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公开(公告)号:KR1020110000530A
公开(公告)日:2011-01-03
申请号:KR1020100060476
申请日:2010-06-25
Applicant: 도쿄엘렉트론가부시키가이샤 , 히라따기꼬오 가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/0274 , G03F7/2041 , G03F7/70341 , G03F7/70916
Abstract: PURPOSE: A priming processing method and a priming processing device are provided to reduce a drying time and extend the lifespan of a cleaning apparatus by saving a cleaning solution used in priming processing. CONSTITUTION: An opening(12) of a slit type is formed on the top of a housing(10). A rotation tool(16) rotates a priming roller(14). The cleaning pad(20) of a cleaning process part(18) is arranged within the housing. The cleaning solution nozzle(28) is arranged in the upper part of the cleaning pad(20). A filter(36) and a valve(37) for eliminating impurity from the cleaning solution are installed in a piping(34).
Abstract translation: 目的:提供一种起动处理方法和起泡处理装置,通过保存用于起动处理中的清洗溶液来减少干燥时间并延长清洁装置的使用寿命。 构成:在壳体(10)的顶部上形成狭缝型的开口(12)。 旋转工具(16)旋转起动辊(14)。 清洁处理部件(18)的清洁垫(20)布置在壳体内。 清洁溶液喷嘴(28)布置在清洁垫(20)的上部。 用于从清洗液中除去杂质的过滤器(36)和阀(37)安装在管道(34)中。
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公开(公告)号:KR1020080061298A
公开(公告)日:2008-07-02
申请号:KR1020070137143
申请日:2007-12-26
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027 , H01L21/677
CPC classification number: H01L21/0274 , G03F7/2041 , G03F7/70716 , H01L21/67721
Abstract: A substrate processing apparatus is provided to simplify a transfer unit and reduce a fabricating cost by disposing a plurality of side rollers on both sides of a stage wherein the rollers are located in a line at a predetermined pitch and by rotating the side roller to transfer a substrate. While a processed substrate(G) of a quadrangular type floats on a stage extended in an almost horizontal transfer direction by gas pressure to be transferred in the transfer direction, predetermined liquid, gas, light or heat from a tool disposed along the stage is supplied to the substrate to perform a predetermined treatment process. A plurality of side rollers(110) are disposed on both sides of the stage wherein the side rollers are located in a line at a predetermined pitch so that both lateral ends of the substrate floating on the stage are mounted on the outer circumferential surface of the roller, and the side roller is rotated to transfer the substrate. An absorption hole for absorbing gas at a negative pressure is formed in a point of the upper surface of the stage adjacent to the side roller, and absorption force from the absorption hole is supplied downward to the substrate to increase friction between the substrate and the side roller.
Abstract translation: 提供了一种基板处理装置,以简化传送单元并且通过在辊的两侧设置多个侧辊并且以预定间距设置在一条线中并且通过使侧辊转动来转移 基质。 虽然四边形类型的被处理基板(G)在沿着传送方向传送的气体压力的大致水平传送方向上延伸的台上浮动,但是提供了沿着设置在台架上的工具的预定液体,气体,光或热量 以进行预定处理。 多个侧辊(110)设置在工作台的两侧,其中侧辊以预定间距位于一条直线上,使得漂浮在工作台上的衬底的两个侧端安装在 辊,并且侧辊旋转以转移基板。 在与侧辊相邻的台的上表面上形成有用于吸收负压的气体的吸收孔,并且从吸收孔的吸收力向下供给到基板,以增加基板与侧面之间的摩擦 滚筒。
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公开(公告)号:KR101621566B1
公开(公告)日:2016-05-16
申请号:KR1020100060476
申请日:2010-06-25
Applicant: 도쿄엘렉트론가부시키가이샤 , 히라따기꼬오 가부시키가이샤
IPC: H01L21/027
Abstract: 본발명의과제는프라이밍처리에서사용하는세정액의가일층의절감과, 건조처리시간의단축화및 세정처리용툴 및/또는건조처리용툴의장기수명화를도모하는것이다. 이프라이밍처리장치는프라이밍롤러(14)의주위에회전방향을따라서, 세정패드(20)를갖는조세정처리부(18)와, 2유체제트노즐(42)을갖는마무리세정처리부(38)와, 닦기패드(52)를갖는액적제거부(48)와, 간극(58) 및가스노즐(60)을갖는건조블로우부(50)를배치하고있다. 세정패드(20) 및닦기패드(52)는세정패드이동기구(24) 및닦기패드이동기구(56)에의해프라이밍롤러(14)의외주면에접촉하는제1 위치와그곳으로부터퇴피하는제2 위치사이에서절환된다.
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