公开(公告)号：KR1020090023182A

公开(公告)日：2009-03-04

申请号：KR1020080083732

申请日：2008-08-27

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 하라요시따까 ,  가쯔끼신고

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/00

CPC classification number: H01L21/67225 ,  G03F7/70525 ,  G03F7/7075 ,  G03F7/70808 ,  H01L21/6715 ,  H01L21/67745 ,  Y10S414/14 ,  B05C11/10

Abstract: A coating and developing apparatus, the coating and developing method, and the storage medium are provided to suppress the transfer speed of the transfer unit ant to prevent the degradation of the transfer precision of the substrate. The coating and developer(1) comprise the carrier block(S1). The carrier block comprises the loading table(11) and transfer arm(12). The encapsulated type carrier(C) is loaded on the loading table. The processing block(S2) is adjacent to the carrier block. The transfer arm takes out the wafer(W) from the carrier of the encapsulated type. Simultaneously, the wafer(W) is transferred to the processing block. The processed wafer (W) is received from the processing block and then the transfer arm returns to the carrier.

Abstract translation: 提供涂覆和显影装置，涂覆和显影方法以及存储介质以抑制转印单元的转印速度，以防止基板的转印精度降低。 涂层和显影剂（1）包括载体块（S1）。 承载块包括装载台（11）和传送臂（12）。 封装式载体（C）装载在装载台上。 处理块（S2）与载体块相邻。 转移臂从封装型载体上取出晶片（W）。 同时，将晶片（W）转移到处理块。 处理后的晶片（W）从处理块接收，然后传送臂返回到载体。