公开(公告)号：KR1020140060236A

公开(公告)日：2014-05-19

申请号：KR1020130133961

申请日：2013-11-06

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 쿠보타신지 ,  모리타오사무

IPC: H01L51/56 ,  H05B33/10

CPC classification number: H01L51/56 ,  C23C14/12 ,  C23C14/24 ,  H01L51/001

Abstract: The mixture of steam is avoided between adjacent deposition heads and the reduction of exhaust efficiency is suppressed. A film forming apparatus includes a processing container, a transfer device, a plurality of deposition heads, a partition, and an exhaust device. The processing container dividedly forms the processing chamber for processing a substrate. The transfer device transfers the substrate on a transfer path which is extended in the processing chamber in a preset direction. The deposition heads are arranged in the processing chamber in the preset direction and spray gas including the steam of a deposition material to the film forming surface of the substrate transferred on the transfer path by the transfer device. The exhaust device is connected to each receiving chamber by interposing an exhaust port formed in each receiving chamber and exhaust the surrounding of the deposition head.

Abstract translation: 在相邻的沉积头之间避免蒸汽的混合，并且抑制排气效率的降低。 成膜装置包括处理容器，转移装置，多个沉积头，隔板和排气装置。 处理容器分开形成用于处理基板的处理室。 传送装置将基板传送到在预定方向上在处理室中延伸的传送路径上。 沉积头沿预设方向布置在处理室中，并且将包括沉积材料的蒸汽的气体喷射到通过传送装置传送在传送路径上的基板的成膜表面。 排气装置通过插入形成在每个接收室中的排气口并排出沉积头的周围而连接到每个接收室。