公开(公告)号：KR1020100007725A

公开(公告)日：2010-01-22

申请号：KR1020090059707

申请日：2009-07-01

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가와구치요시히로 ,  모토마츠가즈키

IPC: B65G49/06 ,  B05C13/00 ,  H01L21/027

CPC classification number: G03F7/168 ,  B65G49/065 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70816 ,  H01L21/67703

Abstract: PURPOSE: A substrate processing apparatus is provided to carry substrates on a flotation stage through a stable board transfer gap due to horizontal flow conveyance. CONSTITUTION: A flotation stage(100) is heated or cooled at fixed temperature. The flotation stage buoys a processed substrate with the pressure of the gas. A first horizontal flow conveyor which is apart from the floatation stage is placed on the upper steam of a substrate conveyance line. A second horizontal flow conveyor is mounted on the front end of the floatation stage in the substrate conveyance line. The first horizontal flow conveyor comprises a first drive roller(86).

Abstract translation: 目的：提供一种基板处理装置，用于通过水平流动传送通过稳定的板传送间隙在浮选台上承载基板。 构成：浮选阶段（100）在固定温度下被加热或冷却。 浮选阶段用气体的压力浮置经处理的基板。 离开浮选台的第一水平流动输送器被放置在基板输送线的上部蒸汽上。 第二水平流动输送器安装在基板输送线中浮选台的前端。 第一水平流动输送机包括第一驱动辊（86）。