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公开(公告)号:KR101522695B1
公开(公告)日:2015-05-22
申请号:KR1020100054713
申请日:2010-06-10
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
Abstract: 횡방향으로일렬로배치된기판보지부를구비한복수의액처리부와, 상기액처리부에대하여공용화되고액처리부의배열방향을따라설치된복수의처리액노즐을구비한액처리장치에서, 상기처리액노즐로부터기판으로의처리액의낙하를억제하여수율의저하를방지할수 있는액처리장치를제공하는것이다. 처리액노즐의하방에서상기처리액노즐의배열방향을따라광축을형성하는광 센서와, 각처리액노즐의미사용시에상기광 센서에의해상기광축이차단된상태를검출했을때에처리액의액 맺힘또는적하가발생했다고판정하고판정신호를출력하는수단과, 상기판정신호의출력에기초하여대처동작을행하는대처수단을구비하도록장치를구성한다. 각처리액노즐이횡방향으로배열된각 액처리부상을이동함에있어서, 기판또는기판보지부에처리액이적하하여정상적인처리가방해받거나파티클이되는것이억제된다.
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公开(公告)号:KR1020100137363A
公开(公告)日:2010-12-30
申请号:KR1020100054713
申请日:2010-06-10
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/0274 , G03F7/2041 , G03F7/70341
Abstract: PURPOSE: A liquid processing apparatus, a liquid processing method, and a storage media are provided to protect a liquid processing process by prevent processing liquid from being dropped. CONSTITUTION: A nozzle(40) is arranged at the lower side of a nozzle head(34). The nozzle head is the tip end of an arm(33). A plurality of liquid processing parts is serially arranged to a transversal direction. A nozzle bath is installed to hold the nozzle. A supporting unit is arranged at the upper region of the liquid processing parts and between the nozzle baths. A driving unit moves the supporting unit.
Abstract translation: 目的:提供液体处理装置,液体处理方法和存储介质以通过防止处理液体掉落来保护液体处理过程。 构成:喷嘴(40)布置在喷嘴头(34)的下侧。 喷嘴头是臂(33)的末端。 多个液体处理部件沿横向连续地排列。 安装喷嘴槽以固定喷嘴。 支撑单元布置在液体处理部分的上部区域和喷嘴槽之间。 驱动单元移动支撑单元。
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