기판 처리 장치, 기판 처리 장치의 감시 장치 및 기판 처리 장치의 감시 방법
    2.
    发明公开
    기판 처리 장치, 기판 처리 장치의 감시 장치 및 기판 처리 장치의 감시 방법 审中-实审
    基板处理装置,基板处理装置的监视装置以及基板处理装置的监视方法

    公开(公告)号:KR1020140105374A

    公开(公告)日:2014-09-01

    申请号:KR1020140015363

    申请日:2014-02-11

    CPC classification number: G01N21/9501 H01L21/67288

    Abstract: An objective of the present invention is to provide a substrate processing apparatus capable of easily and clearly detecting general failure which is suddenly and irregularly generated, a monitoring device of the substrate processing apparatus, and a monitoring method of a substrate processing apparatus. The monitoring device of the substrate processing apparatus is a monitoring device of a substrate processing apparatus monitoring a state of a process for processing a substrate to be processed and includes: an imaging unit which images a processing state of the process; a storage unit; a storage control unit storing a moving picture imaged by the imaging unit after adding a time stamp to the moving picture; a group classification unit grouping a plurality of moving pictures stored in the storage unit into moving pictures of a normal group and moving pictures of a group other than the normal group; and a threshold generation unit generating a threshold for detecting an abnormal moving picture based on the moving pictures of the normal group grouped by the group classification unit.

    Abstract translation: 本发明的目的是提供一种能够容易且清楚地检测突然和不规则地产生的一般故障的基板处理装置,基板处理装置的监视装置和基板处理装置的监视方法。 基板处理装置的监视装置是监视处理要处理的基板的处理状态的基板处理装置的监视装置,包括:成像部,其对该处理的处理状态进行成像; 存储单元; 存储控制单元,其在向所述运动图像添加时间戳之后,存储由所述成像单元成像的运动图像; 将存储在存储单元中的多个运动图像分组成正常组的运动图像和正常组之外的组的运动图像的组分类单元; 以及阈值生成单元,基于由组分类单元分组的正常组的运动图像,生成用于检测异常运动图像的阈值。

    반도체 제조 장치의 프로세스 감시 장치, 반도체 제조 장치의 프로세스 감시 방법 및 반도체 제조 장치
    3.
    发明公开
    반도체 제조 장치의 프로세스 감시 장치, 반도체 제조 장치의 프로세스 감시 방법 및 반도체 제조 장치 审中-实审
    半导体制造装置和半导体制造装置中的工艺监测装置和工艺监测方法

    公开(公告)号:KR1020130102486A

    公开(公告)日:2013-09-17

    申请号:KR1020130023171

    申请日:2013-03-05

    CPC classification number: G06T7/001 G06T2207/10016 G06T2207/30148

    Abstract: PURPOSE: A process monitoring device in a semiconductor manufacturing apparatus, a process monitoring method in the semiconductor manufacturing apparatus, and the semiconductor manufacturing apparatus are provided to prevent the generation of defects in a wafer by performing a reliable monitoring process. CONSTITUTION: A dynamic image monitor camera is formed in a coating development device. A calculation processing part (103) inputs dynamic image signals. A data memory part (104) includes a hard disk. The calculation processing part performs a calculating process on the dynamic image signals. A leaning failure determination processing part (105) inputs dynamic image data. [Reference numerals] (101) Video monitor camera; (102) Image frame grabber part; (103) Calculation processing part; (104) Data memory part; (105) Leaning failure determination processing part; (106) Diagnosis result display part; (107) Device event issue part; (AA) Alarm

    Abstract translation: 目的:提供半导体制造装置中的处理监视装置,半导体制造装置中的处理监视方法和半导体制造装置,以通过执行可靠的监视处理来防止晶片中的缺陷的产生。 构成:在涂料开发装置中形成动态图像监视摄像机。 计算处理部(103)输入动态图像信号。 数据存储部(104)包括硬盘。 计算处理部对动态图像信号进行计算处理。 倾斜故障判定处理部(105)输入动态图像数据。 (附图标记)(101)视频监视摄像机; (102)图像抓取部分; (103)计算处理部; (104)数据存储器部分; (105)倾斜故障判定处理部; (106)诊断结果显示部分; (107)设备事件发布部分; (AA)报警

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