公开(公告)号：KR1020090032007A

公开(公告)日：2009-03-31

申请号：KR1020080094070

申请日：2008-09-25

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이노우에히사시 ,  마쯔모또슌이찌 ,  다께우찌야스시

IPC: H01L21/324

CPC classification number: H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

Abstract: A heat treatment method and heat treatment apparatus are provided to optimize the arrangement of the processed substrate in the treating furnace and to secure the uniformity of the processing of the substrates. The processed substrate(w) of the plural sheets is mounted in the substrate supporting unit(10). The substrate supporting unit is transferred within the thermal process furnace(3). In the thermal process, the processed substrates are processed. The interval(pa) between the surfaces of processed substrate are set up and to secure the treating uniformity. In processed substrates, the interval(pb) between the rear sides is narrow than interval between the surfaces.

Abstract translation: 提供一种热处理方法和热处理装置，以优化处理炉中处理过的衬底的布置，并确保衬底加工的均匀性。 多个片材的被处理基板（w）安装在基板支撑单元（10）中。 衬底支撑单元在热处理炉（3）内转移。 在热处理中，处理的基板被加工。 处理后的基板的表面之间的间隔（pa）被设定并确保处理均匀性。 在经处理​​的基板中，后侧之间的间隔（pb）比表面之间的间隔窄。

公开(公告)号：KR101133390B1

公开(公告)日：2012-04-24

申请号：KR1020080094070

申请日：2008-09-25

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이노우에히사시 ,  마쯔모또슌이찌 ,  다께우찌야스시

IPC: H01L21/324

CPC classification number: H01L21/67309 ,  C21D9/0068 ,  C23C16/56 ,  H01L21/67109

Abstract: A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other.