고내열성 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
    4.
    发明公开
    고내열성 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 审中-实审
    具有高热敏性和硬化过氧化物层的负型感光树脂组合物

    公开(公告)号:KR1020140141115A

    公开(公告)日:2014-12-10

    申请号:KR1020130062449

    申请日:2013-05-31

    Abstract: 본 발명은 고내열성 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막에 관한 것으로, (a) (a-1) (메트)아크릴레이트기를 갖는 실록산 단위를 포함하는 유기실록산 중합체; (a-2) 페닐기를 갖는 실록산 단위를 포함하는 유기실록산 중합체; 및 (b) 광중합 개시제를 포함하고, 에틸렌성 불포화 이중결합을 갖는 아크릴레이트계 화합물을 포함하지 않는 본 발명의 감광성 수지 조성물로부터 제조된 경화막은 고온 경화조건에서 우수한 내열성을 가져 크랙 발생이 억제됨으로써 평탄막 구현이 가능하고 황변 등으로 인한 광 투과율 저하를 나타내지 않으므로, 전자부품의 보호막 등으로서 유용하게 사용될 수 있다.

    Abstract translation: 本发明涉及具有高耐热性的负型感光性树脂组合物和由其制备的硬化外涂层。 由(a)(a-1)含有具有(甲基)丙烯酸酯基团的硅氧烷单元的有机硅氧烷聚合物的本发明的感光性树脂组合物制备的硬化外涂层; (a-2)包含具有苯基的硅氧烷单元的有机硅氧烷聚合物; (b)光聚合引发剂,不含有具有乙烯不饱和双键的丙烯酸酯类化合物在高温固化条件下具有优异的耐热性,以控制裂纹形成平膜,并且不会由于黄变至 可用作电子部件的这种保护膜。

    포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
    5.
    发明公开
    포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 审中-实审
    阳离子型感光树脂组合物和固化膜

    公开(公告)号:KR1020140035180A

    公开(公告)日:2014-03-21

    申请号:KR1020120101729

    申请日:2012-09-13

    CPC classification number: G03F7/0392 G03F7/004 G03F7/0045 G03F7/022 G03F7/039

    Abstract: The present invention relates to a positive type photosensitive resin composition and a cured film manufactured thereby. The positive type photosensitive resin composition of the present invention comprises: copolymers (1) which are produced by making a compound represented by a chemical formula 1 with an alkali soluble copolymer including an organization unit (1-1) induced from an unsaturated monomer containing a carboxyl group, an organization unit (1-2) induced from an unsaturated monomer containing at least one epoxy group, an organization unit (1-3) induced from an unsaturated monomer containing a phenolic hydroxyl group and an organization unit (1-4) containing an unsaturated monomer different from the unsaturated monomer of (1-1) to (1-3); quinonediazide-based photoactive compounds (2); photoacid generators (3); and solvents (4). The positive type photosensitive resin composition of the present invention exhibits excellent sensitivity, high residual film rate after phenomenon and postcuring and provides high pattern formation, thereby being able to be usefully used in the manufacture of an insulation layer for a liquid crystal display.

    Abstract translation: 本发明涉及一种正型感光性树脂组合物及其制造的固化膜。 本发明的正型感光性树脂组合物含有:将由化学式1表示的化合物与含有由不饱和单体引发的组成单元(1-1)的碱溶性共聚物制成的共聚物(1) 羧基,由含有至少一个环氧基的不饱和单体引发的组织单元(1-2),由含有酚羟基的不饱和单体引发的组织单元(1-3)和组织单元(1-4) (1-1)〜(1-3)的不饱和单体不饱和单体; 基于醌二叠氮化物的光活性化合物(2); 光酸发生器(3); 和溶剂(4)。 本发明的正型感光性树脂组合物显示出优异的灵敏度,现象和后固化后的高残留膜率,并提供高图案形成,从而能够有用地用于液晶显示器的绝缘层的制造。

    포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
    7.
    发明公开
    포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 审中-实审
    阳离子型感光树脂组合物和固化膜

    公开(公告)号:KR1020140069944A

    公开(公告)日:2014-06-10

    申请号:KR1020120137843

    申请日:2012-11-30

    Abstract: The present invention relates to a positive photosensitive resin composition and a cured film manufactured therefrom. The positive photosensitive resin composition of the present invention comprises (1) a copolymer including (1-1) a constituent unit derived from carboxyl-containing unsaturated monomer, (1-2) a constituent unit derived from unsaturated monomer including at least one epoxy group, and (1-3) a constituent unit derived from divinyl monomer including acetal backbone; (2) a quinonediazide based photoactive compound; and (3) a photoacid generator. The positive photosensitive resin compound of the present invention has excellent sensitivity and a high retention rate after development and post-cure, and provides a high pattern formation, so as to be useful in manufacturing an insulator film for a liquid crystal display device.

    Abstract translation: 本发明涉及正型感光性树脂组合物及其制造的固化膜。 本发明的正型感光性树脂组合物包含(1)包含(1-1)来自含羧基的不饱和单体的构成单元的共聚物,(1-2)来自含有至少一个环氧基的不饱和单体的构成单元 ,(1-3)衍生自包含缩醛骨架的二乙烯基单体的构成单元; (2)基于醌二叠氮化物的光敏化合物; 和(3)光致酸发生剂。 本发明的正型感光性树脂化合物在显影和后固化之后具有优异的灵敏度和高的保留率,并且提供高图案形成,从而可用于制造用于液晶显示装置的绝缘膜。

    고내열성, 고해상도의 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
    8.
    发明公开
    고내열성, 고해상도의 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 审中-实审
    具有高热稳定性和高分辨率的阴离子型感光树脂组合物,以及其制备的硬化过氧化物层

    公开(公告)号:KR1020140042163A

    公开(公告)日:2014-04-07

    申请号:KR1020120108534

    申请日:2012-09-28

    Abstract: The present invention relates to a negative-type photosensitive resin composition having high thermal resistance and high resolution containing an organic siloxane polymer and an acryl copolymer at the same time, and a hardened layer prepared therefrom. The negative-type photosensitive resin composition contains: (1) the organic siloxane polymer; (2) a random copolymer including (2-1) a structure unit induced from ethylene unsaturated carboxylic acid, ethylene unsaturated carboxylic acid anhydride, or a mixture thereof, and (2-2) a structure unit induced from an ethylene unsaturated compound with an aromatic ring; (3) an acrylate based compound with one or more ethylene unsaturated double bond; and (4) a photopolymerization initiator. The organic siloxane polymer includes: a siloxane unit (a) with a (meth)acrylate group as a polymerization unit; and a siloxane unit (b) with one or more functional groups selected from an epoxy group, an oxetane group, a hydroxy group, and a thiol group.

    Abstract translation: 本发明涉及同时具有有机硅氧烷聚合物和丙烯酸共聚物的耐热性和高分辨率的负型感光性树脂组合物及其制备的硬化层。 负型感光性树脂组合物含有:(1)有机硅氧烷聚合物; (2)包含(2-1)由乙烯不饱和羧酸,乙烯不饱和羧酸酐或其混合物引发的结构单元的无规共聚物,(2-2)由乙烯不饱和化合物诱导的结构单元, 芳香环 (3)具有一个或多个乙烯不饱和双键的丙烯酸酯类化合物; 和(4)光聚合引发剂。 有机硅氧烷聚合物包括:具有(甲基)丙烯酸酯基的硅氧烷单元(a)作为聚合单元; 和具有一个或多个选自环氧基,氧杂环丁烷基,羟基和硫醇基的官能团的硅氧烷单元(b)。

    감광성 수지 조성물, 이를 이용한 저유전율 차광층 및 액정 디스플레이 장치
    9.
    发明公开
    감광성 수지 조성물, 이를 이용한 저유전율 차광층 및 액정 디스플레이 장치 有权
    光敏树脂组合物,低介电常数光屏蔽层和液晶显示装置

    公开(公告)号:KR1020120103212A

    公开(公告)日:2012-09-19

    申请号:KR1020110021350

    申请日:2011-03-10

    Abstract: PURPOSE: A composition for a photo-sensitive resin, a low dielectric constant light shielding layer using the same, and a liquid crystal display device are provided to adjust the generation of stepped parts due to a thermal treating process. CONSTITUTION: A composition for a photo-sensitive resin includes a photopolymerizable unsaturated binder resin, an ethylenically unsaturated bond containing functional monomer, a polymerization initiator, a block organic mixed pigment, and a solvent. The photopolymerizable unsaturated binder resin is obtained by reacting an epoxy adduct and a polybasic acid anhydride. The epoxy adduct is obtained by adding unsaturated basic acid to an epoxy resin represented by chemical formula 1. A light shielding layer includes a film based on the composition.

    Abstract translation: 目的:提供用于感光树脂的组合物,使用该组合物的低介电常数遮光层和液晶显示装置,以调节由热处理工艺产生的台阶部件。 构成:光敏树脂用组合物包括光聚合性不饱和粘合剂树脂,含有烯属不饱和键的官能单体,聚合引发剂,嵌段有机混合颜料和溶剂。 可光聚合的不饱和粘合剂树脂通过环氧加合物和多元酸酐反应获得。 通过将不饱和碱性酸添加到由化学式1表示的环氧树脂中而获得环氧加成物。遮光层包括基于组合物的膜。

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