公开(公告)号：KR1020080060539A

公开(公告)日：2008-07-02

申请号：KR1020060134757

申请日：2006-12-27

Applicant: 삼성전자주식회사

Inventor： 임창수 ,  류주아 ,  문경록 ,  안요한 ,  이양구 ,  임숙희

IPC: H01L21/02

Abstract: An air filtering device and an air cleaning system of a semiconductor manufacturing line with the same are provided to maximize production yield by preventing the polluted air from being transferred between a duct and a frame of the filter. A predetermined pressure air is supplied into a main body of a duct(132). A filter media(146) having multiple holes filters contaminants included in the air by passing the air from the duct main body therethrough. A filter frame(144) surrounds edges of the filter media, and is coupled with the main body of the duct. A sealing member(142) seals a gap between the filter frame and the main body of the duct, so that air can not be transferred through the gap.

Abstract translation: 提供具有该空气过滤装置和半导体制造生产线的空气净化系统以通过防止污染的空气在管道和过滤器的框架之间传递来最大化生产产量。 预定的压力空气被供应到管道（132）的主体中。 具有多个孔的过滤介质（146）通过使来自导管主体的空气通过而对包含在空气中的污染物进行过滤。 过滤器框架（144）围绕过滤介质的边缘并且与管道的主体联接。 密封构件（142）密封过滤器框架和管道主体之间的间隙，使得空气不能通过间隙传递。

公开(公告)号：KR100830586B1

公开(公告)日：2008-05-21

申请号：KR1020060126452

申请日：2006-12-12

Applicant: 삼성전자주식회사

Inventor： 류주아 ,  임창수 ,  안요한 ,  최형석 ,  문경록

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/7085

Abstract: An apparatus and a method of exposing a substrate are provided to grasp properties of fluid using various measuring devices by simultaneously providing a small amount of fluid and a large amount of fluid according to properties of the measuring devices. An apparatus of exposing a substrate includes a light source, an illumination optical system, a projection optical system, and an immersion lithography unit. The light source emits light. The illumination optical system emits the light from the light source toward a reticle loaded on a reticle stage. The projection optical system irradiates the light from the reticle toward the substrate loaded on a substrate stage. The immersion lithography unit provides liquid to an optical path between the projection optical system and the substrate. The immersion lithography unit includes a vessel filled with the liquid, a supply line supplying the liquid to the vessel, a first drain line draining the liquid in the vessel, and a monitoring unit(100) having at least one or more measuring portions measuring properties of the liquid flowing through the first drain line.

Abstract translation: 提供一种暴露基板的装置和方法，以根据测量装置的特性同时提供少量的流体和大量的流体，利用各种测量装置来掌握流体的性质。 曝光基板的装置包括光源，照明光学系统，投影光学系统和浸没光刻单元。 光源发光。 照明光学系统将来自光源的光发射到装载在标线片台上的掩模版。 投影光学系统将来自掩模版的光照射到负载在基板台上的基板。 浸没光刻单元向投影光学系统和基板之间的光路提供液体。 浸没光刻单元包括填充有液体的容器，向容器供应液体的供应管线，排出容器中的液体的第一排水管线以及具有至少一个或多个测量部件的测量部件的监测单元（100） 流过第一排水管线的液体。

公开(公告)号：KR1020070115471A

公开(公告)日：2007-12-06

申请号：KR1020060049967

申请日：2006-06-02

Applicant: 삼성전자주식회사

Inventor： 문경록 ,  최형석 ,  안요한 ,  윤태식 ,  류주아

IPC: H01L21/02

CPC classification number: B01D25/02 ,  B01D2201/56 ,  H01L21/02

Abstract: A filter interface module is provided to restrain a FOUP(Front-Opening-Unified-Pod) leak and to secure reliability of a FOUP inner contamination monitoring by using the filter and a groove for air tight. In a filter interface module combined with a filter(100). A ring-shaped body has a space to which air in the wafer storing apparatus passes via the filter. A groove(230) is formed on the body to implement an air-tight coupling with the filter. A part of the filter is inserted into the groove. The filter is provided with a vertical wall(110) contacting to an upper surface of the body.

Abstract translation: 提供了一个过滤器接口模块，用于限制FOUP（Front-Opening-Uni​​fied-Pod）泄漏，并通过使用过滤器和一个用于气密的槽来确保FOUP内部污染监测的可靠性。 在与过滤器（100）组合的过滤器接口模块中。 环状体具有通过过滤器通过晶片储存装置中的空气的空间。 在主体上形成有一个凹槽（230），以实现与过滤器的气密耦合。 过滤器的一部分插入槽中。 过滤器设置有与主体的上表面接触的垂直壁（110）。