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公开(公告)号：KR101776640B1
公开(公告)日：2017-09-08
申请号：KR1020140076271
申请日：2014-06-23
Applicant: 삼성전자주식회사
CPC classification number: H04M3/42042 , H04M1/575 , H04M3/42382 , H04M3/436 , H04M2203/655 , H04W4/16
Abstract: 본발명의다양한실시예들은제1 전자장치에서제2 전자장치에대한식별정보를표시하는방법에관한것으로, 상기제2 전자장치로부터호 또는메시지를수신하는동작; 상기제2 전자장치에대한식별정보를서버에게요청하는동작; 상기서버로부터상기요청한식별정보를수신하는동작; 및상기수신한식별정보를디스플레이에표시하는동작을포함하고, 상기식별정보는상기제1 전자장치에대한관계정보를포함하는것을특징으로할 수있다. 이외에도, 명세서를통해파악될수 있는다른실시예들이가능하다.
Abstract translation: 本发明的各种实施例涉及一种显示第一电子设备中的第二电子设备的标识信息的方法，所述方法包括：从第二电子设备接收呼叫或消息; 向服务器请求第二电子设备的标识信息; 从服务器接收所请求的标识信息; 并且在显示器上显示接收到的标识信息，其中标识信息包括第一电子设备的关系信息。 另外，可以通过说明书理解其他实施例。
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公开(公告)号：KR1020080048586A
公开(公告)日：2008-06-03
申请号：KR1020060118735
申请日：2006-11-29
IPC: H04B7/14
CPC classification number: H04W84/18 , H04W72/0406 , H04W72/0453
Abstract: An apparatus and a method for allocating a sub channel in a broadband wireless communication system using a multi hop relay method are provided to enable a base station to transmit data to a terminal through one or two hops according to a channel state of each link, thereby increasing a sum rate of the broadband wireless communication system. In a base station apparatus of a broadband wireless communication system using multi hop relay method, the base station comprises the followings. A resource allocating unit(307) allocates resources of data to be transmitted to a terminal through one hop and data to be transmitted through two hops by using channel information of a base station and terminal link, a base station and relay station link, and a relay station and terminal link. A resource mapping unit(305) maps the resources to the data to be transmitted through one hop and data to be transmitted through two hops according to resource allocation information. A transmitter(313) transmits the data mapped with the resources. An encoder(301) encodes data, which are supposed to be transmitted to a terminal or a base station, according to a predetermined encoding rate, and outputs the encoded data.
Abstract translation: 提供一种使用多跳中继方法在宽带无线通信系统中分配子信道的装置和方法，以使得基站能够根据每个链路的信道状态通过一跳或两跳向一个终端发送数据，由此 增加宽带无线通信系统的总和速率。 在使用多跳中继方式的宽带无线通信系统的基站装置中，基站包括以下步骤。 资源分配单元（307）通过使用基站和终端链路的信道信息，基站和中继站链路，通过一跳分配要发送到终端的数据的资源和要通过两跳发送的数据，以及 中继站和终端链路。 资源映射部（305）根据资源分配信息将资源映射到要通过一跳发送的数据和通过两跳发送的数据。 发送器（313）发送用资源映射的数据。 编码器（301）根据预定的编码速率对应该发送给终端或基站的数据进行编码，并输出编码数据。
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公开(公告)号：KR100342479B1
公开(公告)日：2002-06-28
申请号：KR1019990062710
申请日：1999-12-27
Applicant: 삼성전자주식회사
IPC: G02B6/00
Abstract: 본발명은고 열팽창계수의기판을사용한폴리머광학소자에관한것으로서, 개시된폴리머광학소자는기판과, 상기기판상에코팅되는폴리머로구성되는폴리머광학소자에있어서, 15×10/℃이상의열팽창계수를갖는스테인레스재질의기판; 및 30×10/℃이상의열팽창계수를가지며, 상기스테인레스재질의기판상에코팅되는폴리머로구성되어열팽창계수차로인한응력생성을최소화한다.
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公开(公告)号：KR100330595B1
公开(公告)日：2002-03-29
申请号：KR1019990013807
申请日：1999-04-19
Applicant: 삼성전자주식회사
CPC classification number: G02B6/138 , C08G73/10 , C08G73/1039 , C08G73/1042 , G02B1/046 , G02B1/048 , Y10T428/23 , Y10T428/24942 , C08L79/08
Abstract: 본발명은폴리머로이루어진코아와, 상기코아와인접되어있으며, 상기코아형성용폴리머의굴절율보다 0.25 내지 2.0% 작은굴절율을갖는폴리머로이루어진클래드를포함하며, 상기코아와클래드형성용폴리머가화학식 1로표시되는코폴리머중에서선택되는것을특징으로하는광도파로를제공한다. 상기식중, X는이고, Y는이고, n은몰분율로서, 0.05≤n
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Patent Agency Ranking
公开(公告)号：KR100322128B1
公开(公告)日：2002-02-04
申请号：KR1019990001263
申请日：1999-01-18
Applicant: 삼성전자주식회사
Abstract: 본발명은광도파로의클래드, 코아를구성하는폴리머박막의온도를직접조절하면서그에따른열광학계수를측정하는장치에관한것으로, 이러한폴리머박막의열광학계수측정장치는중심부에관통공과일측의중심라인에요홈을구비하고, 상기폴리머박막에열을전도하는열전도판; 상기열전도판의타측에부착하여상기열전도판에열을가열하는열전자소자; 상기열전도판의요홈에부착되어상기열전도판에의해가열된폴리머박막의온도를측정하는온도측정소자; 상기온도측정소자에의해측정된온도를입력받아상기열전자소자의온도를조절하는온도조절기; 및상기열전도판의관통공을통해프리즘과상기폴리머박막을밀착시켜상기폴리머박막의굴절율을측정하는프리즘커플러를포함함을특징으로한다. 본발명에의하면, 실제소자에사용되는폴리머박막의온도를직접조절하면서그에따른굴절율을동시에측정함으로써박막의실제온도에대한폴리머박막의열광학계수를정확하게구할수 있다. 또한폴리머박막교체가용이하여빠른시간내에반복해서여러샘플의열광학특성을분석할수 있다.
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公开(公告)号：KR100277359B1
公开(公告)日：2001-01-15
申请号：KR1019980025907
申请日：1998-06-30
Applicant: 삼성전자주식회사
Abstract: 본 발명은 광 도파로의 코아 형성 장치 및 이를 이용한 평면 광 도파로 제작 방법에 관한 것으로, 광 도파로의 코아 형성 장치는 기판 위에 형성된 하부 클래드가 장착되는 스테이지; 하부 클래드위에 코아를 형성하도록 소정 물질을 주사하는 노즐; 노즐에 코아 형성 물질을 공급하는 코아물질 공급부; 및 하부 클래드상의 소정 위치에 소정 크기의 코아를 형성하도록 스테이지, 노즐 및 코아물질 공급부에 각각 해당 제어신호를 발생하는 제어부를 포함한다.
본 발명에 의하면, 하부 클래드층 형성, 코아형성물질의 주사에 의한 코아 패턴 형성 및 상부 클래드 형성이라는 단순한 공정으로 평면 광 도파로를 형성함으로써, 포토 마스크를 제작하기위한 제반 공정, 식각 마스크 형성 및 광 도파로 식각, 잔류 마스크 식각 등과 같은 별도의 제작 공정이 필요없다.-
公开(公告)号：KR1020000067244A
公开(公告)日：2000-11-15
申请号：KR1019990014881
申请日：1999-04-26
Applicant: 삼성전자주식회사
Abstract: PURPOSE: An apparatus for forming a polymer layer removing an edge build-up is provided to remove an edge build-up generated when forming a polymer layer by using a simple physical method. CONSTITUTION: An apparatus for forming a polymer layer removing an edge build-up comprises a rotation portion(308) for rotating a wafer. The apparatus further comprises an edge build-up removal portion(310) for removing a polymer layer formed on the wafer. The edge build-up removal portion is fixed on the wafer and it is rotated by the rotation portion when removing the edge build-up. The edge build-up is removed by rotating the edge build-up removal portion.
Abstract translation: 目的：提供一种用于形成除去边缘积聚物的聚合物层的装置，以通过使用简单的物理方法去除形成聚合物层时产生的边缘积聚。 构成：用于形成除去边缘积聚物的聚合物层的装置包括用于旋转晶片的旋转部分（308）。 该装置还包括用于去除形成在晶片上的聚合物层的边缘积聚去除部分（310）。 边缘积聚去除部分固定在晶片上，并且当去除边缘积聚时，边缘积聚去除部分被旋转部分旋转。 通过旋转边缘积聚去除部分去除边缘积聚。
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公开(公告)号：KR1020000066586A
公开(公告)日：2000-11-15
申请号：KR1019990013807
申请日：1999-04-19
Applicant: 삼성전자주식회사
CPC classification number: G02B6/138 , C08G73/10 , C08G73/1039 , C08G73/1042 , G02B1/046 , G02B1/048 , Y10T428/23 , Y10T428/24942 , C08L79/08
Abstract: PURPOSE: An optical waveguide is provided to increase a refractive index difference between a core and a clad by using a polyimide for controlling the refraction index. CONSTITUTION: An optical waveguide comprises a core and a clad. The core is formed with a polymer. The core is adjacent to the clad. The clad is formed with a polymer less than a refraction index of the polymer for forming the core. A polyimide is used for controlling the refraction index. The difference range of the refraction index between the core and the clad of an optical waveguide element is controlled within 0.25% to 2.0% when the polyimide is used for controlling the refraction index.
Abstract translation: 目的：提供光波导以通过使用聚酰亚胺来控制折射率来增加芯和包层之间的折射率差。 构成：光波导包括芯和包层。 芯由聚合物形成。 核心与包层相邻。 包层由形成芯的聚合物的聚合物的折射率小于聚合物的聚合物形成。 聚酰亚胺用于控制折射率。 当聚酰亚胺用于控制折射率时，光波导元件的芯和包层之间的折射率的差异范围被控制在0.25％至2.0％之内。
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公开(公告)号：KR1020000009253A
公开(公告)日：2000-02-15
申请号：KR1019980029529
申请日：1998-07-22
Applicant: 삼성전자주식회사
IPC: C08J7/04
Abstract: PURPOSE: A process for controlling the thickness of polyimide film without changing the content of polyimide precursor is provided which makes it possible to control the thickness of thin film of core layer without difficulty and form multi-layer film. CONSTITUTION: The process comprises a)the heat treatment process of polyimide precursor composition comprising polyamic acid and solvent at 50-100°C for 5-13 hr, b)the amidation process of the polyimide precursor composition after coating it on a base plate and drying at 50-400°C. For an example 17.2g polyamic acid is added with 57.35g N,N-dimethylacetate and heat-treated. The heat-treated polyamic acid composition is spin-coated on a silicone substrate, and the silicone base plate is heated to 350°C by stages to form a polyimide film. As time goes by, the viscosity of polyamic acid composition decreases gradually, i.e., the viscosity is 400,000 cps after 1 hr, but it falls to 13,000 cps after 11 hr.
Abstract translation: 目的：提供一种控制聚酰亚胺膜的厚度而不改变聚酰亚胺前体的含量的方法，这使得可以无困难地控制芯层薄膜的厚度并形成多层膜。 方法：该方法包括a）在50-100℃下聚酰亚胺前体组合物包含聚酰胺酸和溶剂5-13小时的热处理工艺，b）聚酰亚胺前体组合物在基板上涂覆之后的酰胺化过程， 在50-400℃下干燥。 实施例17.2g聚酰胺酸加入57.35g N，N-二甲基乙酸酯并进行热处理。 将热处理的聚酰胺酸组合物旋涂在硅树脂基材上，将硅基底板分阶段加热至350℃，形成聚酰亚胺薄膜。 随着时间的推移，聚酰胺酸组合物的粘度逐渐降低，即1小时后粘度为400,000cps，11小时后降至13,000cps。
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