公开(公告)号：KR1020110060789A

公开(公告)日：2011-06-08

申请号：KR1020100090504

申请日：2010-09-15

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 햐쿠타케히로노부 ,  다카시마도시히데

IPC: H01L21/302

CPC classification number: H01L21/67057 ,  H01L21/67253

Abstract: PURPOSE: A substrate processing device, a substrate processing method, and a storage medium are provided to suppress the density decrease of sulfuric acid due to water from hydrogen peroxide by firstly evaporating water among sulfuric acid, hydrogen peroxide, and water comprising mixture. CONSTITUTION: A substrate(W) is immersed in the mixture of sulfuric acid and hydrogen peroxide in a process bath(21). A circulating path(410) circulates mixture in the process bath. A heating unit heats the mixture. A sulfuric acid supply unit(430) supplies sulfuric acid to the mixture. A hydrogen peroxide supply unit(420) supplies hydrogen peroxide to the mixture.

Abstract translation: 目的：提供一种基板处理装置，基板处理方法和存储介质，以通过首先在硫酸，过氧化氢和包含混合物的水中蒸发水来抑制由过氧化氢的水引起的硫酸浓度的降低。 构成：将衬底（W）浸入处理浴（21）中的硫酸和过氧化氢的混合物中。 循环路径（410）将混合物循环在处理浴中。 加热单元加热混合物。 硫酸供应单元（430）向混合物供应硫酸。 过氧化氢供应单元（420）向混合物中提供过氧化氢。