公开(公告)号：KR1020080049160A

公开(公告)日：2008-06-04

申请号：KR1020060119419

申请日：2006-11-30

Applicant: 삼성전자주식회사

Inventor： 박제권 ,  임영규 ,  고재균 ,  이규 ,  장혜림

IPC: H01L21/027 ,  H01L21/66

CPC classification number: G03F7/7065 ,  H01L21/67288 ,  H01L22/12

Abstract: An inspection method and an inspection apparatus are provided to detect simultaneously a light beam having an ultraviolet wavelength band and a light beam having an extreme ultraviolet wavelength band. A light irradiation process is performed to irradiate light having continuous wavelength bands onto an inspection target(10). A light separation process is performed to separate selectively light beams having different wavelength bands from the light reflected on the inspection target. A detection process is performed to detect the light beams. The light beam having the ultraviolet wavelength band and the light beam having an extreme ultraviolet wavelength band are separated from the light reflected on the inspection target.

Abstract translation: 提供一种检查方法和检查装置，以同时检测具有紫外线波长带的光束和具有极紫外波长带的光束。 执行光照射处理以将具有连续波段的光照射到检查目标（10）上。 进行光分离处理，以从具有在检查对象上反射的光分离出具有不同波长带的光束。 执行检测处理以检测光束。 具有紫外线波长带的光束和具有极紫外波长带的光束与在检查对象物上反射的光分离。