公开(公告)号：KR3008892000000S

公开(公告)日：2017-01-06

申请号：KR3020160033888

申请日：2016-07-12

Applicant: 삼성전자주식회사

Designer： 이헌우 ,  김한나 ,  이윤호

公开(公告)号：KR3008892020000S

公开(公告)日：2017-01-06

申请号：KR3020160033890

申请日：2016-07-12

Applicant: 삼성전자주식회사

Designer： 이헌우 ,  김한나 ,  정재민

公开(公告)号：KR100520238B1

公开(公告)日：2005-10-12

申请号：KR1019990007979

申请日：1999-01-14

Applicant: 삼성전자주식회사

Inventor： 이헌우 ,  서정문

IPC: H01L21/304

Abstract: 본 발명은 오버플로우(overflow) 방식의 기존 세정조의 하측면에 별도의 배수관을 연통하여 설치하고 그 배수관에 유량 절수 조절용 에어밸브를 추가로 설치한 세정장치를 개시한다.
따라서, 본 발명은 웨이퍼가 세정조 내의 순수에 의해 세정시간을 초과하여 정체되는 경우, 세정조의 하측 저면으로부터 상향 공급되는 순수를 차단하고 세정조의 하측면에 추가로 설치된 유량 절수 조절용 에어밸브를 절수상태에서 개방상태로 전환하여 세정조 내에서 순수가 자유 낙하하여 저속으로 배수한다. 그 결과, 웨이퍼에 형성된 금속층이 세정된 후 그 위에 다른 금속층이 적층되더라도 금속층에 보이드 발생과 같은 불량현상을 억제하여 반도체장치의 제품 신뢰성을 향상 가능하다.

公开(公告)号：KR1020030003552A

公开(公告)日：2003-01-10

申请号：KR1020010039458

申请日：2001-07-03

Applicant: 삼성전자주식회사

Inventor： 이헌우

IPC: H01L21/3063

Abstract: PURPOSE: A wet etch apparatus for fabricating a semiconductor wafer is provided to remove a loss of a pump by forming an absorbing body and an absorbing fixing guide with one body. CONSTITUTION: A wet etch apparatus(10) is formed with a chemical tank(20), a supply tube(30), a supplement tube(40), a pump(100), and a chemical vessel(50). The chemical tank(20) is used for storing chemicals supplied from a chemical supply room. The supply tube(30) is used for connecting the chemical tank(20) with the chemical vessel(50). The chemicals of the chemical tank(20) are supplied to the chemical vessel(50) through the supply tube(30) according to a programmed time schedule of a control device. The pump(100) is located on a path of the supplement tube(40) in order to supplement the chemicals into the chemical vessel(50) and control density of the chemical vessel(50).

Abstract translation: 目的：提供一种用于制造半导体晶片的湿蚀刻装置，通过形成具有一体的吸收体和吸收固定引导件来消除泵的损耗。 构成：湿式蚀刻装置（10）形成有化学罐（20），供应管（30），补充管（40），泵（100）和化学容器（50）。 化学罐（20）用于储存从化学品供应室供应的化学品。 供应管（30）用于将化学罐（20）与化学容器（50）连接。 根据控制装置的编程时间表，化学罐（20）的化学品通过供应管（30）供应到化学容器（50）。 泵（100）位于补充管（40）的路径上，以便将化学品补充到化学容器（50）中并控制化学容器（50）的密度。

公开(公告)号：KR1020020093248A

公开(公告)日：2002-12-16

申请号：KR1020010031709

申请日：2001-06-07

Applicant: 삼성전자주식회사

Inventor： 홍동관 ,  강능석 ,  강원규 ,  이헌우

IPC: H01L21/304

Abstract: PURPOSE: A wafer drier using a marangoni effect is provided to prevent outside air from being introduced into a drying room, by preventing a gap between the drying room and a cleaning bath or by minimizing the gap. CONSTITUTION: A wafer is cleaned in the cleaning bath(40). Isopropyl alcohol(IPA) vapor is sprayed in the drying room(42) to dry the wafer cleaned in the cleaning bath. A drying room transfer unit transfers the drying room over the cleaning bath. The drying room transfer unit is a robot(48) including a driving unit for vertically transferring the drying room.

Abstract translation: 目的：提供使用马兰戈尼效应的晶片干燥器，通过防止干燥室和清洗槽之间的间隙或通过使间隙最小化来防止外部空气被引入干燥室。 构成：在清洗槽（40）中清洁一个晶片。 将异丙醇（IPA）蒸气喷雾在干燥室（42）中以干燥在清洗浴中清洗的晶片。 干燥室转移单元将干燥室转移到清洁浴室上。 干燥室传送单元是包括用于垂直传送干燥室的驱动单元的机器人（48）。

公开(公告)号：KR3008892010000S

公开(公告)日：2017-01-06

申请号：KR3020160033889

申请日：2016-07-12

Applicant: 삼성전자주식회사

Designer： 이헌우 ,  김한나 ,  이윤호

公开(公告)号：KR1020000059672A

公开(公告)日：2000-10-05

申请号：KR1019990007454

申请日：1999-03-06

Applicant: 삼성전자주식회사

Inventor： 이헌우 ,  김경수

IPC: H01L21/304

Abstract: PURPOSE: An apparatus for storing a chemical is to facilely indicate a level of the chemical stored in a vessel, thereby facilely confirming the remaining amount of the chemical. CONSTITUTION: An apparatus for storing a chemical used in a semiconductor fabricating process comprises a semitransparent vessel(12) for storing the chemical, an injecting tube(14) mounted at an upper portion of the vessel to inject the chemical in the vessel, a level mark(18) displayed on the vessel to confirm an amount of the chemical remained in the vessel, and a displaying member disposed in the vessel to display the remaining amount of the chemical using a flotage thereof. In the apparatus, the displaying member is a buoy(20) which is made of a fluoric resin and has a color and in which air is injected.

Abstract translation: 目的：一种用于储存化学物质的设备是为了便于表示存储在容器中的化学物质的水平，从而便利地确认化学物质的剩余量。 构成：用于存储半导体制造工艺中使用的化学品的设备包括用于存储化学品的半透明容器（12），安装在容器上部以将化学品注入容器中的注入管（14），水平 标记（18），以确认容器中残留的化学物质的量;以及显示部件，其设置在容器中，以显示使用其漂白物的化学品的剩余量。 在该装置中，显示构件是由氟树脂制成并具有颜色并且注入空气的浮标（20）。

公开(公告)号：KR1020070000058A

公开(公告)日：2007-01-02

申请号：KR1020050055484

申请日：2005-06-27

Applicant: 삼성전자주식회사

Inventor： 이헌우 ,  강능석

IPC: H01L21/304 ,  H01L21/02

Abstract: A chemical circulation system is provided to control the amount of chemicals to be circulated by controlling air pressure supplied to a chemical circulation pump. A chemical bath(130) is used for storing chemicals. A heating unit(124) is used for maintaining constantly the temperature of the chemicals supplied to the chemical bath. A chemical filter(126) is used for filtering impurities of the chemicals. A chemical circulation pump(128) is used for controlling the amount of chemicals according to a position of a wafer transferred to the chemical bath. An air supply unit(150) controls the air pressure applied to the chemical circulation pump in order to control the amount of chemicals to be circulated.

Abstract translation: 提供化学循环系统，通过控制提供给化学循环泵的空气压力来控制待循环的化学物质的量。 化学浴（130）用于储存化学品。 加热单元（124）用于不断地保持供给化学浴液的化学品的温度。 化学过滤器（126）用于过滤化学品的杂质。 化学循环泵（128）用于根据转移到化学浴池的晶片的位置来控制化学品的量。 空气供应单元（150）控制施加到化学循环泵的空气压力以控制待循环的化学品的量。

公开(公告)号：KR1020020071565A

公开(公告)日：2002-09-13

申请号：KR1020010011669

申请日：2001-03-07

Applicant: 삼성전자주식회사

Inventor： 이헌우

IPC: H01L21/304

Abstract: PURPOSE: An apparatus for preventing the malfunction of wafer detection of a semiconductor manufacturing equipment is provided to prevent the malfunction of a fiber sensor by restraining an overflow of a deionized water to the fiber sensor through waterspouts. CONSTITUTION: A mal-function preventing apparatus comprises a wet station deionized water bath(10) for removing particles through an injection of a deionized water or a chemical and for exhausting a contaminated water, quartz caps for fixing fiber sensors installed on the outer portions of the wet station deionized water bath(10) and waterspouts(30a,30b) for preventing an overflowed deionized water from the wet station deionized water bath(10) to the quartz caps. At this point, the waterspouts(30a,30b) are installed on portions having a higher position than the quartz caps.

Abstract translation: 目的：提供一种用于防止半导体制造设备的晶片检测的故障的装置，以通过抑制去离子水通过水流喷射到纤维传感器而防止纤维传感器的故障。 构成：防止功能的装置包括湿站去离子水浴（10），用于通过注入去离子水或化学品去除颗粒并排出污染水，用于固定安装在外部的纤维传感器的石英盖 湿站去离子水浴（10）和排水口（30a，30b），用于防止从湿站去离子水浴（10）到石英盖的溢出的去离子水。 此时，水槽（30a，30b）安装在比石英盖更高位置的部分上。

公开(公告)号：KR1020000052270A

公开(公告)日：2000-08-16

申请号：KR1019990007979

申请日：1999-01-14

Applicant: 삼성전자주식회사

Inventor： 이헌우 ,  서정문

IPC: H01L21/304

Abstract: PURPOSE: An apparatus for cleaning a wafer is provided to improve reliability of a semiconductor device by controlling a defect like a void on a metal layer even though another metal layer is stacked after cleaning the metal layer formed on a wafer. CONSTITUTION: An apparatus for cleaning a wafer comprises an overflow-type cleaning tank(11) for cleaning the wafer, a deionized water supplying pipe(22) connected to a bottom of the cleaning tank, an exhaust valve for rapid exhaust and an exhaust valve for slow exhaust. The exhaust valve for rapid exhaust is established in a first exhaust pipe connected to the bottom of the cleaning tank. The exhaust valve for slow exhaust is established in another part of the bottom of the cleaning tank to control deionized water remaining on the wafer when the wafer is cleaned in the cleaning tank longer than a cleaning time.

Abstract translation: 目的：提供一种用于清洁晶片的装置，以便即使在清洁形成在晶片上的金属层之后堆叠另一金属层，也可以通过控制诸如金属层上的空隙的缺陷来提高半导体器件的可靠性。 构成：用于清洁晶片的装置包括用于清洁晶片的溢流式清洗槽（11），连接到清洗槽底部的去离子水供给管（22），用于快速排气的排气阀和排气阀 为慢排气。 用于快速排气的排气阀建立在连接到清洗槽底部的第一排气管中。 在清洗槽的底部的另一部分建立用于缓慢排气的排气阀，以便当清洗槽中的清洁时间超过清洁时间时，控制残留在晶片上的去离子水。