公开(公告)号：KR1020110084644A

公开(公告)日：2011-07-26

申请号：KR1020100004301

申请日：2010-01-18

Applicant: 삼성전자주식회사

Inventor： 정호일 ,  조현수 ,  강태우 ,  임은광

IPC: H01L21/687 ,  H01L21/205

CPC classification number: H01L21/68785 ,  H01L21/67017 ,  H01L21/68764

Abstract: PURPOSE: A susceptor and a chemical vapor deposition device with the same are provided to stably and effectively rotate a receiving object in which a deposited object is mounted using energy generated by a gas flow, thereby uniformly growing a thin film on the deposited object. CONSTITUTION: A rotating object(32) rotates by a rotating shaft connected to a driving device. A receiving groove is placed on the rotating object and is opened upward. A gas flowing path(35) is placed along with the inside of the rotating object so that the gas flowing path is located in the lower part of the receiving groove. A driving gas moves into the receiving groove through the bottom surface of the receiving groove. A driving gas supply path is placed in the rotating shaft. A satellite(50) comprises a disc and a plurality of driving grooves. The driving groove is formed along with the main circumference from the bottom surface of the disc.

Abstract translation: 目的：提供一种感受器和具有该感受器和化学气相沉积装置的化学气相沉积装置，以便使用由气流产生的能量来稳定和有效地旋转其中安装沉积物体的接收物体，从而在沉积物体上均匀生长薄膜。 构成：旋转物体（32）通过连接到驱动装置的旋转轴旋转。 接收槽放置在旋转物体上并向上打开。 气体流动路径（35）与旋转物体的内部一起放置，使得气体流动路径位于接收槽的下部。 驱动气体通过容纳槽的底面移动到接​​收槽中。 驱动气体供给路径被放置在旋转轴中。 卫星（50）包括盘和多个驱动槽。 驱动槽与盘的底面一起形成有主圆周。

公开(公告)号：KR1020100082479A

公开(公告)日：2010-07-19

申请号：KR1020090001806

申请日：2009-01-09

Applicant: 삼성전자주식회사

Inventor： 유상덕 ,  정호일 ,  이철규 ,  장성환 ,  이원신

IPC: H01L33/06 ,  H01L33/32

CPC classification number: H01L33/32 ,  H01L33/06

Abstract: PURPOSE: A nitride-based semiconductor light emitting device is provided to improve optical efficiency by simultaneously securing the crystallinity of an active layer and increasing the mobility of holes. CONSTITUTION: A buffer layer(20) is formed on a substrate(10). An n-type nitride layer(30) is formed on the buffer layer. An active layer(40) is formed on the n-type nitride layer. A p-type nitride layer(50) is formed on the active layer. A transparent electrode(52) which is composed of an indium-tin oxide is formed on the p-type nitride layer. A p-type electrode(55) is formed on the transparent electrode.

Abstract translation: 目的：提供一种氮化物基半导体发光器件，以通过同时确保有源层的结晶度并增加空穴的迁移率来提高光学效率。 构成：在衬底（10）上形成缓冲层（20）。 在缓冲层上形成n型氮化物层（30）。 在n型氮化物层上形成有源层（40）。 在有源层上形成p型氮化物层（50）。 在p型氮化物层上形成由氧化铟锡构成的透明电极（52）。 在透明电极上形成p型电极（55）。

公开(公告)号：KR101549811B1

公开(公告)日：2015-09-04

申请号：KR1020090001806

申请日：2009-01-09

Applicant: 삼성전자주식회사

Inventor： 유상덕 ,  정호일 ,  이철규 ,  장성환 ,  이원신

IPC: H01L33/06 ,  H01L33/32

CPC classification number: H01L33/32 ,  H01L33/06

Abstract: 질화물반도체발광소자가개시된다. n형질화물층과 p형질화물층사이에형성되는활성층을포함하는질화물반도체발광소자로서, 활성층은교대로형성되는복수의양자우물층및 양자장벽층을포함하며, 복수의양자장벽층중, p형질화물층에인접하여형성되는양자장벽층은, 나머지양자장벽층보다얇은것을특징으로하는질화물반도체발광소자는, 활성층의결정성을확보함과동시에광효율을향상시킬수 있다.

公开(公告)号：KR1020120000806A

公开(公告)日：2012-01-04

申请号：KR1020100061270

申请日：2010-06-28

Applicant: 삼성전자주식회사

Inventor： 고종만 ,  정호일

IPC: H01L21/205 ,  H01L21/683

CPC classification number: C23C16/4583 ,  H01L21/68714

Abstract: PURPOSE: The susceptor of a chemical vapor deposition apparatus and an inside coating formation method are provided to extend lifetime of the susceptor by efficiently forming consume resisting coating inside the susceptor and reducing a thermal shock from gas. CONSTITUTION: 3 outlet holes(114) are formed in a pocket with a center pinhole(112) as the center. A guide groove(116) guides the flow of gas is formed in the outlet hole. A gas flow path(120) comprises a horizontal hole which is horizontally formed from a gas inlet(122). The horizontal hole is connected to the outlet hole. Consume resisting coating(128) is formed as the thickness of 60-100μm thickness inside of the gas flow path. A satellite disc(150) is rotated by the flow of the gas which is spouted according to the guide groove.

Abstract translation: 目的：提供化学气相沉积装置的基座和内部涂层形成方法，以通过在基座内有效地形成耐消耗涂层并减少气体的热冲击来延长基座的使用寿命。 构成：以中心针孔（112）为中心的口袋形成3个出口孔（114）。 引导槽（116）引导在出口孔中形成气体流。 气流路径（120）包括从气体入口（122）水平形成的水平孔。 水平孔连接到出口孔。 在气体流动路径内部形成厚度为60-100μm的耐消耗涂层（128）。 卫星盘150通过根据引导槽喷出的气体的流动而旋转。

公开(公告)号：KR1020110136583A

公开(公告)日：2011-12-21

申请号：KR1020100056691

申请日：2010-06-15

Applicant: 삼성전자주식회사

Inventor： 김영기 ,  정호일 ,  고종만 ,  한성일

IPC: H01L21/687 ,  H01L21/205

CPC classification number: H01L21/68764 ,  C23C16/45521 ,  C23C16/4584 ,  H01L21/68771

Abstract: PURPOSE: A susceptor and a chemical vapor deposition apparatus including the same are provided to improve a structure of a pocket outer part of the susceptor, thereby preventing broken part generation in a surrounding part of the susceptor. CONSTITUTION: A susceptor flow path(115) supplying flowing gas(G1) to a plurality of pockets(111) is arranged in the inside of a susceptor(110). A rim is arranged in the outer boundary of a satellite disc(120). A support disc(130) includes a support disc flow path(135) in which a path of the flowing gas is passed. The support disc flow path is connected to a support tube flow path(155) of a support tube(150). A flowing gas inlet part(160) transfers torque of a driving motor(170) to the support tube.

Abstract translation: 目的：提供一种感受器和包括该感受器的化学气相沉积设备，以改善基座的口袋外部部分的结构，从而防止基座的周围部分产生断裂部分。 构成：在基座（110）的内部设置有将流动气体（G1）供应到多个凹穴（111）的基座流路（115）。 边缘设置在卫星盘（120）的外边界中。 支撑盘（130）包括其中流动气体的路径通过的支撑盘流动路径（135）。 支撑盘流动路径连接到支撑管（150）的支撑管流动路径（155）。 流动气体入口部分（160）将驱动马达（170）的扭矩传递到支撑管。