公开(公告)号：KR100691652B1

公开(公告)日：2007-03-09

申请号：KR1020000058362

申请日：2000-10-05

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 우에다잇세이 ,  타케쿠마타카시 ,  오쿠마라켄지

IPC: H01L21/027

CPC classification number: H01L21/67161 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67184 ,  Y10T29/41

Abstract: 본 발명은 기판처리장치에 관한 것으로서, 액처리를 수행하는 제 1 처리유닛군과, 가열처리유닛 및 냉각처리유닛을 갖춘 가열·냉각처리유닛을 갖는 제 2 처리유닛군은, 냉각처리유닛이 제 1 처리유닛군측에 위치하도록 인접하여 배치되어 있음으로써, 상온 부근에서 기판에 대해 액처리를 수행하기 위한 액처리유닛에 있어서의 온도제어를 정밀하게 수행할 수 있는 기술이 제시된다.

Abstract translation: 基板处理装置技术领域本发明涉及一种基板处理装置，包括：用于进行液体处理的第一处理单元组;以及具有具有热处理单元和冷却处理单元的加热冷却处理单元的第二处理单元组， 与第一处理单元组相邻设置，以精确地控制用于在常温附近对基板进行液体处理的液体处理单元中的温度。

公开(公告)号：KR1020010050849A

公开(公告)日：2001-06-25

申请号：KR1020000058362

申请日：2000-10-05

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 우에다잇세이 ,  타케쿠마타카시 ,  오쿠마라켄지

IPC: H01L21/027

CPC classification number: H01L21/67161 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67184 ,  Y10T29/41

Abstract: PURPOSE: A substrate treatment device is provided to arrange the layout which can shorten the pipe of treatment liquid in the case of piling up liquid treatment units in a plurality of stages. CONSTITUTION: In a treatment station(S22) performing coating of resist or the like, a first treatment part group containing a reflection preventing film forming unit, a coating unit and a cooling part is arranged in parallel to the arrangement direction of a cassette(222) of a cassette station(S21) delivering the cassette(222) and adjacently to the station(S21). Neighboring the first treatment part group, a third treatment part group containing a shelf unit and a second treatment part group containing a developing unit are arranged in this order oppositely to the first treatment part group. Wafer carrying means(MA21, MA22) are arranged between the first and second treatment part groups and between the second and third treatment part groups, respectively. As a result, delivery of a wafer is enabled to the first treatment part group by using a delivering arm(223) of the cassette station(S21), and the load of the wafer carrying means can be reduced.

Abstract translation: 目的：提供一种基板处理装置，用于布置在多个阶段堆积液体处理单元的情况下可缩短处理液管道的布局。 构成：在进行抗蚀剂等的涂布的处理台（S22）中，包含防反射膜形成单元，涂布单元和冷却部的第一处理部分组与盒（222）的排列方向平行地布置 ）传送盒（222）并且邻近于站（S21）的盒式电台（S21）。 相邻的第一处理部分组，包含搁板单元的第三处理部分组和包含显影单元的第二处理部分组以与第一处理部分组相反的顺序排列。 晶片承载装置（MA21，MA22）分别布置在第一和第二处理部件组之间以及第二和第三处理部件组之间。 结果，通过使用盒式电台的传送臂（223），使第一处理部分组能够传送晶片，并且可以减小晶片传送装置的负载。