公开(公告)号：KR101672559B1

公开(公告)日：2016-11-03

申请号：KR1020110052622

申请日：2011-06-01

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오오따요시하루 ,  모리야마시게루 ,  마쯔무라유우끼 ,  다나까시게끼

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70791 ,  G03F7/70291 ,  H01L27/1288

Abstract: 본발명의과제는, 기판면내에있어서의현상처리후의레지스트잔여막의균일성을향상시켜, 배선패턴의선 폭및 피치의편차를억제하는것이다. 기판반송수단(20)과, 피처리기판(G)에대한노광처리공간을형성하는챔버(8)와, 기판반송방향에교차하는방향으로라인형상으로배열된복수의발광소자(L)를갖고, 하방을반송되는피처리기판상의감광막에대해, 상기발광소자의발광에의해광 조사가능한광원(4)과, 상기광원을구성하는복수의발광소자중, 1개또는복수의발광소자를발광제어단위로하여선택적으로발광구동가능한발광구동부(9)와, 상기기판반송수단에의해반송되는상기피처리기판을검출하는기판검출수단(30)과, 상기기판검출수단에의한기판검출신호가공급되는동시에, 상기발광구동부에의한상기발광소자의구동을제어하는제어부(40)를구비한다.

Abstract translation: 用于对形成在基板上的感光膜的特定区域进行曝光处理的局部曝光装置包括：基板传送器，被配置为限定基板输送路径，并且沿着基板输送路径水平地输送基板;被配置为限定曝光 处理空间，包括线性排列在基板输送路径上方的多个发光元件的光源，被配置为选择性地驱动光源的一个或多个发光元件的发光驱动单元，被配置为 检测由基板输送机输送的基板，以及控制单元，其配置为控制发光驱动单元，使得当感光膜的比表面积在光源下方移动时，仅能够照射给定区域的发光元件 被驱动以发光。

公开(公告)号：KR101711231B1

公开(公告)日：2017-02-28

申请号：KR1020120026051

申请日：2012-03-14

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  다나까시게끼 ,  오노우에고오따로오

IPC: G03F7/20 ,  H01L21/027

Abstract: 본발명의과제는, 기판면내에서미세하게설정한에어리어마다의노광량을용이하게조정하고, 현상처리후의레지스트잔여막의균일성을향상시켜, 배선패턴의선 폭및 피치의변동을억제하는것이다. 피처리기판(G)에형성된감광막의소정영역에대해, 그막 두께에기초하여조사해야할 목표조도를구하는스텝과, 상기소정영역에조사가능한적어도하나의발광체를특정하는스텝과, 상기특정한하나의발광체(GR)에대해, 상기발광체에인접하는다른발광체가상기소정영역에조사가능한경우에, 상기다른발광체의발광에의한간섭광의조도를상기목표조도로부터빼고, 당해산출된값을보정후의설정조도로하는스텝과, 상기보정후의설정조도에기초하여구동전류값을결정하고, 상기구동전류값에의해상기하나의발광체를발광시키는스텝을포함한다.

公开(公告)号：KR102006504B1

公开(公告)日：2019-08-01

申请号：KR1020130023182

申请日：2013-03-05

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  다나카시게키

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：KR1020150029545A

公开(公告)日：2015-03-18

申请号：KR1020140111396

申请日：2014-08-26

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  오노우에고우타로 ,  고토히데아키 ,  후지와라마사키

IPC: G01N21/956 ,  G01B11/24 ,  G06T7/60

Abstract: The present invention relates to a measuring apparatus, a substrate processing system, and a measuring method which promotes light weight and is not expensive. The measuring apparatus according to an embodiment includes a transfer unit, an imaging unit, and a measuring unit. The transfer unit transfers a substrate formed with a pattern, the imaging unit is positioned above the transfer unit, and takes an image of the pattern on the substrate. The measuring unit measures the shape of the pattern on the basis of the image information of the pattern taken by the imaging unit.

Abstract translation: 本发明涉及促进重量轻并且不昂贵的测量装置，基板处理系统和测量方法。 根据实施例的测量装置包括传送单元，成像单元和测量单元。 转印单元传送形成有图案的基板，成像单元位于转印单元上方，并将图案的图像作为基板。 测量单元基于由成像单元拍摄的图案的图像信息来测量图案的形状。

公开(公告)号：KR1020120002428A

公开(公告)日：2012-01-05

申请号：KR1020110052622

申请日：2011-06-01

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오오따요시하루 ,  모리야마시게루 ,  마쯔무라유우끼 ,  다나까시게끼

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70791 ,  G03F7/70291 ,  H01L27/1288 ,  H01L21/0275 ,  G03F7/70466

Abstract: PURPOSE: A local site exposure apparatus and a local site exposure method and a storage medium are provided to suppress the line width of a wire pattern and the deviation of a pitch by improving the uniformity of a resist remaining film. CONSTITUTION: A transfer roller(20) horizontally sends back a substrate according to a substrate carrier way. A chamber(8) forms an exposure treatment space to a substrate while covering the certain section of a substrate carrier way. A light source(4) is comprised of a plurality of light emitting devices in a line type in a cross direction of the transferring the substrate. A substrate detection sensor(30) detects the substrate which is returned with the transfer roller. A controller(40) controls the drive of the light emitting device by an LED driving unit(9).

Abstract translation: 目的：提供局部曝光装置和局部曝光方法以及存储介质，通过提高抗蚀剂残留膜的均匀性来抑制线图案的线宽和间距的偏差。 构成：转印辊（20）根据衬底载体的方式水平地回送衬底。 腔室（8）在覆盖衬底载体方式的某一部分的同时在衬底上形成曝光处理空间。 光源（4）由转移衬底的交叉方向的线型的多个发光器件构成。 基板检测传感器（30）检测由转印辊返回的基板。 控制器（40）通过LED驱动单元（9）控制发光器件的驱动。

公开(公告)号：KR102206500B1

公开(公告)日：2021-01-21

申请号：KR1020140111396

申请日：2014-08-26

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  오노우에고우타로 ,  고토히데아키 ,  후지와라마사키

IPC: G01N21/956 ,  G06T7/00 ,  G01B11/24

Abstract: 본발명은경량화를도모할수 있고, 저렴한측정장치, 기판처리시스템및 측정방법을제공하는것을목적으로한다. 실시형태의일 형태에따른측정장치는, 반송부와, 촬상부와, 측정부를구비한다. 반송부는패턴이형성된기판을반송한다. 촬상부는반송부의상방에배치되며, 반송부에배치된기판의패턴을촬상한다. 또한, 측정부는촬상부에의해촬상된패턴의화상정보에기초하여패턴의형상을측정한다.

公开(公告)号：KR101758392B1

公开(公告)日：2017-07-14

申请号：KR1020120017290

申请日：2012-02-21

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  마끼데쯔야 ,  다나까시게끼

IPC: G03F7/20

Abstract: 본발명의과제는기판면 내에서미세하게설정한에어리어마다노광량을조정하고, 현상처리후의레지스트잔여막의균일성을향상시켜, 배선패턴의선 폭및 피치의편차를억제하는것이다. 기판반송로(2)의상방에있어서, 기판반송방향에교차하는방향으로배열된복수의발광소자(L)를갖는광원(4)과, 상기광원을구성하는복수의발광소자중, 1개또는복수의발광소자를발광제어단위로서선택적으로발광구동가능한발광구동부(9)와, 상기피처리기판이상기광원의하방으로반송되지않는상태에서, 상기피처리기판에대한상기광원으로부터의광 조사위치를따라기판폭 방향으로진퇴가능하게설치되고, 상기광원에의해조사된광의조도를검출하는조도검출수단(31)과, 상기조도검출수단이검출한조도와상기발광소자의구동전류값의관계를상관테이블(T2)로서기억하는동시에, 상기발광구동부에의한상기발광소자의구동을제어하는제어부(40)를구비한다.

公开(公告)号：KR1020130102007A

公开(公告)日：2013-09-16

申请号：KR1020130023182

申请日：2013-03-05

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  다나카시게키

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/2004 ,  G03F7/16 ,  G03F7/2022 ,  H01L21/0274

Abstract: PURPOSE: A secondary exposure apparatus is provided to improve the film thickness of a resist pattern after a developing process or the accuracy of a line width or the uniformity of a surface in optical lithography. CONSTITUTION: A secondary exposure apparatus (10) radiates ultraviolet rays in a predetermined wavelength to a resist film on the surface of a substrate. The secondary exposure apparatus comprises: an ultraviolet ray radiation unit (32) obtained by arranging radiation areas with plural radiation elements radiating the ultraviolet rays to a first direction; a radiation driving unit (34) supplying driving current to the radiation elements of each radiation area; a scanning device transferring the ultraviolet ray radiation unit to a second direction crossing the first direction for exposing and scanning the resist film on the surface of the substrate; an illumination property acquisition unit acquiring the command value-illumination property; an illuminance control unit controlling the radiation driving unit based on the command value-illumination property for each radiation area; and a temperature management unit controlling temperatures of each radiation area into a same or similar temperature. [Reference numerals] (32) Ultraviolet ray radiation unit; (34) Radiation driving unit; (36) Cooling device; (38) Illumination intensity measuring unit; (40) Control unit; (42) Memory; (50) Injection driving unit

Abstract translation: 目的：提供二次曝光装置，以改善显影处理后的抗蚀剂图案的膜厚度或光学光刻中的线宽或表面的均匀性的精度。 构成：二次曝光装置（10）将预定波长的紫外线照射到基板表面上的抗蚀剂膜。 二次曝光装置包括：通过将具有将辐射紫外线的多个辐射元件布置在第一方向上的辐射区域而获得的紫外线辐射单元（32） 辐射驱动单元（34），其向每个辐射区域的辐射元件提供驱动电流; 扫描装置将紫外线辐射单元传送到与第一方向交叉的第二方向，用于在基板的表面上曝光和扫描抗蚀剂膜; 获取所述命令值照明特性的照明特性获取单元; 照度控制单元，根据各辐射区域的指示值照明特性来控制所述放射线驱动单元; 以及温度管理单元，其将每个辐射区域的温度控制在相同或相似的温度。 （附图标记）（32）紫外线辐射单元; （34）辐射驱动单元; （36）冷却装置; （38）照明强度测量单元; （40）控制单元; （42）记忆; （50）注射驱动单元

公开(公告)号：KR1020120105374A

公开(公告)日：2012-09-25

申请号：KR1020120026051

申请日：2012-03-14

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  다나까시게끼 ,  오노우에고오따로오

IPC: G03F7/20 ,  H01L21/027

CPC classification number: H01L21/0274 ,  G03F7/2049 ,  G03F7/70116 ,  G03F7/7055

Abstract: PURPOSE: A local area exposure method and a local area exposure apparatus are provided to easily adjust the amount of exposure to pre-determined areas in a substrate and to improve the uniformity of resist remaining film after development. CONSTITUTION: A local area exposure method includes the following: the target illuminance of a pre-determined area in a photo-sensitive film of a substrate is obtained based on the thickness of the film(Stp1); at least one light emitting element is defined; the set illuminance of the pre-determined area after compensation is determined by calculating a illuminance value; a driving current value is determined based on the set illuminance(Stp6); and the light emitting element emits light based on the driving current value. The set illuminance is determined by the following: the irradiation existence of light from other light emitting elements adjacent to the light emitting element with respect to the pre-determined area is verified; the illuminance of interference light based on light from other light emitting elements is subtracted from the target illuminance; and the set illuminance after compensation is obtained. [Reference numerals] (AA) Start; (BB,EE) Yes; (CC) No; (DD) No (Other group GR); (FF) End; (Stp1) Setting target illuminance, Qm-1, Qm, Qm+1; (Stp2) Calculating interference illuminance, Qm-1(i+1), on the basis of a light emitting controlling group, GRm-1; (Stp3) Calculating interference illuminance, Qm+1(i-1), on the basis of a light emitting controlling group, GRm+1; (Stp4) Calculating set illuminance, Qrm=Qm-Qm-1(i+1)-Qm+1(i-1), after compensation; (Stp5) Is the pre-determined frequency terminate ?; (Stp6) Calculating driving current values on the basis of the set illuminance after compensation; (Stp7) Is every light controlling GR terminate ?

Abstract translation: 目的：提供局部曝光方法和局部曝光装置，以容易地调节曝光到基板中预定区域的量，并提高显影后抗蚀剂剩余膜的均匀性。 构成：局部曝光方法包括以下：基于膜的厚度（Stp1）获得基板的感光膜中的预定区域的目标照度; 定义至少一个发光元件; 通过计算照度值来确定补偿后的预定区域的设定照度; 基于设定的照度（Stp6）确定驱动电流值; 并且发光元件基于驱动电流值发光。 设定的照度由以下决定：验证来自与发光元件相邻的其他发光元件相对于预定区域的光的照射存在; 从目标照度中减去基于来自其它发光元件的光的干涉光的照度; 获得补偿后的设定照度。 （附图标记）（AA）开始; （BB，EE）是; （CC）否; （DD）否（其他组GR）; （FF）结束; （Stp1）设定目标照度Qm-1，Qm，Qm + 1; （Stp2）基于发光控制组GRm-1计算干涉照度Qm-1（i + 1）; （Stp3）基于发光控制组GRm + 1计算干涉照度Qm + 1（i-1） （Stp4）补偿后计算设定照度Qrm = Qm-Qm-1（i + 1）-Qm + 1（i-1） （Stp5）预定频率是否终止？ （Stp6）补偿后基于设定的照度计算驱动电流值; （Stp7）每个灯光控制GR是否终止？

公开(公告)号：KR1020120096430A

公开(公告)日：2012-08-30

申请号：KR1020120017290

申请日：2012-02-21

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 모리야마시게루 ,  마끼데쯔야 ,  다나까시게끼

IPC: G03F7/20

CPC classification number: G03F7/70791 ,  G03F7/70008 ,  G03F7/70391 ,  G03F7/70425 ,  G03F7/7085

Abstract: PURPOSE: An exposure device for small sized areas is provided to suppress the deviation of line widths and pitches of wiring patterns and to improve the uniformity of a resist residual film after development. CONSTITUTION: A substrate transferring unit(20) forms a substrate transferring path(2) and transfers a substrate along the substrate transferring path. A light emission driving part(9) selectively implements light emitting processes based on light emitting elements as light emission controlling units. An illuminance detecting unit detects the illuminance of light from a light source. A controlling part(40) controls the operation of the light emitting elements based on the light emitting diode part.

Abstract translation: 目的：提供小尺寸区域的曝光装置，以抑制布线图案的线宽和间距的偏差，并提高显影后的抗蚀剂残留膜的均匀性。 构成：衬底传送单元（20）形成衬底传送路径（2）并沿着衬底传送路径传送衬底。 发光驱动部（9）选择性地实施基于发光元件的发光处理作为发光控制单元。 照度检测单元检测来自光源的光的照度。 控制部分（40）基于发光二极管部分控制发光元件的操作。