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公开(公告)号：KR101867364B1
公开(公告)日：2018-06-15
申请号：KR1020120000357
申请日：2012-01-03
Applicant: 삼성전자주식회사
IPC: H01L21/02
CPC classification number: H01L21/67017 , C23C16/455 , C23C16/45563 , C23C16/45568 , C23C16/45578 , C23C16/45587 , H01L21/67109
Abstract: 배치타입반도체장치는, 원통형로 형상을갖는튜브가구비된다. 복수의기판이적재되는보트가구비된다. 통형상을갖고내부에반응가스가유입되는홀을포함하고, 하단부위인제1 부분과상단부위인제2 부분을포함하는가스노즐이구비된다. 상기가스노즐의제1 부분이삽입구내부로삽입하여결합되고, 금속합금재질로이루어지는체결부재가구비된다. 상기체결부재의하부면및 상기가스노즐의홀 부위를통과하여연장되는가스이송파이프가구비된다. 상기튜브의하단부에는가스이송파이프의수평연장부와결합하여상기가스노즐을상기튜브에장착하는장착부재가구비된다. 상기배치타입반도체장치는가스노즐의취급및 교체가용이하다.
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Patent Agency Ranking
公开(公告)号：KR1020170034984A
公开(公告)日：2017-03-30
申请号：KR1020150133111
申请日：2015-09-21
Applicant: 삼성전자주식회사
IPC: H01L21/02 , H01L21/677 , H01L21/673 , H01L21/324
CPC classification number: C23C16/44 , H01L21/0242 , H01L21/02532 , H01L27/11582
Abstract: 본발명은더미웨이퍼, 박막형성방법, 및반도체소자의제조방법에관한것으로, 서로대향하는제1 면제2 면을갖는절연성기판및 상기제1면으로부터상기제2 면을향하여상기절연성기판의적어도일부를관통하는복수개의개구부들을포함하고, 상기제1 및제2 면들과, 상기복수개의개구부들각각의내면에는돌기들이형성된더미웨이퍼가제공된다.
Abstract translation: 本发明至少朝向从虚设晶片，薄膜形成方法的第二表面的绝缘衬底的一部分，和一个制造方法是，在绝缘基板和第一表面具有在半导体元件上的第一免除第二表面彼此相对 以及具有分别形成在第一和第二表面以及多个开口的内表面上的突起的伪晶片。
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公开(公告)号：KR1020130079710A
公开(公告)日：2013-07-11
申请号：KR1020120000357
申请日：2012-01-03
Applicant: 삼성전자주식회사
IPC: H01L21/02
CPC classification number: H01L21/67017 , C23C16/455 , C23C16/45563 , C23C16/45568 , C23C16/45578 , C23C16/45587 , H01L21/67109
Abstract: PURPOSE: A batch type semiconductor device is provided to easily mount a gas nozzle by combining a coupling member and a transfer pipe with the gas nozzle. CONSTITUTION: A tube (102) has the shape of a cylindrical furnace. A boat (104) loads a plurality of substrates. A gas nozzle (110) is vertically arranged in the tube and provides gases to the substrates. A coupling member (114) is made of a metal alloy material whose intensity is higher than the intensity of the gas nozzle. A gas transfer pipe (112) provides reactive gases from the outside to the gas nozzle. A mounting member (116) mounts the gas nozzle inside the tube.
Abstract translation: 目的：提供一种批量型半导体器件，通过将耦合部件和传输管与气体喷嘴组合来容易地安装气体喷嘴。 构成：管（102）具有圆柱形炉的形状。 船（104）装载多个基板。 气体喷嘴（110）垂直地布置在管中并且向衬底提供气体。 联接构件（114）由其强度高于气体喷嘴的强度的金属合金材料制成。 气体输送管（112）从外部向气体喷嘴提供反应性气体。 安装构件（116）将气体喷嘴安装在管内。
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公开(公告)号：KR1020170023229A
公开(公告)日：2017-03-03
申请号：KR1020150116482
申请日：2015-08-19
Applicant: 삼성전자주식회사
IPC: H01L21/314 , H01L21/67 , H01L21/673 , H01L21/02
CPC classification number: C23C16/45574 , C23C16/045 , C23C16/45546 , C23C16/45578 , H01L28/00
Abstract: 본발명의일 실시예에따른박막증착장치는, 공정챔버, 상기공정챔버내에배치되며복수개의기판들이적재되는보트, 및상기공정챔버내에상기기판들상에박막을형성하기위한소스가스들을공급하며, 복수개의 T자형(T-type)의노즐파이프들을포함하는노즐부를포함한다. 여기서, 각각의상기 T자형의노즐파이프는양쪽말단이막힌제1 파이프와상기제1 파이프의중간부분에결합되는제2 파이프로구성될수 있다.
Abstract translation: 一种薄膜沉积设备，包括处理室; 在处理室中的船，其中容纳多个基板的船; 以及喷嘴，用于将源气体供应到处理室以在每个基板上形成薄膜，喷嘴包括多个T形喷嘴管，每个T形喷嘴管包括具有封闭端的第一管 以及联接到所述第一管的中间部分的第二管。
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公开(公告)号：KR1020140111731A
公开(公告)日：2014-09-22
申请号：KR1020130025927
申请日：2013-03-12
Applicant: 삼성전자주식회사
IPC: H01L21/205
CPC classification number: H01L21/67109 , C23C16/4405 , C23C16/4408 , C23C16/4409 , C23C16/54
Abstract: An apparatus for processing a wafer includes a reaction tube extended in a vertical direction; a door plate which loads a boat which supports a plurality of wafers in the reaction tube, is arranged in the lower part of the reaction tube, and encapsulates the reaction tube; a cap plate which is arranged on the door plate and has a cylindrical body part surrounding the lower side of the boat and having a guiding groove formed on the outside surface in a circumferential direction, at least one nozzle which is formed in the lower part of the reaction tube and injects a gas into the reaction tube, and an exhaust part which discharges the gas of the reaction tube to the outside through the guiding groove formed in the body part.
Abstract translation: 一种用于处理晶片的装置包括在垂直方向上延伸的反应管; 装载在反应管中支撑多个晶片的舟皿的门板设置在反应管的下部，并封装反应管; 盖板，其布置在所述门板上，并且具有围绕所述船的下侧的圆筒体部，并且具有沿圆周方向形成在所述外表面上的引导槽，至少一个喷嘴，形成在所述船体的下部 反应管并将气体注入到反应管中，以及通过形成在主体部分中的引导槽将反应管的气体排出到外部的排气部。
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