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公开(公告)号:KR1020100031066A
公开(公告)日:2010-03-19
申请号:KR1020090071989
申请日:2009-08-05
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/324
CPC classification number: H01L21/67098 , H01L21/67259 , H01L21/67706
Abstract: PURPOSE: A substrate processing apparatus is provided to improve a temperature uniformity of the substrate in a floating stage method by preventing the substrate from bending in order to maintain the floating gap of the substrate. CONSTITUTION: Floating stages(82, 84) includes a inclined transfer route(130). The floating stages are heated at a pre-set temperature and float a substrate horizontally by the pressure of a process gas. The substrate transfers to the floating stages through the inclined transfer route. A heat treatment is performed between the substrate which is floating and the floating stage by a heat transfer.
Abstract translation: 目的:提供一种基板处理装置,用于通过防止基板弯曲来提高基板的温度均匀性,以便保持基板的浮动间隙。 构成:浮动级(82,84)包括倾斜传送路线(130)。 浮动级在预设温度下被加热并且通过处理气体的压力水平地漂浮衬底。 衬底通过倾斜的转移路线转移到浮动级。 通过热传递在漂浮的基板和浮动台之间进行热处理。
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公开(公告)号:KR1020100031453A
公开(公告)日:2010-03-22
申请号:KR1020090072817
申请日:2009-08-07
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/67703 , B65G49/065 , G03F7/168 , G03F7/70716
Abstract: PURPOSE: A substrate processing apparatus is provided to secure the safety of a heating process and the stability of a substrate quality by preventing the interference between a substrate and a floating stage. CONSTITUTION: A first floating stage(82) is heated with a first temperature and float a substrate by the pressure of a gas. A second floating stage(84) is heated with a second temperature and floats the substrate by the pressure of a gas. The second temperature is higher than the first temperature. The starting end of the second floating stage is inclined. A flat transfer part transfers the substrate in the floating stage.
Abstract translation: 目的:提供一种基板处理装置,通过防止基板和浮动台之间的干涉来确保加热工艺的安全性和基板质量的稳定性。 构成:第一浮动级(82)在第一温度下被加热,并通过气体的压力漂浮衬底。 第二浮动级(84)在第二温度下被加热,并通过气体的压力漂浮在衬底上。 第二温度高于第一温度。 第二个浮动阶段的起始阶段是倾斜的。 平面转印部分在浮动阶段转移衬底。
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