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Patent Agency Ranking
公开(公告)号：KR1020140069944A
公开(公告)日：2014-06-10
申请号：KR1020120137843
申请日：2012-11-30
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: G03F7/0392 , G03F7/004 , G03F7/0226 , G03F7/023 , G03F7/0233 , G03F7/039 , G03F7/0758 , G03F7/40
Abstract: The present invention relates to a positive photosensitive resin composition and a cured film manufactured therefrom. The positive photosensitive resin composition of the present invention comprises (1) a copolymer including (1-1) a constituent unit derived from carboxyl-containing unsaturated monomer, (1-2) a constituent unit derived from unsaturated monomer including at least one epoxy group, and (1-3) a constituent unit derived from divinyl monomer including acetal backbone; (2) a quinonediazide based photoactive compound; and (3) a photoacid generator. The positive photosensitive resin compound of the present invention has excellent sensitivity and a high retention rate after development and post-cure, and provides a high pattern formation, so as to be useful in manufacturing an insulator film for a liquid crystal display device.
Abstract translation: 本发明涉及正型感光性树脂组合物及其制造的固化膜。 本发明的正型感光性树脂组合物包含（1）包含（1-1）来自含羧基的不饱和单体的构成单元的共聚物，（1-2）来自含有至少一个环氧基的不饱和单体的构成单元 ，（1-3）衍生自包含缩醛骨架的二乙烯基单体的构成单元; （2）基于醌二叠氮化物的光敏化合物; 和（3）光致酸发生剂。 本发明的正型感光性树脂化合物在显影和后固化之后具有优异的灵敏度和高的保留率，并且提供高图案形成，从而可用于制造用于液晶显示装置的绝缘膜。
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公开(公告)号：KR1020140035180A
公开(公告)日：2014-03-21
申请号：KR1020120101729
申请日：2012-09-13
Applicant: 롬엔드하스전자재료코리아유한회사
CPC classification number: G03F7/0392 , G03F7/004 , G03F7/0045 , G03F7/022 , G03F7/039
Abstract: The present invention relates to a positive type photosensitive resin composition and a cured film manufactured thereby. The positive type photosensitive resin composition of the present invention comprises: copolymers (1) which are produced by making a compound represented by a chemical formula 1 with an alkali soluble copolymer including an organization unit (1-1) induced from an unsaturated monomer containing a carboxyl group, an organization unit (1-2) induced from an unsaturated monomer containing at least one epoxy group, an organization unit (1-3) induced from an unsaturated monomer containing a phenolic hydroxyl group and an organization unit (1-4) containing an unsaturated monomer different from the unsaturated monomer of (1-1) to (1-3); quinonediazide-based photoactive compounds (2); photoacid generators (3); and solvents (4). The positive type photosensitive resin composition of the present invention exhibits excellent sensitivity, high residual film rate after phenomenon and postcuring and provides high pattern formation, thereby being able to be usefully used in the manufacture of an insulation layer for a liquid crystal display.
Abstract translation: 本发明涉及一种正型感光性树脂组合物及其制造的固化膜。 本发明的正型感光性树脂组合物含有：将由化学式1表示的化合物与含有由不饱和单体引发的组成单元（1-1）的碱溶性共聚物制成的共聚物（1） 羧基，由含有至少一个环氧基的不饱和单体引发的组织单元（1-2），由含有酚羟基的不饱和单体引发的组织单元（1-3）和组织单元（1-4） （1-1）〜（1-3）的不饱和单体不饱和单体; 基于醌二叠氮化物的光活性化合物（2）; 光酸发生器（3）; 和溶剂（4）。 本发明的正型感光性树脂组合物显示出优异的灵敏度，现象和后固化后的高残留膜率，并提供高图案形成，从而能够有用地用于液晶显示器的绝缘层的制造。
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公开(公告)号：KR101976210B1
公开(公告)日：2019-05-07
申请号：KR1020120099965
申请日：2012-09-10
Applicant: 롬엔드하스전자재료코리아유한회사
IPC: G03F7/039 , G03F7/004 , H01L21/027
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公开(公告)号：KR1020140033741A
公开(公告)日：2014-03-19
申请号：KR1020120099965
申请日：2012-09-10
Applicant: 롬엔드하스전자재료코리아유한회사
IPC: G03F7/039 , G03F7/004 , H01L21/027
CPC classification number: G03F7/0392 , G03F7/004 , G03F7/0045 , G03F7/039 , H01L21/027 , H01L21/0271
Abstract: The present invention relates to a positive photosensitive resin composition and an insulating film using the same. The positive photosensitive resin composition of the present invention includes: a copolymer which includes units derived from an unsaturated monomer having a specific acid-decomposable acetal protective group, units derived from an unsaturated monomer having at least one epoxy group, units derived from a carboxyl group-containing unsaturated monomer, and units derived from an N-substituted maleimide monomer; a photosensitive acid generating agent; and a solvent. The positive photosensitive resin provides a cured film which has improved sensitivity, pattern-forming properties, storage stability, and adhesion and shows a high residual film ratio, thereby being effectively used for manufacturing an insulating film for a liquid crystal display device.
Abstract translation: 本发明涉及正性感光性树脂组合物及使用其的绝缘膜。 本发明的正型感光性树脂组合物包括：共聚物，其包含衍生自具有特定酸分解性缩醛保护基的不饱和单体的单元，源自具有至少一个环氧基的不饱和单体的单元，源自羧基的单元 含有不饱和单体，衍生自N-取代马来酰亚胺单体的单元; 光敏酸产生剂; 和溶剂。 正型感光性树脂提供了具有改善的灵敏度，图案形成性质，保存稳定性和粘附性的固化膜，并且显示出高的残留膜比，从而有效地用于制造用于液晶显示装置的绝缘膜。
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