号：KR1020130013773

申请日：2013-02-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가와사키데츠 ,  가네코미야코 ,  미츠오카가즈유키

IPC: H01L21/02 ,  H01L21/677

CPC classification number: H01L21/67017 ,  H01L21/67028 ,  H01L21/67742

Abstract: PURPOSE: A substrate processing system, a substrate processing method, and a storage medium suppress the absorption of moisture for a drying prevention liquid by supplying low-humidity gas with less moisture contents to a substrate when the substrate is transferred. CONSTITUTION: A liquid processing device processes a liquid by supplying a processing solution to a substrate (W). The liquid processing device supplies a drying prevention liquid to the surface of the substrate. A supercritical processing device (4) substitutes a high-pressure liquid for the liquid on the surface of the substrate and removes the liquid within a container (41) which receives the substrate. A substrate transfer device transfers the substrate from the liquid processing device to the supercritical processing device along a transfer path. A low-humidity gas supply unit (23) supplies low-humidity gas around the substrate transferred from the transfer path. [Reference numerals] (1) Washing processing system; (2) Wafer returning equipment; (3) Washing device; (4) Supercritical processing device; (5) Control unit

Abstract translation: 目的：基板处理系统，基板处理方法和存储介质通过在转印基板时向基板供给具有较少水分含量的低湿度气体来抑制对防干燥液体的吸湿。 构成：液体处理装置通过向基板（W）提供处理溶液来处理液体。 液体处理装置向基板的表面供给防干燥液。 超临界处理装置（4）将高压液体代替在基板表面上的液体，并将容纳基板的容器（41）内的液体除去。 基板转印装置沿着传送路径将基板从液体处理装置传送到超临界处理装置。 低湿度气体供给单元（23）在从传送路径传送的基板周围供给低湿气体。 （附图标记）（1）洗涤处理系统; （2）晶圆返回设备; （3）清洗装置; （4）超临界处理装置; （5）控制单元

公开(公告)号：KR101841789B1

公开(公告)日：2018-03-23

申请号：KR1020130013773

申请日：2013-02-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가와사키데츠 ,  가네코미야코 ,  미츠오카가즈유키

IPC: H01L21/02 ,  H01L21/677

Abstract: 본발명은고압유체를이용하여, 기판의표면을덮는건조방지용액체가제거되는고압유체처리장치의용기내에의수분유입을저감시킬수 있는기판처리시스템등을제공하는것을과제로한다. 기판처리시스템(1)에있어서, 액처리장치(3)는표면에패턴이형성된기판(W)에처리액을공급함으로써액 처리를행하고, 이어서그 기판(W) 표면에건조방지용액체를공급한다. 고압유체처리장치(4)는기판(W)을수용하는용기(41) 내에서상기기판(W) 표면의액체를고압유체와치환하여제거한다. 기판반송기구(2)는표면이건조방지용액체로덮인기판(W)을, 액처리장치(3)로부터고압유체처리장치(4)로반송로를따라반송하고, 저습기체공급부(23)는건조방지용액체에대한수분의흡수를억제하기위해서, 반송로에서반송되는기판(W)의주위에저습기체를공급한다.