公开(公告)号：KR1020090128331A

公开(公告)日：2009-12-15

申请号：KR1020090050732

申请日：2009-06-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이께다후미히꼬 ,  마끼데쯔야

IPC: H01L21/324

CPC classification number: H01L21/67109 ,  H01L21/67017 ,  H01L21/67706

Abstract: PURPOSE: A substrate heating device is provided to prevent generation of coating non-uniformity in a coating film by uniformizing a resist drying rate after forming the coating film by heating a substrate. CONSTITUTION: A stage(80) floats a processed substrate by gas injection. A heating unit heats the processed substrate. A plurality of gas injection nozzles(88) is formed in a slit shape along a substrate width direction. The gas injection nozzles are installed in parallel along a substrate transfer direction, and inject gas upwardly. A gas inlet(89) inhales the gas sprayed from the gas injection nozzle. A partition member(93) longitudinally partitions the gas injection nozzle of the slit shape.

Abstract translation: 目的：提供一种基板加热装置，用于通过加热基板使成膜后的抗蚀剂干燥速度均匀化来防止涂膜的涂布不均匀。 构成：阶段（80）通过注气漂浮处理的基板。 加热单元加热经处理的基板。 多个气体喷射喷嘴（88）沿着基板宽度方向形成为狭缝状。 气体注入喷嘴沿着基板传送方向平行安装，并向上注入气体。 气体入口（89）吸入从气体喷射喷嘴喷射的气体。 分隔构件（93）纵向地划分狭缝形状的气体注入喷嘴。

公开(公告)号：KR101758392B1

公开(公告)日：2017-07-14

申请号：KR1020120017290

申请日：2012-02-21

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  마끼데쯔야 ,  다나까시게끼

IPC: G03F7/20

Abstract: 본발명의과제는기판면 내에서미세하게설정한에어리어마다노광량을조정하고, 현상처리후의레지스트잔여막의균일성을향상시켜, 배선패턴의선 폭및 피치의편차를억제하는것이다. 기판반송로(2)의상방에있어서, 기판반송방향에교차하는방향으로배열된복수의발광소자(L)를갖는광원(4)과, 상기광원을구성하는복수의발광소자중, 1개또는복수의발광소자를발광제어단위로서선택적으로발광구동가능한발광구동부(9)와, 상기피처리기판이상기광원의하방으로반송되지않는상태에서, 상기피처리기판에대한상기광원으로부터의광 조사위치를따라기판폭 방향으로진퇴가능하게설치되고, 상기광원에의해조사된광의조도를검출하는조도검출수단(31)과, 상기조도검출수단이검출한조도와상기발광소자의구동전류값의관계를상관테이블(T2)로서기억하는동시에, 상기발광구동부에의한상기발광소자의구동을제어하는제어부(40)를구비한다.

公开(公告)号：KR1020120096430A

公开(公告)日：2012-08-30

申请号：KR1020120017290

申请日：2012-02-21

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  마끼데쯔야 ,  다나까시게끼

IPC: G03F7/20

CPC classification number: G03F7/70791 ,  G03F7/70008 ,  G03F7/70391 ,  G03F7/70425 ,  G03F7/7085

Abstract: PURPOSE: An exposure device for small sized areas is provided to suppress the deviation of line widths and pitches of wiring patterns and to improve the uniformity of a resist residual film after development. CONSTITUTION: A substrate transferring unit(20) forms a substrate transferring path(2) and transfers a substrate along the substrate transferring path. A light emission driving part(9) selectively implements light emitting processes based on light emitting elements as light emission controlling units. An illuminance detecting unit detects the illuminance of light from a light source. A controlling part(40) controls the operation of the light emitting elements based on the light emitting diode part.

Abstract translation: 目的：提供小尺寸区域的曝光装置，以抑制布线图案的线宽和间距的偏差，并提高显影后的抗蚀剂残留膜的均匀性。 构成：衬底传送单元（20）形成衬底传送路径（2）并沿着衬底传送路径传送衬底。 发光驱动部（9）选择性地实施基于发光元件的发光处理作为发光控制单元。 照度检测单元检测来自光源的光的照度。 控制部分（40）基于发光二极管部分控制发光元件的操作。