公开(公告)号：KR1020080017677A

公开(公告)日：2008-02-27

申请号：KR1020060079160

申请日：2006-08-22

Applicant: 삼성전자주식회사

Inventor： 한도석 ,  정용길 ,  김영남 ,  김현준

IPC: H01L21/66

Abstract: An apparatus for measuring surface resistance is provided to change automatically a probe head by implementing a guide pin for protruding a selected probe head among plural probe heads mounted in a rotation plate. An apparatus for measuring surface resistance includes a wafer stage(110), a probe arm(120), a plate(130), plural probe heads(140), and a guide pin(150). The wafer stage supports a wafer(100). The probe arm is formed at an upper portion of the wafer supported on the wafer stage in parallel with the wafer. The plate is formed at an end portion of the probe arm in parallel with the wafer. The probe heads are formed at an edge of the plate. The guide pin protrudes a probe head among the plural probe heads toward the wafer.

Abstract translation: 提供了一种用于测量表面电阻的装置，通过实现用于在安装在旋转板中的多个探头中突出选定的探针头的导销来自动改变探针头。 用于测量表面电阻的装置包括晶片台（110），探针臂（120），板（130），多个探针头（140）和引导销（150）。 晶片台支撑晶片（100）。 探针臂形成在与晶片平行的支撑在晶片台上的晶片的上部。 该板在探针臂的与晶片平行的端部处形成。 探头形成在板的边缘。 引导销将多个探针头中的探针头朝向晶片突出。