公开(公告)号：KR1020010002504A

公开(公告)日：2001-01-15

申请号：KR1019990022332

申请日：1999-06-15

Applicant: 삼성전자주식회사

Inventor： 김수헌

IPC: H01L21/68

Abstract: PURPOSE: A structure of a wafer guide is provided to improve a structure of a wafer guide pin disposed in a baking unit of a spinner equipment, thereby exactly mounting a wafer at a right position though the wafer is incorrectly conveyed. CONSTITUTION: The device comprises a guide pin(230) provided along with an outer circumference of a mounting portion(220) on which a wafer is mounted and having a corner portion inclined at a desired angle about an inside direction of the mounting portion; and an up/down pin(240) provided at a desired portion of the mounting portion to move the wafer in a vertical direction, wherein three or more guide pins and up/down pins are provided. In the structure, the guide pin is formed of a heat resistant ceramic material. The guide pin has a triangular pyramid shape. The corner portion inclined at 40 to 50 degree is arranged toward an inside of the mounting portion, and the rest two corner portion are arranged toward an outside of the mounting portion.

Abstract translation: 目的：提供晶片引导件的结构，以改善设置在旋转器设备的烘烤单元中的晶片引导销的结构，从而在晶片被错误地传送的同时将晶片精确地安装在右侧位置。 构成：该装置包括与安装部分（220）的外圆周一起设置的引导销（230），其上安装有晶片，并且具有围绕安装部分的内部方向以期望角度倾斜的角部分; 以及设置在所述安装部分的期望部分处的上/下销（240），以沿垂直方向移动所述晶片，其中提供三个或更多个引导销和上/下引脚。 在该结构中，导销由耐热陶瓷材料形成。 导销具有三角锥形状。 倾斜40〜50度的角部朝向安装部的内侧配置，其余的两个角部朝向安装部的外侧配置。

公开(公告)号：KR1020020083296A

公开(公告)日：2002-11-02

申请号：KR1020010022739

申请日：2001-04-26

Applicant: 삼성전자주식회사

Inventor： 김수헌 ,  신원열 ,  김하수

IPC: H01L21/027

Abstract: PURPOSE: An apparatus and a method for supplying a photoresist solution of a spin coating unit are provided to measure correctly the amount of photoresist solution by installing a flow meter at a supply tube between a filter and a suck valve. CONSTITUTION: The first drain tube(14a) is installed at an intermediate tank(14) in order to discharge residues of the photoresist solution from the intermediate tank(14). The photoresist solution stored in the intermediate tank(14) is supplied to a filter(18) by a pump(16). The photoresist solution is filtered by the filter(18). The filtered photoresist solution is supplied to a nozzle through a suck valve(20). The second drain tube(18a) is installed at the filter(18) in order to discharge the residues of the photoresist solution. The pump(16) is connected with a control portion(50). A flow meter(40) is installed at a supply tube between the filter(18) and the suck valve(20). The suck valve(20) is controlled by control portion(50). A spin coating device(30) rotates a rotary chuck(32) by using a rotary motor(34). The photoresist solution drops from the nozzle to a wafer(W).

Abstract translation: 目的：提供一种用于提供旋涂单元的光致抗蚀剂溶液的装置和方法，以通过在过滤器和抽吸阀之间的供给管处安装流量计来正确地测量光致抗蚀剂溶液的量。 构成：为了从中间罐（14）排出光致抗蚀剂溶液的残留物，第一排水管（14a）安装在中间罐（14）上。 存储在中间罐（14）中的光致抗蚀剂溶液通过泵（16）供给到过滤器（18）。 光致抗蚀剂溶液被过滤器（18）过滤。 被过滤的光致抗蚀剂溶液通过吸入阀（20）供给到喷嘴。 第二排水管（18a）安装在过滤器（18）处以排出光致抗蚀剂溶液的残留物。 泵（16）与控制部（50）连接。 在过滤器（18）和吸入阀（20）之间的供给管上安装有流量计（40）。 吸入阀（20）由控制部（50）控制。 旋转涂布装置（30）通过使用旋转马达（34）旋转旋转卡盘（32）。 光致抗蚀剂溶液从喷嘴滴落到晶片（W）上。

公开(公告)号：KR1020010002632A

公开(公告)日：2001-01-15

申请号：KR1019990022530

申请日：1999-06-16

Applicant: 삼성전자주식회사

Inventor： 김수헌

IPC: H01L21/66

Abstract: PURPOSE: A semiconductor fabricating equipment with a wafer mapping check system, and a method of checking a wafer mapping are provided to inform a user of a fact that a wafer mapping result performed in a process equipment is disagreed with a wafer mapping data in a system. CONSTITUTION: The device and method comprise an automation system(100) having data of a wafer mapping to be supplied to a semiconductor fabricating process and performing whole controlling operations; a robot system(120) connected with the automation system(100) and conveying a wafer; a process equipment(110) for performing a mapping operation with respect to a wafer conveyed from a robot system(120); and a wafer mapping check portion for comparing a wafer mapping result performed in the process equipment(110) with data from the automation system(100) and informing to a user if the wafer mapping result performed in the process equipment(110) is disagreed with the wafer mapping data. In the equipment, the wafer mapping check portion comprises the first counter(131) for showing the wafer mapping data from the automation system(100), the second counter(132) for showing the wafer mapping data from the processor equipment(110), and a comparator(133) for comparing counted values of the first(131) and second counter(132).

Abstract translation: 目的：提供具有晶片映射检查系统的半导体制造设备和检查晶片映射的方法，以通知用户在处理设备中执行的晶片映射结果不同于系统中的晶片映射数据 。 构成：该装置和方法包括一个自动化系统（100），其具有要提供给半导体制造过程并进行整体控制操作的晶片映射的数据; 与所述自动化系统（100）连接并传送晶片的机器人系统（120） 用于对从机器人系统（120）输送的晶片执行映射操作的处理设备（110）; 以及晶片映射检查部分，用于将在处理设备（110）中执行的晶片映射结果与来自自动化系统（100）的数据进行比较，并且向用户通知在处理设备（110）中执行的晶片映射结果是否不同意 晶圆映射数据。 在设备中，晶片映射检查部分包括用于显示来自自动化系统（100）的晶片映射数据的第一计数器（131），用于显示来自处理器设备（110）的晶片映射数据的第二计数器（132） 以及用于比较第一（131）和第二计数器（132）的计数值的比较器（133）。

公开(公告)号：KR1020020027751A

公开(公告)日：2002-04-15

申请号：KR1020000058373

申请日：2000-10-05

Applicant: 삼성전자주식회사

Inventor： 송경수 ,  김수헌

IPC: H01L21/027

Abstract: PURPOSE: Photolithography equipment is provided to shorten an interval of time for transferring a wafer from conventional developing equipment to curing equipment and to reduce wafer standby time needed in a conventional disposition process, by compositively performing a curing process in the developing equipment by a single-wafer-type method. CONSTITUTION: Coating equipment(100) applies photoresist on a wafer. Exposure equipment(200) projects a predetermined pattern on the photoresist-coated wafer. A developing process for developing the wafer having the predetermined pattern and a curing process for curing the developed wafer are performed in developing/curing composite equipment(300). Wafer transfer equipment transfers the wafer so that each process is continuously performed in the coating equipment, the exposure equipment and the developing/curing composite equipment.

Abstract translation: 目的：提供光刻设备，以缩短从常规开发设备转移到固化设备的晶片间隔时间，并缩短传统布置过程所需的晶片待机时间，通过单独执行开发设备中的固化过程， 晶圆型方法。 构成：涂层设备（100）在晶片上施加光致抗蚀剂。 曝光设备（200）在光致抗蚀剂涂覆的晶片上投射预定图案。 在显影/固化复合设备（300）中进行用于显影具有预定图案的晶片和用于固化显影晶片的固化工艺的显影工艺。 晶片转移设备转移晶片，使得在涂覆设备，曝光设备和显影/固化复合设备中连续执行每个过程。

公开(公告)号：KR2019970052825U

公开(公告)日：1997-09-08

申请号：KR2019960002815

申请日：1996-02-24

Applicant: 삼성전자주식회사

Inventor： 김수헌

IPC: H01L21/304

Abstract: 본발명은웨이퍼세정장치의플로우미터에관해게시한다. 종래의플로우미터에는아무런장치가설치되어있지않고다만웨이퍼세정장치의중간탱크에화이버센서가설치되어있어서작업자는상기화이버센서에의하여웨이퍼세정장치의동작상태를확인하였다. 그래서웨이퍼세정액에에어가포함되어있을경우에는반도체장치의불량이발생하여반도체장치의수율저하를가져왔다. 그러나본 발명에의하면플로우미터에발광센서및 수광센서가설치되어있어서웨이퍼세정액내에포함되어있는에어를탐지할수가있다. 따라서웨이퍼세정액내에포함된에어에의하여발생할수 있는반도체장치의수율저하를방지할수 있다.

公开(公告)号：KR2019970051764U

公开(公告)日：1997-09-08

申请号：KR2019960003625

申请日：1996-02-29

Applicant: 삼성전자주식회사

Inventor： 김수헌

IPC: B65G49/07

Abstract: 본고안은웨이퍼이송장치의암에관한것으로, 본고안에따른웨이퍼이송장치의암은웨이퍼지지부를구비하고, 상기웨이퍼지지부의상면에서양측단부와중앙을포함하는적어도 3개의위치에소정의거리만큼이격되어부착된적어도 3개의웨이퍼지지수단과, 상기웨이퍼지지수단이상기웨이퍼지지부의상면으로부터상기소정의거리만큼이격될수 있도록상기웨이퍼지지부의상면에서상기웨이퍼지지수단의부착위치에해당하는위치에각각적어도 1개씩고정된복수개의심봉을포함한다. 본고안에의하면, 웨이퍼이송장치의암에서웨이퍼를지지하는웨이퍼지지부와웨이퍼와의마찰로인한파티클발생을억제할수 있다.

Abstract translation: 纸提案涉及晶片传送装置的臂，按照本文中的晶片传递设备的癌症是晶片支撑部分提供，并以预定的距离在至少三个位置间隔开，包括侧端部和中心在晶片支撑件的上表面上 附接的至少三个晶片支撑装置和所述晶片支承装置从晶片支撑件的上表面上的移相器的晶片被通过对应于所述由一个预定的每个中的至少1在从支持体的上表面对应于所述晶片支撑构件的安装位置的位置的距离间隔开 并包括多个固定的可疑棒。 在本文中，可以抑制由晶片传送装置的臂中支撑晶片的晶片支撑部分与晶片之间的摩擦引起的颗粒的产生。

公开(公告)号：KR1020030014842A

公开(公告)日：2003-02-20

申请号：KR1020010048725

申请日：2001-08-13

Applicant: 삼성전자주식회사

Inventor： 김수헌

IPC: H01L21/027

Abstract: PURPOSE: A bake apparatus of semiconductor fabrication equipment is provided to set a wafer on a proper position of a hot plate by using a guide sensor. CONSTITUTION: A process chamber(100) is used for performing a bake process. A hot plate(110) is installed within the process chamber(100) in order to perform the bake process by heating a wafer(130). A plurality of support pins(120) are installed on the hot plate(110) in order to load or unload the wafer(130) on the hot plate(110). A plurality of guide sensors(140) are installed on the hot plate(110) in order to guide the wafer(130) to a proper position. The guide sensors(140) are used as optical sensors. An insulating body(150) is installed on a contact portion between the hot plate(110) and the guide sensors(140) in order to protect the guide sensors(140) from the heat.

Abstract translation: 目的：提供半导体制造设备的烘烤设备，通过使用引导传感器将晶片设置在热板的适当位置。 构成：处理室（100）用于进行烘烤处理。 加热板（110）安装在处理室（100）内，以便通过加热晶片（130）进行烘烤处理。 多个支撑销（120）安装在热板（110）上，以便在热板（110）上装载或卸载晶片（130）。 多个引导传感器（140）安装在热板（110）上，以将晶片（130）引导到适当的位置。 引导传感器（140）用作光学传感器。 绝热体（150）安装在热板（110）和引导传感器（140）之间的接触部分上，以保护引导传感器（140）免受热量的影响。

公开(公告)号：KR1020020091370A

公开(公告)日：2002-12-06

申请号：KR1020010029956

申请日：2001-05-30

Applicant: 삼성전자주식회사

Inventor： 김수헌 ,  추상욱

IPC: H01L21/027

Abstract: PURPOSE: A flux control device of photo spinner equipment is provided to control a variation of injected chemicals by checking correctly a variation of flow rate in the photo spinner equipment. CONSTITUTION: A controller(50) outputs control signals for controlling valves, flow rates, and pressures. The first and the second pressure valves(60,62) are used for controlling the pressures. The first and the second pin flows(64,66) are used for outputting flow detection signals. The first and the second filters(68,70) are used for filtering deionized water. The first flow meter(72) is used for measuring the flow rate of the deionized water filtered by the first filter(68). A rinse nozzle(78) is used for injecting the deionized water. The first suck back valve(74) is used for sucking the remaining drops of the injected deionized water. A back rinse nozzle(80) is used for injecting the filtered deionized water. The second suck back valve(76) is used for sucking the remaining drops of the injected deionized water. A develop A and B(82,84) are used for storing develop solution. A bubble removal system(86) is used for removing bubbles from develop solution. The third pin flow(88) is used for outputting a flow detection signal of the develop solution. The third filter(90) is used for filtering the develop solution. The second flow meter(92) is used for measuring the flow rate of the develop solution. A develop nozzle(96) is used for injecting the develop solution. The third suck back valve(94) is used for sucking the remaining drops of the develop solution.

Abstract translation: 目的：提供光电旋转设备的磁通控制装置，以便通过正确检查光电转换设备中流速的变化来控制注入化学品的变化。 构成：控制器（50）输出用于控制阀门，流量和压力的控制信号。 第一和第二压力阀（60,62）用于控制压力。 第一和第二引脚流（64,66）用于输出流量检测信号。 第一和第二过滤器（68,70）用于过滤去离子水。 第一流量计（72）用于测量由第一过滤器（68）过滤的去离子水的流量。 冲洗喷嘴（78）用于注入去离子水。 第一吸回阀（74）用于吸入剩余的注入去离子水滴。 背面冲洗喷嘴（80）用于注入过滤的去离子水。 第二吸回阀（76）用于吸引剩余的注入去离子水滴。 开发A和B（82,84）用于存储开发解决方案。 气泡去除系统（86）用于从显影溶液中除去气泡。 第三针流（88）用于输出显影溶液的流量检测信号。 第三过滤器（90）用于过滤开发解决方案。 第二流量计（92）用于测量显影溶液的流速。 开发喷嘴（96）用于注入显影溶液。 第三吸回阀（94）用于吸取显影溶液的剩余液滴。